Lithographic Apparatuses and Methods for Compensating For Eigenmode Coupling
    2.
    发明申请
    Lithographic Apparatuses and Methods for Compensating For Eigenmode Coupling 有权
    用于本征模耦合补偿的平版印刷设备和方法

    公开(公告)号:US20130278915A1

    公开(公告)日:2013-10-24

    申请号:US13861053

    申请日:2013-04-11

    IPC分类号: G03F7/20

    摘要: A lithographic apparatus can include a component and a positioning system operatively coupled and configured to move the component along a first axis. The positioning system can be configured to measure a position of the component along a second axis or a third axis. The positioning system can also be configured to control movement of the component so as to compensate for an effect of eigenmode coupling between the movement of the component along the first axis and the measured position of the component along the second axis or the third axis. In some embodiments, the component is a reticle stage or a wafer stage.

    摘要翻译: 光刻设备可以包括可操作地联接和配置成沿着第一轴线移动部件的部件和定位系统。 定位系统可以被配置成沿着第二轴线或第三轴线测量部件的位置。 定位系统还可以被配置为控制部件的移动,以便补偿沿着第一轴线的部件的运动与沿着第二轴线或第三轴线的部件的测量位置之间的本征模式耦合的影响。 在一些实施例中,组件是掩模版阶段或晶片台。

    Estimating Deformation of a Patterning Device and/or a Change in Its Position
    6.
    发明申请
    Estimating Deformation of a Patterning Device and/or a Change in Its Position 有权
    估计图案化装置的变形和/或其位置变化

    公开(公告)号:US20170068171A1

    公开(公告)日:2017-03-09

    申请号:US15122772

    申请日:2015-03-05

    IPC分类号: G03F7/20 G01B11/14

    摘要: A system and method are provided for determining deformation of a patterning device and/or shift position of the patterning device relative. The system includes a first sensing sub-system that measures respective positions of a plurality of reference marks on the patterning device, and a second sensing sub-system that measures positions of the edge of the patterning device relative to the support. The system further includes a controller to determine an absolute position of the patterned portion and change in the absolute position based on measured respective positions of marks on the patterning device, determine a change in a relative position of the edge of the patterned device based on the measured edge positions, and estimate a change in a position of the patterning device relative to the support and a change in a pattern distortion of the patterned portion of the patterning device over a time period.

    摘要翻译: 提供了用于确定图案形成装置相对于图案形成装置的变形和/或移位位置的系统和方法。 该系统包括测量图案形成装置上的多个参考标记的相应位置的第一感测子系统和测量图案形成装置的边缘相对于支撑件的位置的第二感测子系统。 该系统还包括控制器,用于基于测量的图案形成装置上的标记的相应位置来确定图案化部分的绝对位置和绝对位置的变化,基于图案化装置的边缘确定相对位置的变化 测量边缘位置,并且估计图案形成装置相对于支撑件的位置的变化和图案形成装置的图案化部分的图案变形在一段时间内的变化。