Invention Publication
- Patent Title: OPTICAL SYSTEM, IN PARTICULAR FOR MICROLITHOGRAPHY, AND METHOD FOR OPERATING AN OPTICAL SYSTEM
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Application No.: US18186396Application Date: 2023-03-20
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Publication No.: US20230314959A1Publication Date: 2023-10-05
- Inventor: Conrad Wolke , Barbara Moser
- Applicant: Carl Zeiss SMT GmbH
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Priority: DE 2022107633.4 2022.03.30
- Main IPC: G03F7/00
- IPC: G03F7/00

Abstract:
An optical system, in particular for microlithography, comprises a laser light source for generating a multiplicity of light pulses, and a control unit configured to control the laser light source in such a way that, for a light pulse sequence generated by the laser light source, the time period between respectively successive light pulses varies across the light pulse sequence. A method comprises operating the optical system.
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