公开(公告)号：US20170261864A1

公开(公告)日：2017-09-14

申请号：US15520193

申请日：2015-10-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Gunes NAKIBOGLU ,  Jan Steven Christiaan WESTERLAKEN ,  Frank Johannes Jacobus VAN BOXTEL ,  Maria del Carmen MERCADO CARMONA ,  Thibault Simon Mathieu LAURENT

IPC: G03F7/20

CPC classification number: G03F7/70725 ,  G03F7/70808 ,  G03F7/7085 ,  G03F7/70858 ,  G03F7/709 ,  G03F7/70933 ,  G03F9/7096

Abstract: A lithographic apparatus including: a projection system to project radiation onto a substrate supported on a substrate stage, during an exposure phase; a sensing system to sense a property of the substrate on the stage during a sensing phase; and a positioning system to determine a position of the stage relative to a reference system via a radiation path between the stage and the reference system, wherein the apparatus is configured to control stage movement relative to the reference system in the sensing phase and to control other movement relative to the reference system during the exposure phase; the stage or reference system having an outlet to provide a gas curtain to reduce ingress of ambient gas into the path; and the apparatus is operative such that a characteristic of the gas curtain is different in at least part of the sensing phase compared to in the exposure phase.

公开(公告)号：US20170160652A1

公开(公告)日：2017-06-08

申请号：US15438376

申请日：2017-02-21

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Earl William EBERT ,  Johannes ONVLEE ,  Samir A. NAYFEH ,  Mark Josef SCHUSTER ,  Peter A. DELMASTRO ,  Christopher Charles WARD ,  Frank Johannes Jacobus VAN BOXTEL ,  Abdullah ALIKHAN ,  Daniel Nathan BURBANK ,  Daniel Nicholas GALBURT ,  Justin Matthew VERDIRAME

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70341 ,  G03F7/70716 ,  G03F7/70808 ,  G03F7/70858 ,  G03F7/70866

Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.

公开(公告)号：US20170090296A1

公开(公告)日：2017-03-30

申请号：US15311544

申请日：2015-05-07

Applicant: ASML Netherlands B.V.

Inventor： Günes NAKIBOGLU ,  Mark Constant Johannes BAGGEN ,  Gerard Johannes BOOGAARD ,  Nicolaas Rudolf KEMPER ,  Sander KERSSEMAKERS ,  Robertus Mathijs Gerardus RIJS ,  Frank Johannes Jacobus VAN BOXTEL ,  Erwin Antonius Henricus Franciscus VAN DEN BOOGAERT ,  Marc Wilhelmus Maria VAN DER WIJST ,  Martinus VAN DUIJNHOVEN ,  Jessica Henrica Anna VERDONSCHOT ,  Hendrikus Herman Marie COX

IPC: G03F7/20 ,  G10K11/168

CPC classification number: G03F7/709 ,  G10K11/16 ,  G10K11/168 ,  G10K11/172

Abstract: A lithographic apparatus has a compartment which accommodates a movable object. Movements of the movable object cause acoustic disturbances in the compartment. An acoustic damper is arranged to damp the acoustic disturbances in the compartment and comprises a chamber (100) in communication with the compartment and a perforated plate (101), having a plurality of Cthrough-holes (102), between the chamber and the compartment.

公开(公告)号：US20180101099A1

公开(公告)日：2018-04-12

申请号：US15567103

申请日：2016-03-08

Applicant: ASML Netherlands B.V.

Inventor： Günes NAKIBOGLU ,  Marc Wilhelmus Maria VAN DER WIJST ,  Martinus VAN DUIJNHOVEN ,  Cornelius Adrianus Lambertus DE HOON ,  Frank Johannes Jacobus VAN BOXTEL

IPC: G03F7/20

CPC classification number: G03F7/20 ,  G03F7/709

Abstract: A lithographic apparatus has shield which protects a functional subsystem form acoustic disturbances. The shield comprises a locally resonant sonic material for implementing the protecting. In an embodiment the shield comprises a panel formed by a cell or a plurality of cells comprising: a frame; an elastic membrane whose edge is fixed to the frame; and a mass attached to a location at the membrane at a non-zero distance from the edge.

公开(公告)号：US20170068175A1

公开(公告)日：2017-03-09

申请号：US15354821

申请日：2016-11-17

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Jan Steven Christiaan WESTERLAKEN ,  Ruud Hendrikus Martinus Johannes BLOKS ,  Peter A. DELMASTRO ,  Thibault Simon Mathieu LAURENT ,  Martinus Hendrikus Antonius LEENDERS ,  Mark Josef SCHUSTER ,  Christopher Charles WARD ,  Frank Johannes Jacobus VAN BOXTEL ,  Justin Matthew VERDIRAME ,  Samir A. NAYFEH

IPC: G03F7/20

Abstract: A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.

Abstract translation: 光刻设备具有构造成支撑图案形成装置的支撑结构，所述图案形成装置用于根据期望的图案对辐射束进行图案化，并具有辐射束通过的平面主表面; 出口开口，其构造成将气体流引导到图案形成装置上; 以及入口开口，被配置为提取已经离开出口的气体，其中出口开口和入口开口面向面向图案形成装置的平面主表面的面对表面。

公开(公告)号：US20150355557A1

公开(公告)日：2015-12-10

申请号：US14762450

申请日：2014-02-20

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Koen CUYPERS ,  Marcelo Henrique DE ANDRADE OLIVEIRA ,  Marinus Jan REMIE ,  Chattarbir SINGH ,  Laurentius Johannes Adrianus VAN BOKHOVEN ,  Henricus Anita Jozef Wilhemus VAN DE VEN ,  José Nilton FONSECA JUNIOR ,  Frank Johannes Jacobus VAN BOXTEL ,  Daniel Nathan BURBANK ,  Erik Roelof LOOPSTRA ,  Johannes ONVLEE ,  Mark Josef SCHUSTER ,  Robertus Nicodemus Jacobus VAN BALLEGOIJ ,  Christopher Charles WARD ,  Jan Steven Christiaan WESTERLAKEN

IPC: G03F7/20

CPC classification number: G03F7/70933 ,  G03F7/70358 ,  G03F7/70633 ,  G03F7/70725 ,  G03F7/70866

Abstract: A system is disclosed for reducing overlay errors by controlling gas flow around a patterning device of a lithographic apparatus. The lithographic apparatus includes an illumination system configured to condition a radiation beam. The lithographic apparatus further includes a movable stage comprising a support structure that may be configured to support a patterning device. The patterning device may be configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam. In addition, the lithographic apparatus comprises a plate (410) positioned between the movable stage (401) and the projection system (208). The plate includes an opening (411) that comprises a first sidewall (411a) and a second sidewall (411b). The plate may be configured to provide a gas flow pattern (424) in a region between the movable stage and the projection system that is substantially perpendicular to an optical axis of the illumination system.

Abstract translation: 公开了一种通过控制光刻设备的图案形成装置周围的气流来减少重叠误差的系统。 光刻设备包括被配置为调节辐射束的照明系统。 光刻设备还包括可移动台，其包括可构造成支撑图案形成装置的支撑结构。 图案形成装置可以被配置为在其横截面中赋予辐射束图案以形成图案化的辐射束。 此外，光刻设备包括位于可移动台（401）和投影系统（208）之间的板（410）。 板包括包括第一侧壁（411a）和第二侧壁（411b）的开口（411）。 板可以被配置为在基本上垂直于照明系统的光轴的可移动台和投影系统之间的区域中提供气流图案（424）。

公开(公告)号：US20180239258A1

公开(公告)日：2018-08-23

申请号：US15959115

申请日：2018-04-20

Applicant: ASML Netherlands B.V.

Inventor： Günes NAKIBOGLU ,  Suzanne Johanna Antonetta Geertruda COSIJNS ,  Anne Willemijn Bertine QUIST ,  Lukasz SOSNIAK ,  Frank Johannes Jacobus VAN BOXTEL ,  Engelbertus Antonius Fransiscus VAN DER PASCH

IPC: G03F7/20

CPC classification number: G03F7/7085 ,  G03F7/70775 ,  G03F7/709

Abstract: A lithographic apparatus includes an optical sensor, a movable body, a support, a deflector system, a first drive system and a second drive system. The movable body is moveable relative to the sensor. The support is for holding the sensor. The first drive system is arranged to move the movable body relative to the sensor. The second drive system is arranged to move the first drive system relative to the sensor. The second drive system is arranged to move the deflector system relative to the sensor. A disturbance is induced by a movement of the movable body. The deflector system is arranged to create a deflecting area for reflecting the disturbance away from the support.

公开(公告)号：US20150301456A1

公开(公告)日：2015-10-22

申请号：US14439359

申请日：2013-10-21

Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

Inventor： Earl William EBERT, JR. ,  Johannes ONVLEE ,  Samir A. NAYFEH ,  Mark Josef SCHUSTER ,  Peter A. DELMASTRO ,  Christopher Charles WARD ,  Frank Johannes Jacobus VAN BOXTEL ,  Abdullah ALIKHAN ,  Daniel Nathan BURBANK ,  Daniel Nicholas GALBURT ,  Justin Matthew VERDIRAME

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70341 ,  G03F7/70716 ,  G03F7/70808 ,  G03F7/70858 ,  G03F7/70866

Abstract: A patterning device support (1100) for controlling a temperature of a patterning device (1102) can include a movable component (1104). The movable component can include a gas inlet (1108) for supplying a gas flow across a surface of the patterning device and a gas outlet (1110) for extracting the gas flow. The patterning device support can also include a gas flow generator (1118) coupled to a duct (1114, 1116) for recirculating the gas flow from the gas outlet to the gas inlet.

Abstract translation: 用于控制图案形成装置（1102）的温度的图案形成装置支撑件（1100）可以包括可移动部件（1104）。 可移动部件可以包括用于提供穿过图案形成装置的表面的气流的气体入口（1108）和用于提取气体流的气体出口（1110）。 图案形成装置支撑件还可以包括联接到管道（1114,1116）的气流发生器（1118），用于使气流从气体出口再循环到气体入口。

公开(公告)号：US20190121248A1

公开(公告)日：2019-04-25

申请号：US16090713

申请日：2017-03-08

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Günes NAKIBOGLU ,  Lowell Lane BAKER ,  Ruud Hendrikus Martinus Johannes BLOKS ,  Hakki Ergün CEKLI ,  Geoffrey Alan SCHULTZ ,  Laurentius Johannes Adrianus VAN BOKHOVEN ,  Frank Johannes Jacobus VAN BOXTEL ,  Jean-Philippe Xavier VAN DAMME ,  Christopher Charles WARD

IPC: G03F7/20

CPC classification number: G03F7/70875

Abstract: A patterning apparatus for a lithographic apparatus, the patterning apparatus including a patterning device support structure configured to support a patterning device having a planar surface; a patterning device conditioning system including a first gas outlet configured to provide a first gas flow over the planar surface in use and a second gas outlet configured to provide a second gas flow over the planar surface in use, wherein the first gas outlet and the second gas outlet are arranged at different distances perpendicular to the planar surface; and a control system configured to independently control a first momentum of gas exiting the first gas outlet and a second momentum of gas exiting the second gas outlet or to independently vary the first gas flow and/or the second gas flow over the planar surface of the patterning device.

公开(公告)号：US20180299796A1

公开(公告)日：2018-10-18

申请号：US15570934

申请日：2016-03-29

Applicant: ASML Netherlands B.V.

Inventor： Günes NAKIBOGLU ,  Maarten HOLTRUST ,  Martinus VAN DUIJNHOVEN ,  Francis FAHRNI ,  Frank Johannes Jacobus VAN BOXTEL ,  Anne Willemijn Bertine QUIST ,  Bart Dinand PAARHUIS ,  Daan Daniel Johannes VAN SOMMEREN

IPC: G03F7/20

Abstract: A lithographic apparatus has: a conduit through which a gas can flow; a gas mover configured to cause the gas to flow in the conduit; a wall in contact with the gas in the conduit and defining a membrane aperture therein; and an acoustic filter including a flexible membrane fixed in the membrane aperture. The acoustic filter reduces transmission of acoustic disturbances without adding any flow resistance.