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公开(公告)号：US10203611B2
公开(公告)日：2019-02-12
申请号：US15818232
申请日：2017-11-20
Applicant: ASML NETHERLANDS B.V.
Inventor： Thibault Simon Mathieu Laurent , Gerardus Adrianus Antonius Maria Kusters , Bastiaan Andreas Wilhelmus Hubertus Knarren , Raymond Wilhelmus Louis Lafarre , Koen Steffens , Takeshi Kaneko , Robbert Jan Voogd , Gregory Martin Mason Corcoran , Ruud Hendrikus Martinus Johannes Bloks , Johan Gertrudis Cornelis Kunnen , Ramin Badie
IPC: G03F7/20
Abstract: A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.
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公开(公告)号：US10191377B2
公开(公告)日：2019-01-29
申请号：US15482526
申请日：2017-04-07
Applicant: ASML NETHERLANDS B.V.
Inventor： Hrishikesh Patel , Johannes Henricus Wilhelmus Jacobs , Gerardus Adrianus Antonius Maria Kusters , Thibault Simon Mathieu Laurent , Marcio Alexandre Cano Miranda , Ruud Hendricus Martinus Johannes Bloks , Peng Feng , Johan Gertrudis Cornelis Kunnen
IPC: G03F7/20 , G03F7/30 , H01L21/027 , H01L21/67
Abstract: An immersion lithographic apparatus is provided having a substrate table including a drain configured to receive immersion fluid which leaks into a gap between an edge of a substrate on the substrate table and an edge of a recess in which the substrate is located. A thermal conditioning system is provided to thermally condition at least the portion of the recess supporting the substrate by directing one or more jets of fluid onto a reverse side of the section supporting the substrate.
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Patent Agency Ranking
公开(公告)号：USRE48668E1
公开(公告)日：2021-08-03
申请号：US15711901
申请日：2017-09-21
Applicant: ASML NETHERLANDS B.V.
Inventor： Thibault Simon Mathieu Laurent , Gerardus Adrianus Antonius Maria Kusters , Johan Gertrudis Cornelis Kunnen , Sander Catharina Reinier Derks
Abstract: A temperature sensing probe including a temperature sensor in an elongate housing wherein the elongate housing of the probe is elongate in a first direction and the elongate housing is comprised of a material which has a thermal conductivity of at least 500 W/mK at 20° C. in at least one direction.
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公开(公告)号：USRE49297E1
公开(公告)日：2022-11-15
申请号：US16656627
申请日：2019-10-18
Applicant: ASML NETHERLANDS B.V.
Inventor： Hrishikesh Patel , Johannes Henricus Wilhelmus Jacobs , Gerardus Adrianus Antonius Maria Kusters , Thibault Simon Mathieu Laurent , Marcio Alexandre Cano Miranda , Ruud Hendricus Martinus Johannes Bloks , Peng Feng , Johan Gertrudis Cornelis Kunnen
IPC: G03F7/20 , G03F7/30 , H01L21/027 , H01L21/67
Abstract: An immersion lithographic apparatus is provided having a substrate table including a drain configured to receive immersion fluid which leaks into a gap between an edge of a substrate on the substrate table and an edge of a recess in which the substrate is located. A thermal conditioning system is provided to thermally condition at least the portion of the recess supporting the substrate by directing one or more jets of fluid onto a reverse side of the section supporting the substrate.
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公开(公告)号：US10591828B2
公开(公告)日：2020-03-17
申请号：US16270958
申请日：2019-02-08
Applicant: ASML NETHERLANDS B.V.
Inventor： Thibault Simon Mathieu Laurent , Gerardus Adrianus Antonius Maria Kusters , Bastiaan Andreas Wilhelmus Hubertus Knarren , Raymond Wilhelmus Louis Lafarre , Koen Steffens , Takeshi Kaneko , Robbert Jan Voogd , Gregory Martin Mason Corcoran , Ruud Hendrikus Martinus Johannes Bloks , Johan Gertrudis Cornelis Kunnen , Ramin Badie
IPC: G03F7/20
Abstract: A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.
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公开(公告)号：US09823589B2
公开(公告)日：2017-11-21
申请号：US15078814
申请日：2016-03-23
Applicant: ASML NETHERLANDS B.V.
Inventor： Thibault Simon Mathieu Laurent , Gerardus Adrianus Antonius Maria Kusters , Bastiaan Andreas Wilhelmus Hubertus Knarren , Raymond Wilhelmus Louis Lafarre , Koen Steffens , Takeshi Kaneko , Robbert Jan Voogd , Gregory Martin Mason Corcoran , Ruud Hendrikus Martinus Johannes Bloks , Johan Gertrudis Cornelis Kunnen , Ramin Badie
IPC: G03F7/20
CPC classification number: G03F7/70483 , G03F7/70341 , G03F7/707 , G03F7/70716 , G03F7/70775 , G03F7/70875
Abstract: A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.
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公开(公告)号：US20180074411A1
公开(公告)日：2018-03-15
申请号：US15818232
申请日：2017-11-20
Applicant: ASML NETHERLANDS B.V.
Inventor： Thibault Simon Mathieu Laurent , Gerardus Adrianus Antonius Maria Kusters , Bastiaan Andreas Wilhelmus Hubertus Knarren , Raymond Wilhelmus Louis Lafarre , Koen Steffens , Takeshi Kaneko , Robbert Jan Voogd , Gregory Martin Mason Corcoran , Ruud Henrikus Martinus Johannes Bloks , Johan Gertrudis Cornelis Kunnen , Ramin Badie
IPC: G03F7/20
CPC classification number: G03F7/70483 , G03F7/70341 , G03F7/707 , G03F7/70716 , G03F7/70775 , G03F7/70875
Abstract: A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.
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