公开(公告)号：US12204255B2

公开(公告)日：2025-01-21

申请号：US18300094

申请日：2023-04-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Nicolaas Ten Kate ,  Joost Jeroen Ottens ,  Bastiaan Andreas Wilhelmus Hubertus Knarren ,  Robbert Jan Voogd ,  Giovanni Francisco Nino ,  Marinus Jan Remie ,  Johannes Henricus Wilhelmus Jacobs ,  Thibault Simon Mathieu Laurent ,  Johan Gertrudis Cornelis Kunnen

IPC: G03F7/00

Abstract: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.

公开(公告)号：USRE48668E1

公开(公告)日：2021-08-03

申请号：US15711901

申请日：2017-09-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Thibault Simon Mathieu Laurent ,  Gerardus Adrianus Antonius Maria Kusters ,  Johan Gertrudis Cornelis Kunnen ,  Sander Catharina Reinier Derks

IPC: G03B27/52 ,  G01K13/00 ,  G03F7/20 ,  G03B27/42

Abstract: A temperature sensing probe including a temperature sensor in an elongate housing wherein the elongate housing of the probe is elongate in a first direction and the elongate housing is comprised of a material which has a thermal conductivity of at least 500 W/mK at 20° C. in at least one direction.

公开(公告)号：US10747126B2

公开(公告)日：2020-08-18

申请号：US16437760

申请日：2019-06-11

Applicant: ASML NETHERLANDS B.V.

Inventor： Johan Gertrudis Cornelis Kunnen ,  Martijn Houben ,  Thibault Simon Mathieu Laurent ,  Hendrikus Johannes Marinus Van Abeelen ,  Armand Rosa Jozef Dassen ,  Sander Catharina Reinier Derks

IPC: G03F7/20 ,  H01L21/68 ,  H01L21/687

Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.

公开(公告)号：US10508896B2

公开(公告)日：2019-12-17

申请号：US15778061

申请日：2016-11-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Stoyan Nihtianov ,  Ruud Hendrikus Martinus Johannes Bloks ,  Johannes Paul Marie De La Rosette ,  Thibault Simon Mathieu Laurent ,  Kofi Afolabi Anthony Makinwa ,  Patricius Jacobus Neefs ,  Johannes Petrus Martinus Bernardus Vermeulen

IPC: G01B7/00 ,  G01B7/16 ,  G03F7/20 ,  H01L21/67 ,  G01K7/01 ,  H01L21/66

Abstract: A measurement substrate for measuring a condition pertaining in an apparatus for processing production substrates during operation thereof, the measurement substrate including: a body having dimensions compatible with the apparatus; a plurality of sensor modules embedded in the body, each sensor module having: a sensor configured generate an analog measurement signal, an analog to digital converter to generate digital measurement information from the analog measurement signal, and a module controller configured to output the digital measurement information; and a central control module configured to receive the digital measurement information from each of the module controllers and to communicate the digital measurement information to an external device.

公开(公告)号：US10324382B2

公开(公告)日：2019-06-18

申请号：US15958714

申请日：2018-04-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Johan Gertrudis Cornelis Kunnen ,  Martijn Houben ,  Thibault Simon Mathieu Laurent ,  Hendrikus Johannes Marinus Van Abeelen ,  Armand Rosa Jozef Dassen ,  Sander Catharina Reinier Derks

IPC: G03F7/20 ,  H01L21/68 ,  H01L21/687

Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.

公开(公告)号：US09915877B2

公开(公告)日：2018-03-13

申请号：US15629399

申请日：2017-06-21

Applicant: ASML Netherlands B.V.

Inventor： Thibault Simon Mathieu Laurent ,  Johannes Henricus Wilhelmus Jacobs ,  Wilhelmus Franciscus Johannes Simons ,  Martijn Houben ,  Raymond Wilhelmus Louis Lafarre ,  Koen Steffens ,  Han Henricus Aldegonda Lempens ,  Rogier Hendrikus Magdalena Cortie ,  Ruud Hendrikus Martinus Johannes Bloks ,  Gerben Pieterse ,  Siegfried Alexander Tromp ,  Theodorus Wilhelmus Polet ,  Jim Vincent Overkamp ,  Van Vuong Vy

IPC: G03B27/52 ,  G03B27/58 ,  H02K41/02 ,  G03F7/20 ,  H01L21/68

CPC classification number: G03F7/70341 ,  G03F7/70716 ,  G03F7/70875 ,  G03F7/7095 ,  H01L21/682

Abstract: An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.

公开(公告)号：US11846879B2

公开(公告)日：2023-12-19

申请号：US17982226

申请日：2022-11-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Giovanna De Simone ,  Marco Adrianus Peter Van Den Heuvel ,  Thibault Simon Mathieu Laurent ,  Ruud Hendrikus Martinus Johannes Bloks ,  Niek Jacobus Johannes Roset ,  Justin Johannes Hermanus Gerritzen

IPC: G03F7/00

CPC classification number: G03F7/70725 ,  G03F7/70775

Abstract: A method of unloading an object from a support table, the object clamped to the support table during an exposure process by: applying a first pressure to a central region of the support table under a central portion of the object; and applying a second pressure to a peripheral region of the support table under a peripheral portion of the object, wherein during clamping the first pressure and the second pressure are controlled such that liquid is retained between the object and a seal member that is positioned radially between the central region and the peripheral region at an upper surface of the support table and protrudes towards the object, the method including: increasing the first pressure towards ambient pressure; removing at least some of the liquid retained between the object and the seal member by decreasing the second pressure; and increasing the second pressure towards the ambient pressure.

公开(公告)号：USRE49297E1

公开(公告)日：2022-11-15

申请号：US16656627

申请日：2019-10-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Hrishikesh Patel ,  Johannes Henricus Wilhelmus Jacobs ,  Gerardus Adrianus Antonius Maria Kusters ,  Thibault Simon Mathieu Laurent ,  Marcio Alexandre Cano Miranda ,  Ruud Hendricus Martinus Johannes Bloks ,  Peng Feng ,  Johan Gertrudis Cornelis Kunnen

IPC: G03F7/20 ,  G03F7/30 ,  H01L21/027 ,  H01L21/67

Abstract: An immersion lithographic apparatus is provided having a substrate table including a drain configured to receive immersion fluid which leaks into a gap between an edge of a substrate on the substrate table and an edge of a recess in which the substrate is located. A thermal conditioning system is provided to thermally condition at least the portion of the recess supporting the substrate by directing one or more jets of fluid onto a reverse side of the section supporting the substrate.

公开(公告)号：US11385547B2

公开(公告)日：2022-07-12

申请号：US16879961

申请日：2020-05-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Gijs Kramer ,  Martijn Houben ,  Nicholas Peter Waterson ,  Thibault Simon Mathieu Laurent ,  Yuri Johannes Gabriël Van De Vijver ,  Marcus Martinus Petrus Adrianus Vermeulen ,  Simon Karel Ravensbergen ,  Vincentius Fransiscus Cloosterman ,  Siegfried Alexander Tromp ,  Coen Hubertus Matheus Baltis ,  Justin Johannes Hermanus Gerritzen ,  Niek Jacobus Johannes Roset

IPC: G03F7/20

Abstract: An extraction body for a support apparatus of a lithographic apparatus. The support apparatus is configured to support an object. The extraction body is formed with an opening at a surface thereof. The opening extends within the extraction body forming a first passageway. The first passageway is configured to fluidly communicate an extraction channel in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.

公开(公告)号：US11281115B2

公开(公告)日：2022-03-22

申请号：US16734579

申请日：2020-01-06

Applicant: ASML NETHERLANDS B.V.

Inventor： Nicolaas Ten Kate ,  Joost Jeroen Ottens ,  Bastiaan Andreas Wilhelmus Hubertus Knarren ,  Robbert Jan Voogd ,  Giovanni Francisco Nino ,  Marinus Jan Remie ,  Johannes Henricus Wilhelmus Jacobs ,  Thibault Simon Mathieu Laurent ,  Johan Gertrudis Cornelis Kunnen

IPC: G03F7/20

Abstract: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.