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    Controlling fluctuations in pointing, positioning, size or divergence errors of a beam of light for optical apparatus
    1.
    发明授权
    Controlling fluctuations in pointing, positioning, size or divergence errors of a beam of light for optical apparatus 有权
    控制用于光学设备的光束的指向，定位，尺寸或发散误差的波动

    公开(公告)号：US08164739B2

    公开(公告)日：2012-04-24

    申请号：US12239165

    申请日：2008-09-26

    Applicant: Scott D. Coston

    Inventor： Scott D. Coston

    IPC: G03B27/54 ,  G03B27/42

    CPC classification number: G03B27/54 ,  G03F7/70008 ,  G03F7/70058

    Abstract: A system and method are used for controlling fluctuations in one or more of a beam pointing error, a beam positioning error, a beam size error or a beam divergence error of a beam of light in a lithography system. An optical apparatus may comprise a first beam control module having a first optics in an optical axis for optically isolating a laser pulse from a light source associated with an illuminator to provide the beam of light. These beam related errors may be selectively stabilized by either homogenizing selectively the spatial field and/or angular information of a given illumination profile for the beam of light and symmetrizing other one of the spatial field or angular information which is not being homogenized based on a first arrangement of the first optics or homogenizing and symmetrizing both of the spatial field and angular information based on a second arrangement of the first optics.

    Abstract translation: 系统和方法用于控制光刻系统中的光束指向误差，光束定位误差，光束尺寸误差或光束发散误差中的一个或多个的波动。 光学装置可以包括第一光束控制模块，其具有光轴中的第一光学器件，用于将激光脉冲与与照明器相关联的光源光学隔离以提供光束。 这些光束相关误差可以通过选择性地均匀化用于光束的给定照明轮廓的空间场和/或角度信息来选择性地稳定，并且对应于未被均匀化的空间场或角度信息中的另一个基于第一 基于第一光学器件的第二布置，第一光学器件的布置或均匀化和对称空间场和角度信息两者。

    Illumination System with Low Telecentricity Error and Dynamic Telecentricity Correction
    2.
    发明申请
    Illumination System with Low Telecentricity Error and Dynamic Telecentricity Correction 有权
    具有低远心误差和动态远心校正的照明系统

    公开(公告)号：US20090046373A1

    公开(公告)日：2009-02-19

    申请号：US11933894

    申请日：2007-11-01

    Applicant: Lev Ryzhikov ,  James Tsacoyeanes ,  Roberto B. Wiener ,  Scott D. Coston

    Inventor： Lev Ryzhikov ,  James Tsacoyeanes ,  Roberto B. Wiener ,  Scott D. Coston

    IPC: G02B13/22

    CPC classification number: G02B13/22 ,  G02B7/003 ,  G03F7/70191 ,  G03F7/7085

    Abstract: An illuminator with substantially reduced telecentricity error relative to conventional illuminators includes one or more modules having movable optical elements with low telecentricity error that may be adjusted to compensate for telecentricity errors. The modules may include a zoom zoom axicon, a condenser, and a multi field relay. The zoom zoom axicon may include one or more lenses adjustable in up to six degrees of freedom. The condenser and the multi field relay may include one or more lenses adjustable in up to six degrees of freedom or a set of two or more mirrors with one or more of the mirrors adjustable in up to six degrees of freedom. The illuminator may also include a control system to control the adjustments of the movable optical elements. A lithography system including such an illuminator is also presented, along with a method of providing illumination with low telecentricity error.

    Abstract translation: 具有相对于常规照明器具有显着减小的远心误差的照明器包括具有低远心误差的可移动光学元件的一个或多个模块，其可被调节以补偿远心误差。 模块可以包括变焦缩放焦点，冷凝器和多场继电器。 变焦变焦镜头可以包括一个或多个可调节至多六个自由度的透镜。 冷凝器和多场继电器可以包括可调节至多六个自由度的一个或多个透镜，或者一组两个或更多个反射镜，其中一个或多个反射镜可在六个自由度上调节。 照明器还可以包括用于控制可移动光学元件的调整的控制系统。 还提出了包括这种照明器的光刻系统以及提供具有低远心误差的照明的方法。

    System and method for improving line width control in a lithography device using an illumination system having pre-numerical aperture control
    3.
    发明授权
    System and method for improving line width control in a lithography device using an illumination system having pre-numerical aperture control 有权
    使用具有预数值孔径控制的照明系统在光刻设备中改善线宽度控制的系统和方法

    公开(公告)号：US06784976B2

    公开(公告)日：2004-08-31

    申请号：US10127506

    申请日：2002-04-23

    Applicant: Scott D. Coston ,  James G. Tsacoyeanes

    Inventor： Scott D. Coston ,  James G. Tsacoyeanes

    IPC: G03B2754

    CPC classification number: G03F7/70091 ,  G03F7/70141 ,  G03F7/70625

    Abstract: A system and method for improving line width control in a lithography device are presented. Electromagnetic energy is emitted from an illumination source and passed through illumination optics. The illumination optics include a partial coherence adjuster having a first and second optical element. The first optical element is used for changing the partial coherence of incident electromagnetic energy in a predetermined manner to compensate for horizontal and vertical line biases of the lithography device. The second optical element is used for changing the angular distribution of electromagnetic energy incident upon the first optical element. Together, the two optical elements are used to vary the partial coherence of the electromagnetic energy emitted by the illumination source, as a function of illumination field position, and improve line width control. Adjustment of the second optical element allows for correction of time-dependant line width variances.

    Abstract translation: 提出了一种用于改善光刻设备中的线宽度控制的系统和方法。 电磁能从照明源发射并通过照明光学器件。 照明光学器件包括具有第一和第二光学元件的部分相干调节器。 第一光学元件用于以预定方式改变入射电磁能的部分相干性，以补偿光刻设备的水平和垂直线偏移。 第二光学元件用于改变入射在第一光学元件上的电磁能的角分布。 两个光学元件一起用于改变由照射源发射的电磁能量的部分相干性，作为照明场位置的函数，并且改善线宽度控制。 第二光学元件的调整允许校正时间相关的线宽方差。

    System and method for improving linewidth control in a lithography device by varying the angular distribution of light in an illuminator as a function of field position
    7.
    发明授权
    System and method for improving linewidth control in a lithography device by varying the angular distribution of light in an illuminator as a function of field position 有权
    通过改变照明器中的光的角分布来改善光刻装置中的线宽控制的系统和方法作为场位置的函数

    公开(公告)号：US06888615B2

    公开(公告)日：2005-05-03

    申请号：US10127505

    申请日：2002-04-23

    Applicant: James G. Tsacoyeanes ,  Scott D. Coston

    Inventor： James G. Tsacoyeanes ,  Scott D. Coston

    IPC: G03F7/20 ,  H01L21/027 ,  G03B27/42 ,  G03B27/54

    CPC classification number: G03F7/70091

    Abstract: Electromagnetic energy is emitted from an illumination source of a lithography device. A portion of the emitted electromagnetic energy passes through an illumination optics module. The illumination optics module includes a one-dimensional optical transform element having a pupil plane. An aperture device having an adjustable aperture is located proximate to the pupil plane so that a portion of the electromagnetic energy received by the one-dimensional optical transform element passes through the aperture of the aperture device. The angular distribution of the electromagnetic energy passing through the illumination optics module is adjusted as a function of illumination field position using the aperture device, thereby improving line width control in the lithography device.

    Abstract translation: 从光刻设备的照明源发射电磁能。 发射的电磁能的一部分通过照明光学模块。 照明光学模块包括具有光瞳平面的一维光学变换元件。 具有可调节孔径的孔径装置位于瞳孔平面附近，使得由一维光学变换元件接收的电磁能量的一部分通过孔径装置的孔。 通过照明光学模块的电磁能的角度分布作为使用孔径装置的照明场位置的函数进行调整，从而改善光刻装置中的线宽度控制。

    Illumination system with low telecentricity error and dynamic telecentricity correction
    9.
    发明授权
    Illumination system with low telecentricity error and dynamic telecentricity correction 有权
    具有低远心误差和动态远心校正的照明系统

    公开(公告)号：US08013979B2

    公开(公告)日：2011-09-06

    申请号：US11933894

    申请日：2007-11-01

    Applicant: Lev Ryzhikov ,  James Tsacoyeanes ,  Roberto B. Wiener ,  Scott D. Coston

    Inventor： Lev Ryzhikov ,  James Tsacoyeanes ,  Roberto B. Wiener ,  Scott D. Coston

    IPC: G03B27/54 ,  G03B27/42

    CPC classification number: G02B13/22 ,  G02B7/003 ,  G03F7/70191 ,  G03F7/7085

    Abstract: An illuminator with substantially reduced telecentricity error relative to conventional illuminators includes one or more modules having movable optical elements with low telecentricity error that may be adjusted to compensate for telecentricity errors. The modules may include a zoom zoom axicon, a condenser, and a multi field relay. The zoom zoom axicon may include one or more lenses adjustable in up to six degrees of freedom. The condenser and the multi field relay may include one or more lenses adjustable in up to six degrees of freedom or a set of two or more mirrors with one or more of the mirrors adjustable in up to six degrees of freedom. The illuminator may also include a control system to control the adjustments of the movable optical elements. A lithography system including such an illuminator is also presented, along with a method of providing illumination with low telecentricity error.

    Abstract translation: 具有相对于常规照明器具有显着减小的远心误差的照明器包括具有低远心误差的可移动光学元件的一个或多个模块，其可被调节以补偿远心误差。 模块可以包括变焦缩放焦点，冷凝器和多场继电器。 变焦变焦镜头可以包括一个或多个可调节至多六个自由度的透镜。 冷凝器和多场继电器可以包括可调节至多六个自由度的一个或多个透镜，或者一组两个或更多个反射镜，其中一个或多个反射镜可在六个自由度上调节。 照明器还可以包括用于控制可移动光学元件的调整的控制系统。 还提出了包括这种照明器的光刻系统以及提供具有低远心误差的照明的方法。

    Controlling Fluctuations in Pointing, Positioning, Size or Divergence Errors of a Beam of Light for Optical Apparatus
    10.
    发明申请
    Controlling Fluctuations in Pointing, Positioning, Size or Divergence Errors of a Beam of Light for Optical Apparatus 有权
    控制用于光学设备的光束的指向，定位，尺寸或发散错误的波动

    公开(公告)号：US20090086184A1

    公开(公告)日：2009-04-02

    申请号：US12239165

    申请日：2008-09-26

    Applicant: Scott D. COSTON

    Inventor： Scott D. COSTON

    IPC: G03B27/54

    CPC classification number: G03B27/54 ,  G03F7/70008 ,  G03F7/70058

    Abstract: A system and method are used for controlling fluctuations in one or more of a beam pointing error, a beam positioning error, a beam size error or a beam divergence error of a beam of light in a lithography system. An optical apparatus may comprise a first beam control module having a first optics in an optical axis for optically isolating a laser pulse from a light source associated with an illuminator to provide the beam of light. These beam related errors may be selectively stabilized by either homogenizing selectively the spatial field and/or angular information of a given illumination profile for the beam of light and symmetrizing other one of the spatial field or angular information which is not being homogenized based on a first arrangement of the first optics or homogenizing and symmetrizing both of the spatial field and angular information based on a second arrangement of the first optics.

    Abstract translation: 系统和方法用于控制光刻系统中的光束指向误差，光束定位误差，光束尺寸误差或光束发散误差中的一个或多个的波动。 光学装置可以包括第一光束控制模块，其具有光轴中的第一光学器件，用于将激光脉冲与与照明器相关联的光源光学隔离以提供光束。 这些光束相关误差可以通过选择性地均匀化用于光束的给定照明轮廓的空间场和/或角度信息来选择性地稳定，并且对应于未被均匀化的空间场或角度信息中的另一个基于第一 基于第一光学器件的第二布置，第一光学器件的布置或均匀化和对称空间场和角度信息两者。

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