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1.发明申请CALIBRATION METHOD, MEASUREMENT APPARATUS, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING ARTICLE 审中-公开校准方法，测量装置，曝光装置和制造方法公开(公告)号：US20150015861A1
公开(公告)日：2015-01-15
申请号：US14324806
申请日：2014-07-07
CPC分类号： G03F7/70775 , G01D5/24452 , G03F7/70516 , G03F7/70533 , G03F7/70541 , G03F7/70725 , G03F7/7085 , G03F7/70858
摘要： The present invention provides a method for calibrating an encoder which includes a scale and a light receiving unit configured to receive light reflected by the scale, and detects a change in relative position between the scale and the light receiving unit, the method comprising a measurement step of measuring a deformation amount of a surface shape of the scale, a specifying step of specifying, based on a measurement result in the measurement step, a range which includes a portion of a surface of the scale, where the deformation amount exceeds a threshold, and within which a detection value of the encoder is corrected, and a determination step of determining a correction value for correcting the detection value of the encoder within the range specified in the specifying step.
摘要翻译： 本发明提供了一种用于校准编码器的方法，所述编码器包括刻度和受光单元，所述刻度和光接收单元被配置为接收由所述刻度反射的光，并且检测所述刻度和所述光接收单元之间的相对位置的变化，所述方法包括测量步骤 测定刻度的表面形状的变形量的指定步骤，根据测定步骤的测定结果，确定包含变形量超过阈值的刻度表面的一部分的范围， 并且其中修正了编码器的检测值，以及确定步骤，确定在指定步骤中指定的范围内校正编码器的检测值的校正值。
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公开(公告)号：US09535335B2
公开(公告)日：2017-01-03
申请号：US14315168
申请日：2014-06-25
发明人： Osamu Morimoto
CPC分类号： G03F7/70191 , G03B27/52 , G03B27/68 , G03F7/70283 , G03F7/70508 , G03F7/70783 , G03F7/70875
摘要： An apparatus which projects a pattern of an original onto a substrate by a projection optical system within a chamber to expose the substrate, comprises a measurement unit which performs measurement to calculate a deformation amount of the original, and a controller which calculates a predicted deformation amount of the original and corrects a projection magnification of the projection optical system so as to correct the predicted deformation amount, based on information representing a relationship between the deformation amount with reference to a shape of the original at a certain temperature and a time for which the original receives exposure light, a deformation amount of the original before exposure determined based on a measurement value obtained by measuring, by the measurement unit, the deformation amount of the original loaded into the chamber and unused for exposure, and the time for which the original receives the exposure light.
摘要翻译： 一种通过室内的投影光学系统将原稿的图案投影到基板上以露出基板的装置包括：测量单元，其执行测量以计算原稿的变形量;以及控制器，其计算预测的变形量 并且校正投影光学系统的投影倍率，以便基于表示在一定温度下参考原稿的形状的变形量之间的关系的信息来校正预测变形量，并且其中 原稿接收曝光光，基于通过测量单元测量装载到室中的未被使用的原稿的变形量而获得的测量值，确定原始曝光前的变形量，以及原稿的原始时间 接收曝光灯。
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公开(公告)号：US09639008B2
公开(公告)日：2017-05-02
申请号：US14451727
申请日：2014-08-05
CPC分类号： G03F9/7023 , G03F9/7026 , G03F9/7034 , G03F2009/005
摘要： A lithography apparatus includes a measuring station that includes a first measuring device configured to measure a height of a substrate holder, and a second measuring device configured to measure a height of a surface of a substrate held by the holder, and a patterning station that includes a third measuring device configured to measure a height of the holder, and patterns the substrate held by the holder based on an output of the second measuring device. The patterning station includes a fourth measuring device configured to measure a height of a surface of a substrate held by the holder. The lithography apparatus includes a controller configured to obtain a correction value for an output obtained from at least one of the first and third measuring devices based on outputs of the second and fourth measuring devices with respect to a substrate held by the holder.
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4.发明授权公开(公告)号：US10401744B2
公开(公告)日：2019-09-03
申请号：US14324806
申请日：2014-07-07
摘要： The present invention provides a method for calibrating an encoder which includes a scale and a light receiving unit configured to receive light reflected by the scale, and detects a change in relative position between the scale and the light receiving unit, the method comprising a measurement step of measuring a deformation amount of a surface shape of the scale, a specifying step of specifying, based on a measurement result in the measurement step, a range which includes a portion of a surface of the scale, where the deformation amount exceeds a threshold, and within which a detection value of the encoder is corrected, and a determination step of determining a correction value for correcting the detection value of the encoder within the range specified in the specifying step.
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公开(公告)号：US20140307241A1
公开(公告)日：2014-10-16
申请号：US14315168
申请日：2014-06-25
发明人： Osamu Morimoto
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G03B27/52 , G03B27/68 , G03F7/70283 , G03F7/70508 , G03F7/70783 , G03F7/70875
摘要： An apparatus which projects a pattern of an original onto a substrate by a projection optical system within a chamber to expose the substrate, comprises a measurement unit which performs measurement to calculate a deformation amount of the original, and a controller which calculates a predicted deformation amount of the original and corrects a projection magnification of the projection optical system so as to correct the predicted deformation amount, based on information representing a relationship between the deformation amount with reference to a shape of the original at a certain temperature and a time for which the original receives exposure light, a deformation amount of the original before exposure determined based on a measurement value obtained by measuring, by the measurement unit, the deformation amount of the original loaded into the chamber and unused for exposure, and the time for which the original receives the exposure light.
摘要翻译： 一种通过室内的投影光学系统将原稿的图案投影到基板上以露出基板的装置包括：测量单元，其执行测量以计算原稿的变形量;以及控制器，其计算预测的变形量 并且校正投影光学系统的投影倍率，以便基于表示在一定温度下参考原稿的形状的变形量之间的关系的信息来校正预测变形量，并且其中 原稿接收曝光光，基于通过测量单元测量装载到室中的未被使用的原稿的变形量而获得的测量值，确定原始曝光前的变形量，以及原稿的原始时间 接收曝光灯。
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