公开(公告)号：USRE49297E1

公开(公告)日：2022-11-15

申请号：US16656627

申请日：2019-10-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Hrishikesh Patel ,  Johannes Henricus Wilhelmus Jacobs ,  Gerardus Adrianus Antonius Maria Kusters ,  Thibault Simon Mathieu Laurent ,  Marcio Alexandre Cano Miranda ,  Ruud Hendricus Martinus Johannes Bloks ,  Peng Feng ,  Johan Gertrudis Cornelis Kunnen

IPC: G03F7/20 ,  G03F7/30 ,  H01L21/027 ,  H01L21/67

Abstract: An immersion lithographic apparatus is provided having a substrate table including a drain configured to receive immersion fluid which leaks into a gap between an edge of a substrate on the substrate table and an edge of a recess in which the substrate is located. A thermal conditioning system is provided to thermally condition at least the portion of the recess supporting the substrate by directing one or more jets of fluid onto a reverse side of the section supporting the substrate.

公开(公告)号：US10191377B2

公开(公告)日：2019-01-29

申请号：US15482526

申请日：2017-04-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Hrishikesh Patel ,  Johannes Henricus Wilhelmus Jacobs ,  Gerardus Adrianus Antonius Maria Kusters ,  Thibault Simon Mathieu Laurent ,  Marcio Alexandre Cano Miranda ,  Ruud Hendricus Martinus Johannes Bloks ,  Peng Feng ,  Johan Gertrudis Cornelis Kunnen

IPC: G03F7/20 ,  G03F7/30 ,  H01L21/027 ,  H01L21/67

Abstract: An immersion lithographic apparatus is provided having a substrate table including a drain configured to receive immersion fluid which leaks into a gap between an edge of a substrate on the substrate table and an edge of a recess in which the substrate is located. A thermal conditioning system is provided to thermally condition at least the portion of the recess supporting the substrate by directing one or more jets of fluid onto a reverse side of the section supporting the substrate.