公开(公告)号：US11231653B2

公开(公告)日：2022-01-25

申请号：US17186117

申请日：2021-02-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Erik Henricus Egidius Catharina Eummelen ,  Giovanni Luca Gattobigio ,  Johannes Cornelis Paulus Melman ,  Han Henricus Aldegonda Lempens ,  Miao Yu ,  Cornelius Maria Rops ,  Ruud Olieslagers ,  Artunç Ulucan ,  Theodorus Wilhelmus Polet ,  Patrick Johannes Wilhelmus Spruytenburg

IPC: G03F7/20 ,  H01L21/027

Abstract: An immersion lithographic apparatus having a fluid handling structure, the fluid handling structure configured to confine immersion fluid to a region and including: a meniscus controlling feature having an extractor exit on a surface of the fluid handling structure; and a gas knife system outwards of the extractor exit and including passages each having an exit, the passages having a plurality of first passages having a plurality of corresponding first exits on the surface, and a plurality of second passages having a plurality of corresponding second exits outwards of the first exits on the surface, wherein the surface faces and is substantially parallel to a top surface of a substrate during exposure, and the first exits and the second exits are arranged at a greater distance from the substrate than the extractor exit.

公开(公告)号：US11187991B2

公开(公告)日：2021-11-30

申请号：US14858885

申请日：2015-09-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Christian Gerardus Norbertus Hendricus Marie Cloin ,  Nicolaas Ten Kate ,  Nicolaas Rudolf Kemper ,  Marco Koert Stavenga ,  Erik Henricus Egidius Catharina Eummelen ,  Michel Riepen ,  Olga Vladimirovna Elisseeva ,  Tijmen Wilfred Mathijs Gunther ,  Michaël Christiaan Van Der Wekken

IPC: G03F7/20

Abstract: A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap.

公开(公告)号：US10969695B2

公开(公告)日：2021-04-06

申请号：US16570382

申请日：2019-09-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Erik Henricus Egidius Catharina Eummelen ,  Giovanni Luca Gattobigio ,  Johannes Cornelis Paulus Melman ,  Han Henricus Aldegonda Lempens ,  Miao Yu ,  Cornelius Maria Rops ,  Ruud Olieslagers ,  Artunç Ulucan ,  Theodorus Wilhelmus Polet ,  Patrick Johannes Wilhelmus Spruytenburg

IPC: H01L21/027 ,  G03F7/20

Abstract: An immersion lithographic apparatus having a fluid handling structure, the fluid handling structure configured to confine immersion fluid to a region and including: a meniscus controlling feature having an extractor exit on a surface of the fluid handling structure; and a gas knife system outwards of the extractor exit and including passages each having an exit, the passages having a plurality of first passages having a plurality of corresponding first exits on the surface, and a plurality of second passages having a plurality of corresponding second exits outwards of the first exits on the surface, wherein the surface faces and is substantially parallel to a top surface of a substrate during exposure, and the first exits and the second exits are arranged at a greater distance from the substrate than the extractor exit.

公开(公告)号：US10534270B2

公开(公告)日：2020-01-14

申请号：US16269745

申请日：2019-02-07

Applicant: ASML Netherlands B.V.

Inventor： Norbertus Josephus Martinus Van den Nieuwelaar ,  Victor Manuel Blanco Carballo ,  Casper Roderik De Groot ,  Rolf Hendrikus Jacobus Custers ,  David Merritt Phillips ,  Frederik Antonius Van der Zanden ,  Pieter Lein Joseph Gunter ,  Erik Henricus Egidius Catharina Eummelen ,  Yuri Johannes Gabriël Van de Vijver ,  Bert Dirk Scholten ,  Marijn Wouters ,  Ronald Frank Kox ,  Jorge Alberto Vieyra Salas

IPC: G06F7/20 ,  G03F7/20 ,  G02B27/00

Abstract: An immersion lithography apparatus has a controller configured to control a substrate table to move along an exposure route including in order: an entry motion in which the substrate moves from an off-substrate position at which the immersion space does not overlap the substrate to an on-substrate position at which the immersion space at least partially overlaps the substrate, a transfer motion in which the substrate table changes speed and/or direction and moves for at least a transfer time after the substrate moves to the on-substrate position, and an expose motion in which the substrate is scanned and the patterned beam is projected onto the substrate, wherein throughout the transfer motion at least a part of the immersion space overlaps the substrate and wherein the patterned beam is not projected onto the substrate during the entry motion and the transfer motion.

公开(公告)号：US20190146352A1

公开(公告)日：2019-05-16

申请号：US16249518

申请日：2019-01-16

Applicant: ASML Netherlands B.V.

Inventor： Seerwan Saeed ,  Petrus Martinus Gerardus Johannes Arts ,  Harold Sebastiaan Buddenberg ,  Erik Henricus Egidius Catharina Eummelen ,  Giovanni Luca Gattobigio ,  Floor Lodewijk Keukens ,  Ferdy Migchelbrink ,  Jeroen Arnoldus Leonardus Johannes Raaymakers ,  Arnoldus Johannes Martinus Jozeph Ras ,  Gheorghe Tanasa ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Daan Daniel Johannes Antonius Van Sommeren ,  Marijn Wouters ,  Miao Yu

IPC: G03F7/20 ,  H01L21/66 ,  G01N21/95

Abstract: An inspection substrate for inspecting a component, such as a liquid confinement system, of an apparatus for processing production substrates is discussed. The inspection substrate includes a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus, an illumination device, such as light emitting diodes, embedded in the body, a sensor, such as an imaging device or a pressure sensor, that is embedded in the body and configured to generate inspection information, such as image data, relating to a parameter of the component of the apparatus proximate to the inspection substrate, and a storage device embedded in the body and configured to store the inspection information.

公开(公告)号：US20170023870A1

公开(公告)日：2017-01-26

申请号：US15287524

申请日：2016-10-06

Applicant: ASML NETHERLANDS B.V.

Inventor： Clemens Johannes Gerardus VAN DEN DUNGEN ,  Nicolaas Franciscus Koppelaars ,  Martinus Hendrikus Antonius Leenders ,  Paulus Martinus Maria Liebregts ,  Johannes Catharinus Hubertus Mulkens ,  Erik Henricus Egidius Catharina Eummelen ,  Marcel Beckers ,  Richard Moerman ,  Cédric Désiré Grouwstra ,  Danny Maria Hubertus Philips ,  Remko Jan Peter Verhees ,  Pieter Mulder ,  Evert Van Vliet

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70866

Abstract: An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes.

Abstract translation: 公开了一种浸没式光刻设备，其包括被配置为供应流体的流体供应系统，所述流体供应系统具有在第一侧壁中具有多个入口孔的腔室和在第二侧壁中的多个出口孔，所述第一 面向第二侧壁的侧壁，其中入口孔引导流体沿朝向多个出口孔之间的第二侧壁的区域的方向进入腔室。

公开(公告)号：US20150055103A1

公开(公告)日：2015-02-26

申请号：US14473700

申请日：2014-08-29

Applicant: ASML NETHERLANDS B.V.

Inventor： David BESSEMS ,  Rogier Hendrikus Magdalena Cortie ,  Marcus Johannes Van der Zanden ,  Cornelius Maria Rops ,  Paul Willems ,  Jimmy Matheus Wilhelmus Van de Winkel ,  Erik Henricus Egidius Catharina Eummelen

IPC: G03F7/20

CPC classification number: G03F7/70341

Abstract: A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; a gas supply opening radially outward of the meniscus pinning feature; and a gas recovery opening radially outward of the meniscus pinning feature and at least partly surrounding the gas supply opening.

Abstract translation: 一种用于光刻设备的流体处理结构，所述流体处理结构在从被配置为将浸没流体包含在流体处理结构外部的区域的空间的边界处具有：弯液面锁定特征，以阻止浸没流体在径向向外 方向从空间; 位于弯月面钉扎特征的径向外侧的气体供应开口; 以及位于弯液面钉扎特征的径向外侧并且至少部分地围绕气体供应开口的气体回收开口。

公开(公告)号：US11372336B2

公开(公告)日：2022-06-28

申请号：US16464361

申请日：2017-11-01

Applicant: ASML NETHERLANDS B.V.

Inventor： Erik Henricus Egidius Catharina Eummelen ,  Frank Debougnoux ,  Koen Cuypers ,  Han Henricus Aldegonda Lempens ,  Theodorus Wilhelmus Polet ,  Jorge Alberto Vieyra Salas ,  John Maria Bombeeck ,  Johannes Cornelis Paulus Melman ,  Giovanni Luca Gattobigio

IPC: G03F7/20

Abstract: An immersion lithography apparatus controller configured to control a positioner to move a support table to follow an exposure route and to control a liquid confinement structure, the controller configured to: predict whether liquid will be lost from an immersion space during at least one motion of the route in which an edge of the object passes under an edge of the immersion space, and if liquid loss from the immersion space is predicted, modify the fluid flow such that a first fluid flow rate into or out of an opening at a leading edge of the liquid confinement structure is different to a second fluid flow rate into or out of an opening at a trailing edge of the liquid confinement structure during the motion of predicted liquid loss or a motion of the route subsequent to the motion of predicted liquid loss.

公开(公告)号：US20220082948A1

公开(公告)日：2022-03-17

申请号：US17531953

申请日：2021-11-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Christian Gerardus Norbertus Hendricus Marie CLOIN ,  Nicolaas Ten Kate ,  Nicolaas Rudolf Kemper ,  Marco Koert Stavenga ,  Erik Henricus Egidius Catharina Eummelen ,  Michel Riepen ,  Olga Vladimirovna Elisseeva ,  Tijmen Wilfred Mathijs Gunther ,  Michael Christiaan Van Der Wekken

IPC: G03F7/20

Abstract: A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap.

公开(公告)号：US11086239B2

公开(公告)日：2021-08-10

申请号：US16981813

申请日：2019-03-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Miao Yu ,  Petrus Martinus Gerardus Johannes Arts ,  Erik Henricus Egidius Catharina Eummelen ,  Giovanni Luca Gattobigio ,  Maarten Holtrust ,  Han Henricus Aldegonda Lempens ,  Ferdy Migchelbrink ,  Theodorus Wilhelmus Polet ,  Gheorghe Tanasa

IPC: G03F7/20

Abstract: A cleaning device for an apparatus for processing production substrates, the cleaning device including: a body having dimensions similar to the production substrates so that the cleaning device is compatible with the apparatus, the body having a first major surface and a second major surface facing in the opposite direction to the first major surface; a chamber within the body configured to accommodate contaminants; an inlet from the first major surface to the chamber and configured to allow contaminants to be drawn into the chamber by a flow of fluid; and an outlet from the chamber to the second major surface, the cleaning device being configured to allow the fluid to exit the chamber but to prevent a contaminant leaving the chamber.