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    Exposure apparatus and device manufacturing method
    1.
    发明授权
    Exposure apparatus and device manufacturing method 有权
    曝光装置和装置制造方法

    公开(公告)号：US09535335B2

    公开(公告)日：2017-01-03

    申请号：US14315168

    申请日：2014-06-25

    Applicant: CANON KABUSHIKI KAISHA

    Inventor： Osamu Morimoto

    IPC: G03F7/20 ,  G03B27/52 ,  G03B27/68

    CPC classification number: G03F7/70191 ,  G03B27/52 ,  G03B27/68 ,  G03F7/70283 ,  G03F7/70508 ,  G03F7/70783 ,  G03F7/70875

    Abstract: An apparatus which projects a pattern of an original onto a substrate by a projection optical system within a chamber to expose the substrate, comprises a measurement unit which performs measurement to calculate a deformation amount of the original, and a controller which calculates a predicted deformation amount of the original and corrects a projection magnification of the projection optical system so as to correct the predicted deformation amount, based on information representing a relationship between the deformation amount with reference to a shape of the original at a certain temperature and a time for which the original receives exposure light, a deformation amount of the original before exposure determined based on a measurement value obtained by measuring, by the measurement unit, the deformation amount of the original loaded into the chamber and unused for exposure, and the time for which the original receives the exposure light.

    Abstract translation: 一种通过室内的投影光学系统将原稿的图案投影到基板上以露出基板的装置包括：测量单元，其执行测量以计算原稿的变形量;以及控制器，其计算预测的变形量 并且校正投影光学系统的投影倍率，以便基于表示在一定温度下参考原稿的形状的变形量之间的关系的信息来校正预测变形量，并且其中 原稿接收曝光光，基于通过测量单元测量装载到室中的未被使用的原稿的变形量而获得的测量值，确定原始曝光前的变形量，以及原稿的原始时间 接收曝光灯。

    METHOD AND APPARATUS FOR COMPOSING 3D PHOTOGRAPHS
    2.
    发明申请
    METHOD AND APPARATUS FOR COMPOSING 3D PHOTOGRAPHS 有权
    用于组合3D摄影的方法和装置

    公开(公告)号：US20140079383A1

    公开(公告)日：2014-03-20

    申请号：US14084766

    申请日：2013-11-20

    Applicant: 3DV Co. Ltd.

    Inventor： Kwok Wah Allen Lo

    IPC: G03B35/24

    CPC classification number: G03B35/24 ,  G02B27/2214 ,  G02F1/1323 ,  G02F1/133526 ,  G03B27/68 ,  G03B35/14

    Abstract: A 3D photographic printer uses a monochrome panel for displaying two or more images for composing a 3D photograph. Each image has a plurality of color image components. A light source with selectable color light components is used to illuminate the monochrome panel corresponding to the displayed color image components. The images are displayed at different locations so that these images can be projected onto a 3D print material through a projection lens at different projection angles. With the digital display device, it is possible to electronically locate the images at different locations and shift the images or mechanically moving the display device during the 3D photographic composing process. It is also possible that only the print material is mechanically shifted to different locations. The display device and the projection lens can be stationary.

    Abstract translation: 3D照相打印机使用单色面板显示用于组成3D照片的两个或多个图像。 每个图像具有多个彩色图像分量。 具有可选择的彩色光分量的光源用于照亮与所显示的彩色图像分量对应的单色面板。 图像被显示在不同的位置，使得这些图像可以通过投影透镜以不同的投影角投影到3D打印材料上。 利用数字显示装置，可以在3D摄影合成过程中将图像电子定位在不同位置并移动图像或机械地移动显示装置。 也可以仅将打印材料机械地移动到不同的位置。 显示装置和投影透镜可以是静止的。

    Exposure apparatus and correction apparatus
    5.
    发明授权
    Exposure apparatus and correction apparatus 有权
    曝光装置和校正装置

    公开(公告)号：US08149380B2

    公开(公告)日：2012-04-03

    申请号：US12246158

    申请日：2008-10-06

    Applicant: Hiromi Suda

    Inventor： Hiromi Suda

    IPC: G03B27/68 ,  G03B27/54 ,  G03B27/42 ,  G03B27/52

    CPC classification number: G03B27/68 ,  G03F7/70141

    Abstract: An exposure apparatus is configured to expose a pattern of an original on a substrate by using light from a light source. The exposure apparatus includes an illumination optical system configured to illuminate the original by polarized light by using the light from the light source, and a correction unit configured to correct misalignment of the optical axis of the light from the light source and the optical axis of the illumination optical system. The correction unit includes a first lens and a deflecting member, the first lens can move in a direction perpendicular to an optical axis of the lens, and a deflecting direction of the light deflected by the deflecting member is variable.

    Abstract translation: 曝光装置被配置为通过使用来自光源的光来将原稿的图案曝光在基板上。 曝光装置包括：照明光学系统，被配置为通过使用来自光源的光来照射偏振光的原稿;以及校正单元，被配置为校正来自光源的光的光轴和光源的光轴的偏移 照明光学系统。 校正单元包括第一透镜和偏转构件，第一透镜可以在垂直于透镜的光轴的方向上移动，并且由偏转构件偏转的光的偏转方向是可变的。

    Systems and methods for determination of focus and telecentricity, amelioration of metrology induced effects and application to determination of precision bossung curves
    6.
    发明授权
    Systems and methods for determination of focus and telecentricity, amelioration of metrology induced effects and application to determination of precision bossung curves 有权
    确定焦点和远心性的系统和方法，改进计量诱发效应和应用于确定精密凸轮曲线

    公开(公告)号：US07846624B2

    公开(公告)日：2010-12-07

    申请号：US11676959

    申请日：2007-02-20

    Applicant: Adlai H. Smith ,  Robert O. Hunter, Jr.

    Inventor： Adlai H. Smith ,  Robert O. Hunter, Jr.

    IPC: G03F9/00 ,  G03C5/00

    CPC classification number: G03F9/7023 ,  G03B27/68 ,  G03F7/70083 ,  G03F7/70191 ,  G03F7/705 ,  G03F7/70633 ,  G03F7/70641

    Abstract: An apparatus and method for the simultaneous determination of focus and source boresighting error for photolithographic steppers and scanners is described. A reticle containing custom arrays of box-in-box test structures specifically designed for performing source or exit pupil division using an aperture plate is exposed onto a resist coated wafer several times. The resulting exposure patterns are measured with a conventional overlay tool. The overlay data is processed with a slope-shift algorithm for the simultaneous determination of both focus and source telecentricity as a function of field position. Additionally, methods for ameliorating metrology induced effects and methods for producing precision Bossung curves are also described. This Abstract is provided for the sole purpose of complying with the Abstract requirement rules, it shall not be used to interpret or to limit the scope or the meaning of the claims.

    Abstract translation: 描述了用于光刻步进机和扫描仪同时确定焦距和光源瞄准误差的装置和方法。 包含专门设计用于使用孔板执行光源或出射光瞳划分的盒装盒测试结构的定制阵列的掩模版被暴露在抗蚀剂涂覆的晶片上多次。 所得到的曝光图案用传统的覆盖工具测量。 覆盖数据用斜率移位算法处理，用于同时确定作为场位置的函数的焦点和源远心。 此外，还描述了用于改善计量学诱导效应的方法和用于产生精确Bossung曲线的方法。 本摘要仅用于遵守抽象要求规则，不得用于解释或限制权利要求的范围或含义。

    EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
    7.
    发明申请
    EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 有权
    曝光装置和装置制造方法

    公开(公告)号：US20100141913A1

    公开(公告)日：2010-06-10

    申请号：US12631619

    申请日：2009-12-04

    Applicant: Osamu Morimoto

    Inventor： Osamu Morimoto

    IPC: G03B27/42 ,  G03B27/52 ,  G03B27/68

    CPC classification number: G03F7/70191 ,  G03B27/52 ,  G03B27/68 ,  G03F7/70283 ,  G03F7/70508 ,  G03F7/70783 ,  G03F7/70875

    Abstract: An apparatus which projects a pattern of an original onto a substrate by a projection optical system within a chamber to expose the substrate, comprises a measurement unit which performs measurement to calculate a deformation amount of the original, and a controller which calculates a predicted deformation amount of the original and corrects a projection magnification of the projection optical system so as to correct the predicted deformation amount, based on information representing a relationship between the deformation amount with reference to a shape of the original at a certain temperature and a time for which the original receives exposure light, a deformation amount of the original before exposure determined based on a measurement value obtained by measuring, by the measurement unit, the deformation amount of the original loaded into the chamber and unused for exposure, and the time for which the original receives the exposure light.

    Abstract translation: 一种通过室内的投影光学系统将原稿的图案投影到基板上以露出基板的装置包括：测量单元，其执行测量以计算原稿的变形量;以及控制器，其计算预测的变形量 并且校正投影光学系统的投影倍率，以便基于表示在一定温度下参考原稿的形状的变形量之间的关系的信息来校正预测变形量，并且其中 原稿接收曝光光，基于通过测量单元测量装载到室中的未被使用的原稿的变形量而获得的测量值，确定原始曝光前的变形量，以及原稿的原始时间 接收曝光灯。

    AUTOMATED DETERMINATION OF HEIGHT AND TILT OF A SUBSTRATE SURFACE WITHIN A LITHOGRAPHY SYSTEM
    8.
    发明申请
    AUTOMATED DETERMINATION OF HEIGHT AND TILT OF A SUBSTRATE SURFACE WITHIN A LITHOGRAPHY SYSTEM 有权
    自动化测定系统中基底表面的高度和倾斜度

    公开(公告)号：US20090296057A1

    公开(公告)日：2009-12-03

    申请号：US12127036

    申请日：2008-05-27

    Applicant: Junru RUAN

    Inventor： Junru RUAN

    IPC: G03B27/68 ,  G01B11/14

    CPC classification number: G03B27/68 ,  B82Y10/00 ,  B82Y40/00 ,  G01B11/06 ,  G01B11/26 ,  G03F9/7026 ,  G03F9/7088 ,  H01J37/3174

    Abstract: Method and apparatus are provided for automated determination and adjustment of height and tilt of a substrate surface within a lithography system. The method includes: directing a beam of light onto the substrate surface, which reflects off the substrate surface as a reflected beam; optically splitting the reflected beam into a first reflected beam portion and a second reflected beam portion; impinging the first reflected beam portion onto a first detector plane of a first optical detector to generate intensity data, and impinging the second reflected beam portion onto a second detector plane of a second optical detector to generate intensity data, and utilizing the generated data in determining height and tilt of the substrate surface relative to a nominal writing plane of the lithography system. Responsive to the determination, focus or tilt of the system's writing beam, or position of the substrate surface within the system, is adjusted.

    Abstract translation: 提供了用于自动确定和调整光刻系统内的基板表面的高度和倾斜的方法和装置。 该方法包括：将光束引导到衬底表面上，反射离开衬底表面作为反射光束; 将反射光束光学分解成第一反射光束部分和第二反射光束部分; 将第一反射光束部分入射到第一光学检测器的第一检测器平面上以产生强度数据，并将第二反射光束部分入射到第二光学检测器的第二检测器平面上以产生强度数据，并且利用所生成的数据来确定 基板表面相对于光刻系统的标称写入平面的高度和倾斜度。 调整系统书写光束的确定，聚焦或倾斜或基板表面在系统内的位置。

    Method for Determining Exposure Settings, Lithographic Exposure Apparatus, Computer Program and Data Carrier
    9.
    发明申请
    Method for Determining Exposure Settings, Lithographic Exposure Apparatus, Computer Program and Data Carrier 有权
    确定曝光设置的方法，平版曝光装置，计算机程序和数据载体

    公开(公告)号：US20090201473A1

    公开(公告)日：2009-08-13

    申请号：US12367191

    申请日：2009-02-06

    Applicant: David Warren BURRY ,  Ralph BRINKHOF ,  Frank STAALS ,  Robert FRANKEN ,  Erik Johan KOOP

    Inventor： David Warren BURRY ,  Ralph BRINKHOF ,  Frank STAALS ,  Robert FRANKEN ,  Erik Johan KOOP

    IPC: G03B27/32 ,  G03B27/68 ,  G03B27/42

    CPC classification number: G03B27/32 ,  G03B27/68 ,  G03F7/70516

    Abstract: Embodiments of the invention relate to a method for determining exposure settings for a target field on a substrate in a lithographic exposure process, including providing calibration data by determining the position of a calibration field in a first direction at a plurality of calibration positions in a second and third direction relative to the position of the calibration field. The method also includes providing production data by establishing the position on the substrate of the target field in the second and third direction and by measuring the position of the exposure field in the first direction at least one measurement position relative to the position of the exposure field in the second and third direction.

    Abstract translation: 本发明的实施例涉及一种用于在光刻曝光过程中确定基板上的目标场的曝光设置的方法，包括通过在第二个多个校准位置确定校准场在第一方向上的位置来提供校准数据 和相对于校准场的位置的第三方向。 该方法还包括通过在第二和第三方向上建立目标场的衬底上的位置并且通过在相对于曝光位置的至少一个测量位置处测量第一方向上的曝光场的位置来提供生产数据 场在第二和第三个方向。

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