Reticle Clamping Device
    7.
    发明申请

    公开(公告)号:US20190391501A1

    公开(公告)日:2019-12-26

    申请号:US16484677

    申请日:2018-01-17

    申请人: ASML Holding N.V.

    IPC分类号: G03F7/20

    摘要: Systems and methods are disclosed that provide a support system in the Z direction for patterning devices that can function under high acceleration and deceleration with minimal effect on travel and hysteresis in the X and Y directions. A reticle clamping system includes a support device and a holding device. The holding device is configured to releasably couple a reticle to the support device. The holding device includes a plurality of burls. The reticle clamping system further includes a metallic support system coupled to the support device. The metallic support system provides a vacuum path from a vacuum channel to the holding device.

    Shear-Layer Chuck for Lithographic Apparatus

    公开(公告)号:US20140233009A1

    公开(公告)日:2014-08-21

    申请号:US14259723

    申请日:2014-04-23

    申请人: ASML Holding N.V.

    IPC分类号: G03F7/20

    摘要: A lithographic apparatus is described that comprises a support structure to hold an object. The object may be a patterning device or a substrate to be exposed. The support structure comprises a chuck, on which the object is supported, and an array of shear-compliant elongated elements normal to the chuck and the stage, such that first ends of the elongated elements contact a surface of the chuck and second ends of the elongated elements contact a stage. Through using the array of elongated elements, a transfer of stress between the stage and the chuck is substantially uniform, resulting in minimization of slippage of the object relative to the surface of the chuck during a deformation of the chuck due to the stress.

    Shear-Layer Chuck for Lithographic Apparatus
    9.
    发明申请
    Shear-Layer Chuck for Lithographic Apparatus 有权
    剪切层卡盘用于平版印刷设备

    公开(公告)号:US20140016110A1

    公开(公告)日:2014-01-16

    申请号:US13938746

    申请日:2013-07-10

    申请人: ASML Holding N.V.

    IPC分类号: G03F7/20 H01L21/687

    摘要: A lithographic apparatus is described that comprises a support structure to hold an object. The object may be a patterning device or a substrate to be exposed. The support structure comprises a chuck, on which the object is supported, and an array of shear-compliant elongated elements normal to the chuck and the stage, such that first ends of the elongated elements contact a surface of the chuck and second ends of the elongated elements contact a stage. Through using the array of elongated elements, a transfer of stress between the stage and the chuck is substantially uniform, resulting in minimization of slippage of the object relative to the surface of the chuck during a deformation of the chuck due to the stress.

    摘要翻译: 描述了一种光刻设备,其包括用于保持物体的支撑结构。 该物体可以是图案形成装置或要暴露的基板。 支撑结构包括卡盘,物体被支撑在该卡盘上,以及与卡盘和台架垂直的剪切顺应的细长元件的阵列,使得细长元件的第一端接触卡盘的表面和卡盘的第二端 细长元件接触舞台。 通过使用细长元件阵列,载物台与卡盘之间的应力传递基本上是均匀的,从而在由于应力引起的卡盘变形期间,物体相对于卡盘表面的滑动最小化。