公开(公告)号：US11614689B2

公开(公告)日：2023-03-28

申请号：US17580696

申请日：2022-01-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Erik Henricus Egidius Catharina Eummelen ,  Giovanni Luca Gattobigio ,  Johannes Cornelis Paulus Melman ,  Han Henricus Aldegonda Lempens ,  Miao Yu ,  Cornelius Maria Rops ,  Ruud Olieslagers ,  Artunç Ulucan ,  Theodorus Wilhelmus Polet ,  Patrick Johannes Wilhelmus Spruytenburg

IPC: G03F7/20 ,  H01L21/027

Abstract: An immersion lithographic apparatus having a fluid handling structure, the fluid handling structure configured to confine immersion fluid to a region and including: a meniscus controlling feature having an extractor exit on a surface of the fluid handling structure; and a gas knife system outwards of the extractor exit and including passages each having an exit, the passages having a plurality of first passages having a plurality of corresponding first exits on the surface, and a plurality of second passages having a plurality of corresponding second exits outwards of the first exits on the surface, wherein the surface faces and is substantially parallel to a top surface of a substrate during exposure, and the first exits and the second exits are arranged at a greater distance from the substrate than the extractor exit.

公开(公告)号：US10268127B2

公开(公告)日：2019-04-23

申请号：US15589705

申请日：2017-05-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Michel Riepen ,  Christiaan Alexander Hoogendam ,  Paulus Martinus Maria Liebregts ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Johannes Simons ,  Daniël Jozef Maria Direcks ,  Paul Petrus Joannes Berkvens ,  Eva Mondt ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Koen Steffens ,  Han Henricus Aldegonda Lempens ,  Mathieus Anna Karel Van Lierop ,  Christophe De Metsenaere ,  Marcio Alexandre Cano Miranda ,  Patrick Johannes Wilhelmus Spruytenburg ,  Joris Johan Anne-Marie Verstraete ,  Franciscus Johannes Joseph Janssen

IPC: G03F7/20

Abstract: A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.

公开(公告)号：US10001712B2

公开(公告)日：2018-06-19

申请号：US15328376

申请日：2015-06-26

Applicant: ASML Netherlands B.V.

Inventor： Theodorus Wilhelmus Polet ,  Johannes Jacobus Matheus Baselmans ,  Willem Jan Bouman ,  Han Henricus Aldegonda Lempens ,  Theodorus Marinus Modderman ,  Cornelius Maria Rops ,  Bart Smeets ,  Koen Steffens ,  Ronald Van Der Ham

IPC: G03B27/52 ,  G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341 ,  G03F7/7095

Abstract: An immersion lithographic apparatus includes a projection system. The projection system is configured to project a patterned radiation beam through an immersion liquid onto a target portion of a substrate. An external surface of the projection system includes a first surface. The first surface has a non-planar shape. An element is attached to the first surface and positioned so that at least a portion of the element contacts the immersion liquid in use. The element includes a closed loop of continuously integral material in a preformed state and conforms to the non-planar shape of the first surface.

公开(公告)号：US11372336B2

公开(公告)日：2022-06-28

申请号：US16464361

申请日：2017-11-01

Applicant: ASML NETHERLANDS B.V.

Inventor： Erik Henricus Egidius Catharina Eummelen ,  Frank Debougnoux ,  Koen Cuypers ,  Han Henricus Aldegonda Lempens ,  Theodorus Wilhelmus Polet ,  Jorge Alberto Vieyra Salas ,  John Maria Bombeeck ,  Johannes Cornelis Paulus Melman ,  Giovanni Luca Gattobigio

IPC: G03F7/20

Abstract: An immersion lithography apparatus controller configured to control a positioner to move a support table to follow an exposure route and to control a liquid confinement structure, the controller configured to: predict whether liquid will be lost from an immersion space during at least one motion of the route in which an edge of the object passes under an edge of the immersion space, and if liquid loss from the immersion space is predicted, modify the fluid flow such that a first fluid flow rate into or out of an opening at a leading edge of the liquid confinement structure is different to a second fluid flow rate into or out of an opening at a trailing edge of the liquid confinement structure during the motion of predicted liquid loss or a motion of the route subsequent to the motion of predicted liquid loss.

公开(公告)号：US11086239B2

公开(公告)日：2021-08-10

申请号：US16981813

申请日：2019-03-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Miao Yu ,  Petrus Martinus Gerardus Johannes Arts ,  Erik Henricus Egidius Catharina Eummelen ,  Giovanni Luca Gattobigio ,  Maarten Holtrust ,  Han Henricus Aldegonda Lempens ,  Ferdy Migchelbrink ,  Theodorus Wilhelmus Polet ,  Gheorghe Tanasa

IPC: G03F7/20

Abstract: A cleaning device for an apparatus for processing production substrates, the cleaning device including: a body having dimensions similar to the production substrates so that the cleaning device is compatible with the apparatus, the body having a first major surface and a second major surface facing in the opposite direction to the first major surface; a chamber within the body configured to accommodate contaminants; an inlet from the first major surface to the chamber and configured to allow contaminants to be drawn into the chamber by a flow of fluid; and an outlet from the chamber to the second major surface, the cleaning device being configured to allow the fluid to exit the chamber but to prevent a contaminant leaving the chamber.

公开(公告)号：US09645506B2

公开(公告)日：2017-05-09

申请号：US14106403

申请日：2013-12-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Michel Riepen ,  Christiaan Alexander Hoogendam ,  Paulus Martinus Maria Liebregts ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Johannes Simons ,  Daniël Jozef Maria Direcks ,  Paul Petrus Joannes Berkvens ,  Eva Mondt ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Koen Steffens ,  Han Henricus Aldegonda Lempens ,  Mathieus Anna Karel Van Lierop ,  Christophe De Metsenaere ,  Marcio Alexandre Cano Miranda ,  Patrick Johannes Wilhelmus Spruytenburg ,  Joris Johan Anne-Marie Verstraete ,  Franciscus Johannes Joseph Janssen

IPC: G03B27/52 ,  G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341

Abstract: A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.

公开(公告)号：US20240036477A1

公开(公告)日：2024-02-01

申请号：US18463667

申请日：2023-09-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Erik Henricus Egidius Catharina EUMMELEN ,  Frank Debougnoux ,  Koen Cuypers ,  Han Henricus Aldegonda Lempens ,  Theodorus Wilhelmus Polet ,  Jorge Alberto Vieyra Salas ,  John Maria Bombeeck ,  Johannes Cornelis Paulus Melman ,  Giovanni Luca Gattobigio

IPC: G03F7/00

CPC classification number: G03F7/70341 ,  G03F7/70725

Abstract: An immersion lithography apparatus controller configured to control a positioner to move a support table to follow an exposure route and to control a liquid confinement structure, the controller configured to: predict whether liquid will be lost from an immersion space during at least one motion of the route in which an edge of the object passes under an edge of the immersion space, and if liquid loss from the immersion space is predicted, modify the fluid flow such that a first fluid flow rate into or out of an opening at a leading edge of the liquid confinement structure is different to a second fluid flow rate into or out of an opening at a trailing edge of the liquid confinement structure during the motion of predicted liquid loss or a motion of the route subsequent to the motion of predicted liquid loss.

公开(公告)号：US20220308459A1

公开(公告)日：2022-09-29

申请号：US17838946

申请日：2022-06-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Erik Henricus Egidius Catharina EUMMELEN ,  Frank Debougnoux ,  Koen Cuypers ,  Han Henricus Aldegonda Lempens ,  Theodorus Wilhelmus Polet ,  Jorge Alberto Vieyra Salas ,  John Maria Bombeeck ,  Johannes Cornelis Paulus Melman ,  Giovanni Luca Gattobigio

IPC: G03F7/20

Abstract: An immersion lithography apparatus controller configured to control a positioner to move a support table to follow an exposure route and to control a liquid confinement structure, the controller configured to: predict whether liquid will be lost from an immersion space during at least one motion of the route in which an edge of the object passes under an edge of the immersion space, and if liquid loss from the immersion space is predicted, modify the fluid flow such that a first fluid flow rate into or out of an opening at a leading edge of the liquid confinement structure is different to a second fluid flow rate into or out of an opening at a trailing edge of the liquid confinement structure during the motion of predicted liquid loss or a motion of the route subsequent to the motion of predicted liquid loss.

公开(公告)号：US11231653B2

公开(公告)日：2022-01-25

申请号：US17186117

申请日：2021-02-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Erik Henricus Egidius Catharina Eummelen ,  Giovanni Luca Gattobigio ,  Johannes Cornelis Paulus Melman ,  Han Henricus Aldegonda Lempens ,  Miao Yu ,  Cornelius Maria Rops ,  Ruud Olieslagers ,  Artunç Ulucan ,  Theodorus Wilhelmus Polet ,  Patrick Johannes Wilhelmus Spruytenburg

IPC: G03F7/20 ,  H01L21/027

Abstract: An immersion lithographic apparatus having a fluid handling structure, the fluid handling structure configured to confine immersion fluid to a region and including: a meniscus controlling feature having an extractor exit on a surface of the fluid handling structure; and a gas knife system outwards of the extractor exit and including passages each having an exit, the passages having a plurality of first passages having a plurality of corresponding first exits on the surface, and a plurality of second passages having a plurality of corresponding second exits outwards of the first exits on the surface, wherein the surface faces and is substantially parallel to a top surface of a substrate during exposure, and the first exits and the second exits are arranged at a greater distance from the substrate than the extractor exit.

公开(公告)号：US10969695B2

公开(公告)日：2021-04-06

申请号：US16570382

申请日：2019-09-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Erik Henricus Egidius Catharina Eummelen ,  Giovanni Luca Gattobigio ,  Johannes Cornelis Paulus Melman ,  Han Henricus Aldegonda Lempens ,  Miao Yu ,  Cornelius Maria Rops ,  Ruud Olieslagers ,  Artunç Ulucan ,  Theodorus Wilhelmus Polet ,  Patrick Johannes Wilhelmus Spruytenburg

IPC: H01L21/027 ,  G03F7/20

Abstract: An immersion lithographic apparatus having a fluid handling structure, the fluid handling structure configured to confine immersion fluid to a region and including: a meniscus controlling feature having an extractor exit on a surface of the fluid handling structure; and a gas knife system outwards of the extractor exit and including passages each having an exit, the passages having a plurality of first passages having a plurality of corresponding first exits on the surface, and a plurality of second passages having a plurality of corresponding second exits outwards of the first exits on the surface, wherein the surface faces and is substantially parallel to a top surface of a substrate during exposure, and the first exits and the second exits are arranged at a greater distance from the substrate than the extractor exit.