公开(公告)号：US11726411B2

公开(公告)日：2023-08-15

申请号：US17625467

申请日：2020-06-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Gijs Kramer ,  Ringo Petrus Cornelis Van Dorst

IPC: G03F7/20 ,  H01L21/67 ,  G03F7/00

CPC classification number: G03F7/7085 ,  H01L21/67288

Abstract: A substrate shape measuring device, including: a substrate support to support a substrate having a main surface, the main surface of the substrate when supported by the substrate support substantially extending in a first plane; one or more sensor assemblies, each including a light emitter to emit light along a light axis substantially parallel to the first plane and a light sensor arranged to receive the light; and a processing device arranged to determine a shape of the substrate, wherein the substrate shape measuring device is constructed to measure with the one or more sensor assemblies in at least a first measurement direction with respect to the substrate substantially parallel to the first plane and a second measurement direction with respect to the substrate substantially parallel to the first plane.

公开(公告)号：US11243476B2

公开(公告)日：2022-02-08

申请号：US17050149

申请日：2019-03-27

Applicant: ASML Netherlands B.V.

Inventor： Ringo Petrus Cornelis Van Dorst ,  Gijs Kramer ,  Benjamin Cunnegonda Henricus Smeets ,  Mark Johannes Hermanus Frencken

IPC: G03F7/20 ,  H01L21/67

Abstract: The invention provides a stage apparatus comprising an object support, a plurality of support members, a gripper and a control unit. The object support comprises a surface for mounting an object on, the surface extending in a plane. The plurality of support members are for supporting the object, and are arranged to receive the object from a gripper and to arrange the object on the surface and/or vice versa. The support members are moveable in at least a first direction which is perpendicular to the plane. The control unit is arranged to receive shape information regarding an out-of-plane-shape of the object, and is arranged to control positions of the support members. The control unit is arranged to tilt the object while supported by the support members by controlling the positions so as to reduce a space consumption of the object in the first direction, based on the shape information.

公开(公告)号：US12140873B2

公开(公告)日：2024-11-12

申请号：US17793525

申请日：2021-01-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Paul Corné Henri De Wit ,  Ringo Petrus Cornelis Van Dorst

IPC: G03F7/00

Abstract: A positioning device, including: a first positioning module arranged to support and position a first substrate, a second positioning module arranged to support and position a second substrate, a first positioning field in which the first and second positioning modules can be alternatingly positioned to carry out a first processing sequence, a second positioning field in which the first and second positioning modules can be alternatingly positioned to carry out a second processing sequence, wherein when one of the first and second positioning modules is carrying out or finishing the first processing sequence, the other of the first and second positioning modules has finished the second processing sequence and is positioned closer to the one of the first and second positioning modules.

公开(公告)号：US11664264B2

公开(公告)日：2023-05-30

申请号：US16075754

申请日：2016-12-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Andre Bernardus Jeunink ,  Robby Franciscus Josephus Martens ,  Youssef Karel Maria De Vos ,  Ringo Petrus Cornelis Van Dorst ,  Gerhard Albert Ten Brinke ,  Dirk Jerome Andre Senden ,  Coen Hubertus Matheus Baltis ,  Justin Johannes Hermanus Gerritzen ,  Jelmer Mattheüs Kamminga ,  Evelyn Wallis Pacitti ,  Thomas Poiesz ,  Arie Cornelis Scheiberlich ,  Bert Dirk Scholten ,  André Schreuder ,  Abraham Alexander Soethoudt ,  Siegfried Alexander Tromp ,  Yuri Johannes Gabriël Van De Vijver

IPC: H01L21/683 ,  H01L21/687 ,  G03F7/20 ,  B25B11/00

CPC classification number: H01L21/6838 ,  B25B11/005 ,  G03F7/707 ,  G03F7/70733 ,  H01L21/68742

Abstract: A method for unloading a substrate from a support table configured to support the substrate, the method including: supplying gas to a gap between a base surface of the support table and the substrate via a plurality of gas flow openings in the support table, wherein during an initial phase of unloading the gas is supplied through at least one gas flow opening in an outer region of the support table and not through any gas flow opening in a central region of the support table radially inward of the outer region, and during a subsequent phase of unloading the gas is supplied through at least one gas flow opening in the outer region and at least one gas flow opening in the central region.