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    SYSTEM AND METHOD FOR SCANNING A SAMPLE USING MULTI-BEAM INSPECTION APPARATUS
    4.
    发明申请
    SYSTEM AND METHOD FOR SCANNING A SAMPLE USING MULTI-BEAM INSPECTION APPARATUS 有权

    公开(公告)号：US20210217582A1

    公开(公告)日：2021-07-15

    申请号：US17251724

    申请日：2019-06-07

    申请人： ASML Netherlands B.V.

    发明人： Martinus Gerardus, Maria, Johannes MAASSEN ,  Joost Jeroen OTTENS ,  Long MA ,  Youfei JIANG ,  Weihua YIN ,  Wei-Te LI ,  Xuedong LIU

    IPC分类号： H01J37/26 ,  H01J37/147 ,  H01J37/22 ,  H01J37/28

    摘要： An improved system and method for inspection of a sample using a particle beam inspection apparatus, and more particularly, to systems and methods of scanning a sample with a plurality of charged particle beams. An improved method of scanning an area of a sample using N charged particle beams, wherein Nis an integer greater than or equal to two, and wherein the area of the sample comprises a plurality of scan sections of N consecutive scan lines, includes moving the sample in a first direction. The method also includes scanning, with a first charged particle beam of the N charged particle beams, first scan lines of at least some scan sections of the plurality of scan sections moving towards a probe spot of the first charged particle beam. The method further includes scanning, with a second charged particle beam of the N charged particle beams, second scan lines of at least some scan sections of the plurality of scan sections moving towards a probe spot of the second charged particle beam.

    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    9.
    发明申请
    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：US20160139514A1

    公开(公告)日：2016-05-19

    申请号：US14942679

    申请日：2015-11-16

    申请人： ASML NETHERLANDS B.V.

    发明人： Joost Jeroen OTTENS ,  Noud Jan Gilissen ,  Martinus Hendrikus Antonius Leenders

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70725 ,  G03F7/70341 ,  G03F7/7075 ,  G03F9/7046

    摘要： A lithographic apparatus may include an optical element, such as an immersion fluid reservoir, which supported at least in part by a bearing, such as a gas bearing. To enable illumination by the lithographic apparatus of an edge of the substrate, a surrounding structure is provided that surrounds the substrate, A level parameter of the substrate, such as a thickness of the substrate, is measured by a sensor, such as a thickness sensor. By means of an actuator, the substrate table on which the substrate is or will be held is positioned with respect to the surrounding structure, such that a surface of the substrate would be on a substantially same level as a surface of the surrounding structure, thus enabling the optical element to transition from the surface of the substrate to the surface of the surrounding structure and vice versa.

    摘要翻译： 光刻设备可以包括至少部分由诸如气体轴承的轴承支撑的光学元件，例如浸没式流体储存器。 为了使基板的边缘的光刻设备进行照明，提供围绕基板的周围结构，基板的电平参数（例如基板的厚度）由诸如厚度传感器的传感器 。 通过致动器，其上放置或将保持衬底的衬底台相对于周围结构定位，使得衬底的表面将处于与周围结构的表面基本相同的高度，因此 使得光学元件能够从衬底的表面转移到周围结构的表面，反之亦然。