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1.发明申请CALIBRATION METHOD, MEASUREMENT APPARATUS, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING ARTICLE 审中-公开校准方法，测量装置，曝光装置和制造方法公开(公告)号：US20150015861A1
公开(公告)日：2015-01-15
申请号：US14324806
申请日：2014-07-07
CPC分类号： G03F7/70775 , G01D5/24452 , G03F7/70516 , G03F7/70533 , G03F7/70541 , G03F7/70725 , G03F7/7085 , G03F7/70858
摘要： The present invention provides a method for calibrating an encoder which includes a scale and a light receiving unit configured to receive light reflected by the scale, and detects a change in relative position between the scale and the light receiving unit, the method comprising a measurement step of measuring a deformation amount of a surface shape of the scale, a specifying step of specifying, based on a measurement result in the measurement step, a range which includes a portion of a surface of the scale, where the deformation amount exceeds a threshold, and within which a detection value of the encoder is corrected, and a determination step of determining a correction value for correcting the detection value of the encoder within the range specified in the specifying step.
摘要翻译： 本发明提供了一种用于校准编码器的方法，所述编码器包括刻度和受光单元，所述刻度和光接收单元被配置为接收由所述刻度反射的光，并且检测所述刻度和所述光接收单元之间的相对位置的变化，所述方法包括测量步骤 测定刻度的表面形状的变形量的指定步骤，根据测定步骤的测定结果，确定包含变形量超过阈值的刻度表面的一部分的范围， 并且其中修正了编码器的检测值，以及确定步骤，确定在指定步骤中指定的范围内校正编码器的检测值的校正值。
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2.发明授权公开(公告)号：US10401744B2
公开(公告)日：2019-09-03
申请号：US14324806
申请日：2014-07-07
摘要： The present invention provides a method for calibrating an encoder which includes a scale and a light receiving unit configured to receive light reflected by the scale, and detects a change in relative position between the scale and the light receiving unit, the method comprising a measurement step of measuring a deformation amount of a surface shape of the scale, a specifying step of specifying, based on a measurement result in the measurement step, a range which includes a portion of a surface of the scale, where the deformation amount exceeds a threshold, and within which a detection value of the encoder is corrected, and a determination step of determining a correction value for correcting the detection value of the encoder within the range specified in the specifying step.
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公开(公告)号：US09639008B2
公开(公告)日：2017-05-02
申请号：US14451727
申请日：2014-08-05
CPC分类号： G03F9/7023 , G03F9/7026 , G03F9/7034 , G03F2009/005
摘要： A lithography apparatus includes a measuring station that includes a first measuring device configured to measure a height of a substrate holder, and a second measuring device configured to measure a height of a surface of a substrate held by the holder, and a patterning station that includes a third measuring device configured to measure a height of the holder, and patterns the substrate held by the holder based on an output of the second measuring device. The patterning station includes a fourth measuring device configured to measure a height of a surface of a substrate held by the holder. The lithography apparatus includes a controller configured to obtain a correction value for an output obtained from at least one of the first and third measuring devices based on outputs of the second and fourth measuring devices with respect to a substrate held by the holder.
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