公开(公告)号：US20170045831A1

公开(公告)日：2017-02-16

申请号：US15333044

申请日：2016-10-24

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Nicolaas Rudolf KEMPER ,  Henrikus Herman Marie COX ,  Sjoerd Nicolaas Lambertus DONDERS ,  Roelof Frederik DE GRAAF ,  Christiaan Alexander HOOGENDAM ,  Nicolaas TEN KATE ,  Martinus Hendrikus Antonius LEENDERS ,  Jeroen Johannes Sophia Maria MERTENS ,  Frits VAN DER MEULEN ,  Joost Jeroen OTTENS ,  Franciscus Johannes Herman Maria TEUNISSEN ,  Jan-Gerard Cornelis VAN DER TOORN ,  Martinus Cornelis Maria VERHAGEN ,  Marco POLIZZI ,  Edwin Augustinus Matheus VAN GOMPEL ,  Johannes Petrus Maria SMEULERS ,  Stefan Philip Christiaan BELFROID ,  Herman VOGEL

IPC: G03F7/20

CPC classification number: G03F7/70883 ,  G03F7/70341 ,  G03F7/70858 ,  G03F7/70866 ,  G03F7/7095

Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.

公开(公告)号：US20150323876A1

公开(公告)日：2015-11-12

申请号：US14806395

申请日：2015-07-22

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Nicolaas Rudolf KEMPER ,  Henrikus Herman Marie COX ,  Sjoerd Nicolaas Lambertus DONDERS ,  Roelof Frederik DE GRAAF ,  Christiaan Alexander HOOGENDAM ,  Nicolaas TEN KATE ,  Martinus Hendrikus Antonius LEENDERS ,  Jeroen Johannes Sophia Maria MERTENS ,  Frits VAN DER MEULEN ,  Joost Jeroen OTTENS ,  Franciscus Johannes Herman Maria TEUNISSEN ,  Jan-Gerard Cornelis VAN DER TOORN ,  Martinus Cornelis Maria VERHAGEN ,  Marco POLIZZI ,  Edwin Augustinus Matheus VAN GOMPEL ,  Johannes Petrus Maria SMEULERS ,  Stefan Philip Christiaan BELFROID ,  Herman VOGEL

IPC: G03F7/20

CPC classification number: G03F7/70883 ,  G03F7/70341 ,  G03F7/70858 ,  G03F7/70866 ,  G03F7/7095

Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.

公开(公告)号：US20180039188A1

公开(公告)日：2018-02-08

申请号：US15694537

申请日：2017-09-01

Applicant: ASML NETHERLANDS B.V.

Inventor： Jeroen Johannes Sophia Maria MERTENS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Roelof Frederik DE GRAAF ,  Christiaan Alexander HOOGENDAM ,  Antonius Johannus VAN DER NET ,  Franciscus Johannes Herman Maria TEUNISSEN ,  Patricius Aloysius Jacobus TINNEMANS ,  Martinus Cornelis Maria VERHAGEN ,  Jacobus Johannus Leonardus Hendricus VERSPAY ,  Edwin Augustinus Matheus VAN GOMPEL

IPC: G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70341

Abstract: A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.

公开(公告)号：US20160370714A1

公开(公告)日：2016-12-22

申请号：US15251915

申请日：2016-08-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Jeroen Johannes Sophia Maria MERTENS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Roelof Frederik DE GRAAF ,  Christiaan Alexander HOOGENDAM ,  Antonius Johannus VAN DER NET ,  Franciscus Johannes Herman Maria TEUNISSEN ,  Patricius Aloysius Jacobus TINNEMANS ,  Martinus Cornelis Maria VERHAGEN ,  Jacobus Johannus Leonardus Hendricus VERSPAY ,  Edwin Augustinus Matheus VAN GOMPEL

IPC: G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70341

Abstract: A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.