公开(公告)号：US20150015857A1

公开(公告)日：2015-01-15

申请号：US14498883

申请日：2014-09-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Nicolaas Rudolf KEMPER ,  Nicolaas TEN KATE ,  Joost Jeroen OTTENS ,  Marcel BECKERS ,  Marco POLIZZI ,  Michel RlEPEN ,  Anthonie KUIJPER ,  Koen STEFFENS ,  Adrianes Johannes BAETEN ,  Anca Mihaela ANTONEVICI

IPC: G03F7/20 ,  B01D19/00

CPC classification number: G03F7/70866 ,  B01D19/0021 ,  G03B27/52 ,  G03F7/70341

Abstract: An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.

Abstract translation: 描述了一种浸没式光刻设备，其中通过使富液体流优先沿着表面流动，将两相流分离成富含液体的富气流。

公开(公告)号：US20150056559A1

公开(公告)日：2015-02-26

申请号：US14504130

申请日：2014-10-01

Applicant: ASML NETHERLANDS B.V.

Inventor： Hans JANSEN ,  Marco Koert STAVENGA ,  Jacobus Johannus Leonardus Hendricus VERSPAY ,  Franciscus Johannes Joseph JANSSEN ,  Anthonie KUIJPER

IPC: G03F7/20

CPC classification number: G03F7/70858 ,  G03F7/2041 ,  G03F7/70341

Abstract: An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base, which has a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid.

Abstract translation: 提供了一种浸没液体，其包括离子形成组分，例如 酸或碱，其具有较高的蒸气压。 还提供了使用浸液的光刻工艺和光刻系统。

公开(公告)号：US20180292762A1

公开(公告)日：2018-10-11

申请号：US16008355

申请日：2018-06-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Nicolaas Rudolf KEMPER ,  Nicolaas TEN KATE ,  Joost Jeroen OTTENS ,  Marcel BECKERS ,  Marco POLIZZI ,  Michel RIEPEN ,  Anthonie KUIJPER ,  Koen STEFFENS ,  Adrianes Johannes BAETEN ,  Anca Mihaela ANTONEVICI

IPC: G03F7/20 ,  B01D19/00

Abstract: An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.

公开(公告)号：US20160033876A1

公开(公告)日：2016-02-04

申请号：US14885775

申请日：2015-10-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Hans JANSEN ,  Marco Koert STAVENGA ,  Jacobus Johannus Leonardus Hendricus VERSPAY ,  Franciscus Johannes Joseph JANSSEN ,  Anthonie KUIJPER

IPC: G03F7/20

CPC classification number: G03F7/70858 ,  G03F7/2041 ,  G03F7/70341

Abstract: An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base, which has a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid.