PATTERNING DEVICE COOLING APPARATUS
    6.
    发明申请

    公开(公告)号:US20180356740A1

    公开(公告)日:2018-12-13

    申请号:US16061043

    申请日:2016-11-21

    IPC分类号: G03F7/20

    摘要: An apparatus and method for controlling temperature of a patterning device in a lithographic apparatus, by flowing gas across the patterning device. A patterning apparatus includes: a patterning device support structure configured to support a patterning device; a patterning device conditioning system including a first gas outlet configured to provide a gas flow over a surface of the patterning device and a second gas outlet configured to provide a gas flow over a part of a surface of the patterning device support structure not supporting the patterning device; and a control system configured to separately control the temperature of the gas exiting the first and second gas outlets such that the gas exiting the second gas outlet is at a higher temperature than the gas exiting the first gas outlet and/or to separately control the temperature and gas flow rate of the gas exiting the first and second gas outlets.

    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    9.
    发明申请
    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号:US20160349631A1

    公开(公告)日:2016-12-01

    申请号:US15116794

    申请日:2015-01-20

    IPC分类号: G03F7/20

    摘要: A lithographic apparatus including a barrier system and a device manufacturing method using such a lithographic apparatus. The barrier system is used to maintain a protected volume of gas within a barrier. The protected volume may be maintained when different components of the lithographic apparatus move relative to each other. The barrier system may be used in different locations within the lithographic apparatus. The geometry of the barrier affects how efficiently the protected volume is maintained, especially at high speeds. The geometry reduces the amount of ambient gas entering the protected volume from outside the barrier.

    摘要翻译: 包括屏障系统的光刻设备和使用这种光刻设备的设备制造方法。 屏障系统用于将受保护的气体体积维持在屏障内。 当光刻设备的不同部件相对于彼此移动时,可以保持受保护的体积。 屏障系统可用于光刻设备内的不同位置。 屏障的几何形状会影响保护体积的保持程度,尤其是在高速度下。 几何形状减少了从屏障外部进入受保护体积的环境气体的量。