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公开(公告)号：US20150355557A1
公开(公告)日：2015-12-10
申请号：US14762450
申请日：2014-02-20
发明人： Koen CUYPERS , Marcelo Henrique DE ANDRADE OLIVEIRA , Marinus Jan REMIE , Chattarbir SINGH , Laurentius Johannes Adrianus VAN BOKHOVEN , Henricus Anita Jozef Wilhemus VAN DE VEN , José Nilton FONSECA JUNIOR , Frank Johannes Jacobus VAN BOXTEL , Daniel Nathan BURBANK , Erik Roelof LOOPSTRA , Johannes ONVLEE , Mark Josef SCHUSTER , Robertus Nicodemus Jacobus VAN BALLEGOIJ , Christopher Charles WARD , Jan Steven Christiaan WESTERLAKEN
IPC分类号： G03F7/20
CPC分类号： G03F7/70933 , G03F7/70358 , G03F7/70633 , G03F7/70725 , G03F7/70866
摘要： A system is disclosed for reducing overlay errors by controlling gas flow around a patterning device of a lithographic apparatus. The lithographic apparatus includes an illumination system configured to condition a radiation beam. The lithographic apparatus further includes a movable stage comprising a support structure that may be configured to support a patterning device. The patterning device may be configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam. In addition, the lithographic apparatus comprises a plate (410) positioned between the movable stage (401) and the projection system (208). The plate includes an opening (411) that comprises a first sidewall (411a) and a second sidewall (411b). The plate may be configured to provide a gas flow pattern (424) in a region between the movable stage and the projection system that is substantially perpendicular to an optical axis of the illumination system.
摘要翻译： 公开了一种通过控制光刻设备的图案形成装置周围的气流来减少重叠误差的系统。 光刻设备包括被配置为调节辐射束的照明系统。 光刻设备还包括可移动台，其包括可构造成支撑图案形成装置的支撑结构。 图案形成装置可以被配置为在其横截面中赋予辐射束图案以形成图案化的辐射束。 此外，光刻设备包括位于可移动台（401）和投影系统（208）之间的板（410）。 板包括包括第一侧壁（411a）和第二侧壁（411b）的开口（411）。 板可以被配置为在基本上垂直于照明系统的光轴的可移动台和投影系统之间的区域中提供气流图案（424）。
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公开(公告)号：US20190121248A1
公开(公告)日：2019-04-25
申请号：US16090713
申请日：2017-03-08
发明人： Günes NAKIBOGLU , Lowell Lane BAKER , Ruud Hendrikus Martinus Johannes BLOKS , Hakki Ergün CEKLI , Geoffrey Alan SCHULTZ , Laurentius Johannes Adrianus VAN BOKHOVEN , Frank Johannes Jacobus VAN BOXTEL , Jean-Philippe Xavier VAN DAMME , Christopher Charles WARD
IPC分类号： G03F7/20
CPC分类号： G03F7/70875
摘要： A patterning apparatus for a lithographic apparatus, the patterning apparatus including a patterning device support structure configured to support a patterning device having a planar surface; a patterning device conditioning system including a first gas outlet configured to provide a first gas flow over the planar surface in use and a second gas outlet configured to provide a second gas flow over the planar surface in use, wherein the first gas outlet and the second gas outlet are arranged at different distances perpendicular to the planar surface; and a control system configured to independently control a first momentum of gas exiting the first gas outlet and a second momentum of gas exiting the second gas outlet or to independently vary the first gas flow and/or the second gas flow over the planar surface of the patterning device.
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公开(公告)号：US20180196360A1
公开(公告)日：2018-07-12
申请号：US15742179
申请日：2016-06-17
发明人： Laurentius Johannes Adrianus VAN BOKHOVEN , Christopher Charles WARD , Marc Léon VAN DER GAAG , Johan Gertrudis Cornelis KUNNEN
IPC分类号： G03F7/20
CPC分类号： G03F7/70875 , G03F7/70733 , G03F7/70783 , G03F7/70858 , G03F7/70891
摘要： A lithographic apparatus (100) includes a patterning device support structure (104) configured to support a patterning device (110), a gas inlet (116) configured to provide a gas flow (114) across a surface of the patterning device, and a temperature conditioning device (134) configured to condition the temperature of the gas flow based on a set point. The apparatus also includes a sensor (132) configured to measure a parameter indicative of an amount of heat added to at least one of the patterning device and a volume (126) between the patterning device and a lens (124) of a projection system (106) during operational use of the lithographic system. Further, the apparatus includes a controller (130) operatively coupled to the sensor and configured to adjust the set point based on the parameter measured by the sensor to control a temperature of the patterning device.
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公开(公告)号：US20170363973A1
公开(公告)日：2017-12-21
申请号：US15540649
申请日：2015-12-02
发明人： Thomas VENTURINO , Geoffrey Alan SCHULTZ , Daniel Nicholas GALBURT , Daniel Nathan BURBANK , Santiago E. DELPUERTO , Herman VOGEL , Johannes ONVLEE , Laurentius Johannes Adrianus VAN BOKHOVEN , Christopher Charles WARD
IPC分类号： G03F7/20
摘要： An apparatus, system, and method cool a patterning device by supplying a non-uniform gas flow. The apparatus and system include a gas supply structure that supplies a gas flow across the first surface of the patterning device. The gas supply structure includes a gas supply nozzle specially configured to create a non-uniform gas flow distribution. A greater volume or velocity of the gas flow is directed to desired portion of the patterning device.
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5.发明申请公开(公告)号：US20200174381A1
公开(公告)日：2020-06-04
申请号：US16615810
申请日：2018-04-18
发明人： Jean-Philippe Xavier VAN DAMME , Laurentius Johannes Adrianus VAN BOKHOVEN , Petrus Franciscus VAN GILS , Gerben PIETERSE
IPC分类号： G03F7/20
摘要： The invention relates to a setpoint generator for moving a patterning device of a lithographic apparatus, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, wherein the setpoint generator comprises a finite number of movement profiles for the patterning device, and wherein the setpoint generator is configured to select one of the finite number of movement profiles based on a desired movement profile and to output the selected movement profile as a setpoint for the patterning device.
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公开(公告)号：US20180356740A1
公开(公告)日：2018-12-13
申请号：US16061043
申请日：2016-11-21
发明人： Laurentius Johannes Adrianus VAN BOKHOVEN , Ruud Hendrikus Martinus Johannes BLOKS , Günes NAKIBOGLU , Marinus Jan REMIE , Johan Gertrudis Cornelis KUNNEN
IPC分类号： G03F7/20
CPC分类号： G03F7/70875 , G03F7/70716 , G03F7/70783 , G03F7/70858 , G03F7/70933
摘要： An apparatus and method for controlling temperature of a patterning device in a lithographic apparatus, by flowing gas across the patterning device. A patterning apparatus includes: a patterning device support structure configured to support a patterning device; a patterning device conditioning system including a first gas outlet configured to provide a gas flow over a surface of the patterning device and a second gas outlet configured to provide a gas flow over a part of a surface of the patterning device support structure not supporting the patterning device; and a control system configured to separately control the temperature of the gas exiting the first and second gas outlets such that the gas exiting the second gas outlet is at a higher temperature than the gas exiting the first gas outlet and/or to separately control the temperature and gas flow rate of the gas exiting the first and second gas outlets.
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公开(公告)号：US20210389676A1
公开(公告)日：2021-12-16
申请号：US17279648
申请日：2019-09-11
发明人： Bearrach MOEST , Rowin MEIJERINK , Thijs SCHENKELAARS , Norbertus Josephus Martinus VAN DEN NIEUWELAAR , Laurentius Johannes Adrianus VAN BOKHOVEN
IPC分类号： G03F7/20
摘要： A method of predicting deflection of a pellicle which will occur during movement of the pellicle in a lithographic apparatus, the method including receiving parameters regarding properties of the pellicle and receiving parameters regarding the expected movement of the pellicle. The parameters are applied to a model which predicts deflection of the pellicle as a function of those parameters. The model includes a plurality of sub-models which relate to different components of deflection of the pellicle. An output of the model may be used to predict.
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公开(公告)号：US20190235392A1
公开(公告)日：2019-08-01
申请号：US16318191
申请日：2017-06-29
发明人： Andre Bernardus JEUNINK , Laurentius Johannes Adrianus VAN BOKHOVEN , Stan Henricus VAN DER MEULEN , Yang-Shan HUANG , Federico LA TORRE , Barry MOEST , Stefan Carolus Jacobus Antonius KEIJ , Enno VAN DEN BRINK , Christine Henriette SCHOUTEN , Hoite Pieter Theodoor TOLSMA
摘要： A lithographic apparatus has a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a projection system configured to project the patterned radiation beam onto a target portion of a substrate, wherein the support structure is located in a housing and wherein pressure sensors are located in the housing.
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公开(公告)号：US20160349631A1
公开(公告)日：2016-12-01
申请号：US15116794
申请日：2015-01-20
发明人： Günes NAKIBOGLU , Martijn VAN BAREN , Frank Johannes Jacobs VAN BOXTEL , Koen CUYPERS , Jeroen Gerard GOSEN , Laurentius Johannes Adrianus VAN BOKHOVEN
IPC分类号： G03F7/20
CPC分类号： G03F7/70858 , G03F7/70358 , G03F7/70716 , G03F7/70908
摘要： A lithographic apparatus including a barrier system and a device manufacturing method using such a lithographic apparatus. The barrier system is used to maintain a protected volume of gas within a barrier. The protected volume may be maintained when different components of the lithographic apparatus move relative to each other. The barrier system may be used in different locations within the lithographic apparatus. The geometry of the barrier affects how efficiently the protected volume is maintained, especially at high speeds. The geometry reduces the amount of ambient gas entering the protected volume from outside the barrier.
摘要翻译： 包括屏障系统的光刻设备和使用这种光刻设备的设备制造方法。 屏障系统用于将受保护的气体体积维持在屏障内。 当光刻设备的不同部件相对于彼此移动时，可以保持受保护的体积。 屏障系统可用于光刻设备内的不同位置。 屏障的几何形状会影响保护体积的保持程度，尤其是在高速度下。 几何形状减少了从屏障外部进入受保护体积的环境气体的量。
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公开(公告)号：US20220187715A1
公开(公告)日：2022-06-16
申请号：US17438314
申请日：2020-02-10
IPC分类号： G03F7/20
摘要： A method of predicting thermally induced aberrations of a projection system for projecting a radiation beam, the method comprising: calculating a change in temperature of the projection system from a power of the radiation beam output from the projection system using a dynamic linear function; and calculating the thermally induced aberrations from the calculated change in temperature using a static non-linear function.
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