公开(公告)号：US10705426B2

公开(公告)日：2020-07-07

申请号：US16097640

申请日：2017-04-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Gijs Kramer ,  Martijn Houben ,  Nicholas Peter Waterson ,  Thibault Simon Mathieu Laurent ,  Yuri Johannes Gabriël Van De Vijver ,  Marcus Martinus Petrus Adrianus Vermeulen ,  Simon Karel Ravensbergen ,  Vincentius Fransiscus Cloosterman ,  Siegfried Alexander Tromp ,  Coen Hubertus Matheus Baltis ,  Justin Johannes Hermanus Gerritzen ,  Niek Jacobus Johannes Roset

IPC: G03F7/20

Abstract: An extraction body for a support apparatus of a lithographic apparatus. The support apparatus is configured to support an object. The extraction body is formed with an opening at a surface thereof. The opening extends within the extraction body forming a first passageway. The first passageway is configured to fluidly communicate an extraction channel in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.

公开(公告)号：US11500296B2

公开(公告)日：2022-11-15

申请号：US17519713

申请日：2021-11-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Giovanna De Simone ,  Marco Adrianus Peter Van Den Heuvel ,  Thibault Simon Mathieu Laurent ,  Ruud Hendrikus Martinus Johannes Bloks ,  Niek Jacobus Johannes Roset ,  Justin Johannes Hermanus Gerritzen

IPC: G03F7/20

Abstract: A method of unloading an object from a support table, the object clamped to the support table during an exposure process by: applying a first pressure to a central region of the support table under a central portion of the object; and applying a second pressure to a peripheral region of the support table under a peripheral portion of the object, wherein during clamping the first pressure and the second pressure are controlled such that liquid is retained between the object and a seal member that is positioned radially between the central region and the peripheral region at an upper surface of the support table and protrudes towards the object, the method including: increasing the first pressure towards ambient pressure; removing at least some of the liquid retained between the object and the seal member by decreasing the second pressure; and increasing the second pressure towards the ambient pressure.

公开(公告)号：US11175594B2

公开(公告)日：2021-11-16

申请号：US16617242

申请日：2018-05-03

Applicant: ASML NETHERLANDS B.V.

Inventor： Giovanna De Simone ,  Marco Adrianus Peter Van Den Heuvel ,  Thibault Simon Mathieu Laurent ,  Ruud Hendrikus Martinus Johannes Bloks ,  Niek Jacobus Johannes Roset ,  Justin Johannes Hermanus Gerritzen

IPC: G03F7/20

Abstract: A method of unloading an object from a support table, the object clamped to the support table during an exposure process by: applying a first pressure to a central region of the support table under a central portion of the object; and applying a second pressure to a peripheral region of the support table under a peripheral portion of the object, wherein during clamping the first pressure and the second pressure are controlled such that liquid is retained between the object and a seal member that is positioned radially between the central region and the peripheral region at an upper surface of the support table and protrudes towards the object, the method including: increasing the first pressure towards ambient pressure; removing at least some of the liquid retained between the object and the seal member by decreasing the second pressure; and increasing the second pressure towards the ambient pressure.

公开(公告)号：US11846879B2

公开(公告)日：2023-12-19

申请号：US17982226

申请日：2022-11-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Giovanna De Simone ,  Marco Adrianus Peter Van Den Heuvel ,  Thibault Simon Mathieu Laurent ,  Ruud Hendrikus Martinus Johannes Bloks ,  Niek Jacobus Johannes Roset ,  Justin Johannes Hermanus Gerritzen

IPC: G03F7/00

CPC classification number: G03F7/70725 ,  G03F7/70775

Abstract: A method of unloading an object from a support table, the object clamped to the support table during an exposure process by: applying a first pressure to a central region of the support table under a central portion of the object; and applying a second pressure to a peripheral region of the support table under a peripheral portion of the object, wherein during clamping the first pressure and the second pressure are controlled such that liquid is retained between the object and a seal member that is positioned radially between the central region and the peripheral region at an upper surface of the support table and protrudes towards the object, the method including: increasing the first pressure towards ambient pressure; removing at least some of the liquid retained between the object and the seal member by decreasing the second pressure; and increasing the second pressure towards the ambient pressure.

公开(公告)号：US11664264B2

公开(公告)日：2023-05-30

申请号：US16075754

申请日：2016-12-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Andre Bernardus Jeunink ,  Robby Franciscus Josephus Martens ,  Youssef Karel Maria De Vos ,  Ringo Petrus Cornelis Van Dorst ,  Gerhard Albert Ten Brinke ,  Dirk Jerome Andre Senden ,  Coen Hubertus Matheus Baltis ,  Justin Johannes Hermanus Gerritzen ,  Jelmer Mattheüs Kamminga ,  Evelyn Wallis Pacitti ,  Thomas Poiesz ,  Arie Cornelis Scheiberlich ,  Bert Dirk Scholten ,  André Schreuder ,  Abraham Alexander Soethoudt ,  Siegfried Alexander Tromp ,  Yuri Johannes Gabriël Van De Vijver

IPC: H01L21/683 ,  H01L21/687 ,  G03F7/20 ,  B25B11/00

CPC classification number: H01L21/6838 ,  B25B11/005 ,  G03F7/707 ,  G03F7/70733 ,  H01L21/68742

Abstract: A method for unloading a substrate from a support table configured to support the substrate, the method including: supplying gas to a gap between a base surface of the support table and the substrate via a plurality of gas flow openings in the support table, wherein during an initial phase of unloading the gas is supplied through at least one gas flow opening in an outer region of the support table and not through any gas flow opening in a central region of the support table radially inward of the outer region, and during a subsequent phase of unloading the gas is supplied through at least one gas flow opening in the outer region and at least one gas flow opening in the central region.

公开(公告)号：US11385547B2

公开(公告)日：2022-07-12

申请号：US16879961

申请日：2020-05-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Gijs Kramer ,  Martijn Houben ,  Nicholas Peter Waterson ,  Thibault Simon Mathieu Laurent ,  Yuri Johannes Gabriël Van De Vijver ,  Marcus Martinus Petrus Adrianus Vermeulen ,  Simon Karel Ravensbergen ,  Vincentius Fransiscus Cloosterman ,  Siegfried Alexander Tromp ,  Coen Hubertus Matheus Baltis ,  Justin Johannes Hermanus Gerritzen ,  Niek Jacobus Johannes Roset

IPC: G03F7/20

Abstract: An extraction body for a support apparatus of a lithographic apparatus. The support apparatus is configured to support an object. The extraction body is formed with an opening at a surface thereof. The opening extends within the extraction body forming a first passageway. The first passageway is configured to fluidly communicate an extraction channel in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.

公开(公告)号：US10656536B2

公开(公告)日：2020-05-19

申请号：US15308598

申请日：2015-04-23

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Martinus Hendrikus Antonius Leenders ,  Niek Elout De Kruijf ,  Mircea Dusa ,  Martijn Houben ,  Johannes Gerardus Maria Mulder ,  Thomas Poiesz ,  Marco Adrianus Peter Van Den Heuvel ,  Paul Van Dongen ,  Justin Johannes Hermanus Gerritzen ,  Antonie Hendrik Verweij ,  Abraham Alexander Soethoudt

IPC: B25B11/00 ,  G03F7/20 ,  H01L21/683

Abstract: A substrate support, includes: a substrate support location configured to support a substrate, and a vacuum clamping device configured to clamp the substrate on the substrate support location, wherein the vacuum clamping device includes at least one reduced pressure source to create a reduced pressure, at least one vacuum section connected to the at least one reduced pressure source, wherein the at least one vacuum section is configured to attract the substrate towards the substrate support location, and a control device configured to control a spatial pressure profile along the at least one vacuum section with which the substrate is attracted by the vacuum clamping device, wherein the control device includes a substrate shape data input to receive substrate shape data representing shape data of the substrate to be clamped, and wherein the control device is configured to adapt the spatial pressure profile in dependency of the substrate shape data.