Invention Application
- Patent Title: Lithographic Apparatus
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Application No.: US15568122Application Date: 2016-04-04
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Publication No.: US20180173116A1Publication Date: 2018-06-21
- Inventor: Adrianus Hendrik KOEVOETS , Erik Johan ARLEMARK , Sander Catharina Reinier DERKS , Sjoerd Nicolaas Lambertus DONDERS , Wilfred Edward ENDENDIJK , Franciscus Johannes Joseph JANSSEN , Raymond Wilhelmus Louis LAFARRE , Leon Martin LEVASIER , Jim Vincent OVERKAMP , Nicolaas TEN KATE , Jacobus Cornelis Gerardus VAN DER SANDEN
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Priority: EP15164362.4 20150421; EP15169023.7 20150522; EP15192297.8 20151030; EP15201030.2 20151218
- International Application: PCT/EP2016/057349 WO 20160404
- Main IPC: G03F7/20
- IPC: G03F7/20 ; H01L21/67
Abstract:
A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus (40) for cooling the substrate, wherein the cooling apparatus comprises a cooling element (42, 44) located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.
Public/Granted literature
- US10416574B2 Lithographic apparatus Public/Granted day:2019-09-17
Information query
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