Invention Application
- Patent Title: LITHOGRAPHIC METHOD
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Application No.: US16318191Application Date: 2017-06-29
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Publication No.: US20190235392A1Publication Date: 2019-08-01
- Inventor: Andre Bernardus JEUNINK , Laurentius Johannes Adrianus VAN BOKHOVEN , Stan Henricus VAN DER MEULEN , Yang-Shan HUANG , Federico LA TORRE , Barry MOEST , Stefan Carolus Jacobus Antonius KEIJ , Enno VAN DEN BRINK , Christine Henriette SCHOUTEN , Hoite Pieter Theodoor TOLSMA
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Priority: EP16180548.6 20160721
- International Application: PCT/EP2017/066087 WO 20170629
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F1/64
Abstract:
A lithographic apparatus has a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a projection system configured to project the patterned radiation beam onto a target portion of a substrate, wherein the support structure is located in a housing and wherein pressure sensors are located in the housing.
Public/Granted literature
- US10571814B2 Lithographic method Public/Granted day:2020-02-25
Information query
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