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公开(公告)号：US11175594B2
公开(公告)日：2021-11-16
申请号：US16617242
申请日：2018-05-03
Applicant: ASML NETHERLANDS B.V.
Inventor： Giovanna De Simone , Marco Adrianus Peter Van Den Heuvel , Thibault Simon Mathieu Laurent , Ruud Hendrikus Martinus Johannes Bloks , Niek Jacobus Johannes Roset , Justin Johannes Hermanus Gerritzen
IPC: G03F7/20
Abstract: A method of unloading an object from a support table, the object clamped to the support table during an exposure process by: applying a first pressure to a central region of the support table under a central portion of the object; and applying a second pressure to a peripheral region of the support table under a peripheral portion of the object, wherein during clamping the first pressure and the second pressure are controlled such that liquid is retained between the object and a seal member that is positioned radially between the central region and the peripheral region at an upper surface of the support table and protrudes towards the object, the method including: increasing the first pressure towards ambient pressure; removing at least some of the liquid retained between the object and the seal member by decreasing the second pressure; and increasing the second pressure towards the ambient pressure.
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公开(公告)号：US11139196B2
公开(公告)日：2021-10-05
申请号：US16650939
申请日：2018-09-19
Applicant: ASML NETHERLANDS B.V.
Inventor： Niek Jacobus Johannes Roset , Marcus Martinus Petrus Adrianus Vermeulen , Simon Karel Ravensbergen , Mark Constant Johannes Baggen , Gijs Kramer , Roger Anton Marie Timmermans , Frank Pieter Albert Van Den Berkmortel
IPC: G03F7/20 , H01L21/687
Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder having a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member, and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.
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公开(公告)号：US10705426B2
公开(公告)日：2020-07-07
申请号：US16097640
申请日：2017-04-05
Applicant: ASML NETHERLANDS B.V.
Inventor： Gijs Kramer , Martijn Houben , Nicholas Peter Waterson , Thibault Simon Mathieu Laurent , Yuri Johannes Gabriël Van De Vijver , Marcus Martinus Petrus Adrianus Vermeulen , Simon Karel Ravensbergen , Vincentius Fransiscus Cloosterman , Siegfried Alexander Tromp , Coen Hubertus Matheus Baltis , Justin Johannes Hermanus Gerritzen , Niek Jacobus Johannes Roset
IPC: G03F7/20
Abstract: An extraction body for a support apparatus of a lithographic apparatus. The support apparatus is configured to support an object. The extraction body is formed with an opening at a surface thereof. The opening extends within the extraction body forming a first passageway. The first passageway is configured to fluidly communicate an extraction channel in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.
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公开(公告)号：US10578959B2
公开(公告)日：2020-03-03
申请号：US15567279
申请日：2016-03-22
Applicant: ASML NETHERLANDS B.V.
Inventor： Gijs Kramer , Simon Karel Ravensbergen , Niek Jacobus Johannes Roset , Pieter Renaat Maria Hennus
Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body includes a projection configured such that it surrounds the object holder and such that, in use, a layer of immersion liquid is retained on the projection and in contact with an object supported on the object holder.
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公开(公告)号：US11846879B2
公开(公告)日：2023-12-19
申请号：US17982226
申请日：2022-11-07
Applicant: ASML NETHERLANDS B.V.
Inventor： Giovanna De Simone , Marco Adrianus Peter Van Den Heuvel , Thibault Simon Mathieu Laurent , Ruud Hendrikus Martinus Johannes Bloks , Niek Jacobus Johannes Roset , Justin Johannes Hermanus Gerritzen
IPC: G03F7/00
CPC classification number: G03F7/70725 , G03F7/70775
Abstract: A method of unloading an object from a support table, the object clamped to the support table during an exposure process by: applying a first pressure to a central region of the support table under a central portion of the object; and applying a second pressure to a peripheral region of the support table under a peripheral portion of the object, wherein during clamping the first pressure and the second pressure are controlled such that liquid is retained between the object and a seal member that is positioned radially between the central region and the peripheral region at an upper surface of the support table and protrudes towards the object, the method including: increasing the first pressure towards ambient pressure; removing at least some of the liquid retained between the object and the seal member by decreasing the second pressure; and increasing the second pressure towards the ambient pressure.
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Patent Agency Ranking
公开(公告)号：US11385547B2
公开(公告)日：2022-07-12
申请号：US16879961
申请日：2020-05-21
Applicant: ASML NETHERLANDS B.V.
Inventor： Gijs Kramer , Martijn Houben , Nicholas Peter Waterson , Thibault Simon Mathieu Laurent , Yuri Johannes Gabriël Van De Vijver , Marcus Martinus Petrus Adrianus Vermeulen , Simon Karel Ravensbergen , Vincentius Fransiscus Cloosterman , Siegfried Alexander Tromp , Coen Hubertus Matheus Baltis , Justin Johannes Hermanus Gerritzen , Niek Jacobus Johannes Roset
IPC: G03F7/20
Abstract: An extraction body for a support apparatus of a lithographic apparatus. The support apparatus is configured to support an object. The extraction body is formed with an opening at a surface thereof. The opening extends within the extraction body forming a first passageway. The first passageway is configured to fluidly communicate an extraction channel in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.
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公开(公告)号：US11500296B2
公开(公告)日：2022-11-15
申请号：US17519713
申请日：2021-11-05
Applicant: ASML NETHERLANDS B.V.
Inventor： Giovanna De Simone , Marco Adrianus Peter Van Den Heuvel , Thibault Simon Mathieu Laurent , Ruud Hendrikus Martinus Johannes Bloks , Niek Jacobus Johannes Roset , Justin Johannes Hermanus Gerritzen
IPC: G03F7/20
Abstract: A method of unloading an object from a support table, the object clamped to the support table during an exposure process by: applying a first pressure to a central region of the support table under a central portion of the object; and applying a second pressure to a peripheral region of the support table under a peripheral portion of the object, wherein during clamping the first pressure and the second pressure are controlled such that liquid is retained between the object and a seal member that is positioned radially between the central region and the peripheral region at an upper surface of the support table and protrudes towards the object, the method including: increasing the first pressure towards ambient pressure; removing at least some of the liquid retained between the object and the seal member by decreasing the second pressure; and increasing the second pressure towards the ambient pressure.
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公开(公告)号：USRE48676E1
公开(公告)日：2021-08-10
申请号：US16203799
申请日：2018-11-29
Applicant: ASML NETHERLANDS B.V.
Inventor： Niek Jacobus Johannes Roset , Nicolaas Ten Kate , Sergei Shulepov , Raymond Wilhelmus Louis Lafarre
Abstract: A lithographic apparatus including a fluid handling structure configured to contain immersion fluid in a space adjacent to an upper surface of the substrate table and/or a substrate located in a recess of the substrate table, a cover having a planar main body that, in use, extends around a substrate from the upper surface to a peripheral section of an upper major face of the substrate in order to cover a gap between an edge of the recess and an edge of the substrate, and an immersion fluid film disruptor, configured to disrupt the formation of a film of immersion fluid between an edge of the cover and immersion fluid contained by the fluid handling structure during movement of the substrate table relative to the fluid handling structure.
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公开(公告)号：US11749556B2
公开(公告)日：2023-09-05
申请号：US17481978
申请日：2021-09-22
Applicant: ASML NETHERLANDS B.V.
Inventor： Niek Jacobus Johannes Roset , Marcus Martinus Petrus Adrianus Vermeulen , Simon Karel Ravensbergen , Mark Constant Johannes Baggen , Gijs Kramer , Roger Anton Marie Timmermans , Frank Pieter Albert Van Den Berkmortel
IPC: H01L21/687 , G03F7/20 , G03F7/00
CPC classification number: H01L21/6875 , G03F7/707 , G03F7/70341
Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder having a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member, and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.
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公开(公告)号：USRE47237E1
公开(公告)日：2019-02-12
申请号：US15182514
申请日：2016-06-14
Applicant: ASML NETHERLANDS B.V.
Inventor： Niek Jacobus Johannes Roset , Nicolaas Ten Kate , Sergei Shulepov , Raymond Wilhelmus Louis Lafarre
Abstract: A lithographic apparatus including a fluid handling structure configured to contain immersion fluid in a space adjacent to an upper surface of the substrate table and/or a substrate located in a recess of the substrate table, a cover having a planar main body that, in use, extends around a substrate from the upper surface to a peripheral section of an upper major face of the substrate in order to cover a gap between an edge of the recess and an edge of the substrate, and an immersion fluid film disruptor, configured to disrupt the formation of a film of immersion fluid between an edge of the cover and immersion fluid contained by the fluid handling structure during movement of the substrate table relative to the fluid handling structure.
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