公开(公告)号：US06822729B2

公开(公告)日：2004-11-23

申请号：US09797961

申请日：2001-03-05

申请人： Karl-Heinz Schuster ,  Christian Wagner ,  Martin Schriever

发明人： Karl-Heinz Schuster ,  Christian Wagner ,  Martin Schriever

IPC分类号： G03B2754

CPC分类号： G02B17/0892 ,  G02B17/08 ,  G02B27/28 ,  G03B27/72 ,  G03F7/70125 ,  G03F7/70225 ,  G03F7/70566

摘要： A method and an arrangement for microlithographic projection exposure at high aperture achieve a contrast increase by the polarization of the light perpendicular to the plane of incidence on the resist. Arrangements are provided which influence the tangential polarization or the linear polarization adapted to the dipole illumination in the illuminating system and in the reduction objective.

摘要翻译： 用于在高孔径处的微光刻投影曝光的方法和装置通过垂直于抗蚀剂入射平面的光的偏振来实现对比度增加。 提供了影响在照明系统和还原目​​标中适应于偶极子照明的切向偏振或线偏振的布置。

公开(公告)号：US06798496B2

公开(公告)日：2004-09-28

申请号：US10284573

申请日：2002-10-30

申请人： Gilles Vibet ,  Manuel Cuevas

发明人： Gilles Vibet ,  Manuel Cuevas

IPC分类号： G03B2754

CPC分类号： G03F7/2002

摘要： The invention provides apparatus for exposing a face of a panel, in particular a printed circuit panel, the device including a light source. The device further comprising: two moving shutters suitable for masking said light source, each of said shutters presenting a respective edge, said edges together defining a window through which a light zone is generated on said face of the panel to be exposed; means for displacing said shutters in a plane lying between said light source and said panel; and control means for controlling the displacement of said shutters in such a manner that both shutters move past said face of the panel at substantially the same speed and in the same direction.

摘要翻译： 本发明提供了一种用于暴露面板，特别是印刷电路板的面的设备，该设备包括光源。 所述装置还包括：两个适于遮蔽所述光源的移动快门，每个所述快门呈现相应的边缘，所述边缘一起限定一个窗口，通过所述窗口在所述要暴露的面板的所述面上产生光区; 所述快门位于位于所述光源和所述面板之间的平面中; 以及用于以这样的方式控制所述快门的位移的控制装置，使得两个快门以基本上相同的速度和相同的方向移动经过面板的所述面。

公开(公告)号：US06774982B2

公开(公告)日：2004-08-10

申请号：US09986323

申请日：2001-11-08

申请人： Chidane Ouchi

发明人： Chidane Ouchi

IPC分类号： G03B2754

CPC分类号： G03F7/706 ,  G03F7/70991

摘要： An exposure apparatus includes an illumination optical system for illuminating a pattern of a reticle with laser light outputted from a continuous emission laser, a projection optical system for projecting the illuminated pattern onto a subject to be exposed, and an interferometer, of a Fizeau type, being operable while using laser light outputted from the continuous emission laser.

摘要翻译： 曝光装置包括：照明光学系统，用于通过从连续发射激光器输出的激光照射标线图案;投影光学系统，用于将照射图案投射到待曝光的对象上;以及干涉仪，Fizeau型， 在使用从连续发射激光器输出的激光时可操作。

公开(公告)号：US06757051B2

公开(公告)日：2004-06-29

申请号：US09883253

申请日：2001-06-19

申请人： Tetsuo Takahashi ,  Jin Nishikawa ,  Yasuhiro Omura

发明人： Tetsuo Takahashi ,  Jin Nishikawa ,  Yasuhiro Omura

IPC分类号： G03B2754

CPC分类号： G02B17/0892 ,  G02B13/143 ,  G02B17/0808 ,  G02B17/0856 ,  G02B27/18 ,  G03F7/70225

摘要： A projection optical system forms an image of an object in a first plane onto a second plane. The projection optical system has an optical element group including at least one refractive member and plural reflective members, and a plurality of lens-barrel units holding the optical element group divided into a plurality of respective groupings. The reflective members are all held by a single lens-barrel unit of the plurality of lens-barrels units.

摘要翻译： 投影光学系统将第一平面中的物体的图像形成到第二平面上。 投影光学系统具有包括至少一个折射构件和多个反射构件的光学元件组，以及保持被分成多个分组的光学元件组的多个透镜筒单元。 反射构件都由多个透镜筒单元中的单个镜筒单元保持。

公开(公告)号：US06724465B2

公开(公告)日：2004-04-20

申请号：US10130519

申请日：2002-05-20

申请人： Danièle Babonneau ,  Rémy Marmoret ,  Laurence Bonnet

发明人： Danièle Babonneau ,  Rémy Marmoret ,  Laurence Bonnet

IPC分类号： G03B2754

CPC分类号： H05G2/001 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G03F7/70033 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70575

摘要： Lithography device using a source of radiation in the extreme ultraviolet range and multi-layered mirrors with a broad spectral band within this range. Each mirror (24, 26, 29) includes a stack of layers of a first material and layers of a second material alternating with the first material. The first material has an atomic number greater than that of the second material. The thickness of pairs of adjacent layers is a monotonic function of the depth in the stack. The source (22) comprises at least one target (28) which emits the radiation by interAction with a laser beam focused on one of its faces. A part (36) of the radiation emitted from the other face is used. The invention is applicable to the manufacture of integrated circuits with a high degree of integration.

摘要翻译： 使用在极紫外范围内的辐射源的光刻设备和在该范围内具有宽谱带的多层反射镜。每个反射镜（24,26,29）包括第一材料层和第二材料层 与第一种材料交替。 第一种材料的原子数大于第二种材料的原子数。 相邻层对的厚度是堆叠中深度的单调函数。 源（22）包括至少一个目标（28），其通过与聚焦在其一个面上的激光束的相互作用发射辐射。 使用从另一面发射的辐射的一部分（36）。 本发明适用于具有高集成度的集成电路的制造。

公开(公告)号：US06671034B1

公开(公告)日：2003-12-30

申请号：US09301311

申请日：1999-04-29

申请人： Masahiro Hatakeyama ,  Katsunori Ichiki ,  Tohru Satake ,  Yotaro Hatamura ,  Masayuki Nakao

发明人： Masahiro Hatakeyama ,  Katsunori Ichiki ,  Tohru Satake ,  Yotaro Hatamura ,  Masayuki Nakao

IPC分类号： G03B2754

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F1/50 ,  G03F7/0002 ,  G03F7/2014

摘要： The object of the present invention IS to provide an optical imprinting apparatus and method for producing a two-dimensional pattern, having line widths less than the wavelength of an exposure light. The evarnescent (proximity) field effect is adopted to realize the apparatus and method. An optical imprinting apparatus comprises: a container in which light is enclosed therein; an exposure-mask having a proximity field exposure pattern firmly fixed to a section of said container for exposing said exposure pattern on a photo-sensitive material through an evanescent field by said light enclosed therein; and a light source for supplying said light in said container.

摘要翻译： 本发明的目的是提供一种用于产生具有小于曝光光的波长的线宽的二维图案的光学压印装置和方法。 采用实现（邻近）场效应实现装置和方法。 一种光学压印设备包括：容纳在其中的光; 曝光掩模，其具有牢固地固定在所述容器的一部分上的接近场曝光图案，用于通过所述光包围在所述光敏材料上的所述光衰弱场曝光所述曝光图案; 以及用于将所述光提供在所述容器中的光源。

公开(公告)号：US06542223B1

公开(公告)日：2003-04-01

申请号：US09628885

申请日：2000-07-31

申请人： Yoichi Okazaki

发明人： Yoichi Okazaki

IPC分类号： G03B2754

CPC分类号： G03F7/70358 ,  G03F7/70066 ,  G03F7/70558

摘要： In a scanning type exposure apparatus, an illumination light beam from a light source through an opening portion of a reticle blind is introduced onto a reticle. A pattern on the reticle is sequentially transferred onto the substrate by scanning the reticle and the substrate, respectively. The substrate is divided into a plurality of regions along a scanning direction. A variable unit for changing an opening area of the opening portion is arranged so as to substantially equalize integrated exposure quantity in each region.

摘要翻译： 在扫描型曝光装置中，将来自光源的通过遮光板的开口部分的照明光束引入到掩模版上。 通过分别扫描掩模版和基板，将掩模版上的图案依次转印到基板上。 基板沿着扫描方向被分成多个区域。 用于改变开口部分的开口面积的可变单元被布置成基本上均衡每个区域中的积分曝光量。

公开(公告)号：US06542222B1

公开(公告)日：2003-04-01

申请号：US09626912

申请日：2000-07-27

申请人： Toshihiko Tsuji ,  Michiaki Saito

发明人： Toshihiko Tsuji ,  Michiaki Saito

IPC分类号： G03B2754

CPC分类号： G03F7/70041 ,  G03F7/70358 ,  G03F7/70558

摘要： The present invention relates to a beam output control method in which an output from a pulse energy source that emits pulses of exposure beam used in an exposure apparatus is controlled. This method controls an output from the pulse energy source by changing a control mode in accordance with an operation of the exposure apparatus. The control mode includes at least two of: a first mode in which the output from the pulse energy source is controlled based on a detection result of an energy sensor provided within the pulse energy source; a second mode in which the output from the pulse energy source is controlled based on a detection result of an energy sensor provided in the exposure apparatus; a third mode in which the output from the pulse energy source is controlled so that dispersions in the energy for each pulse of the exposure beam emitted from the pulse energy source are suppressed; and a fourth mode in which the output from the pulse energy source is controlled so that dispersions in the integrated energy of a predetermined number of pulses of the exposure beam emitted from the pulse energy source are suppressed.

摘要翻译： 本发明涉及一种光束输出控制方法，其中控制在曝光装置中使用的曝光束脉冲的脉冲能量源的输出。 该方法通过根据曝光装置的操作改变控制模式来控制来自脉冲能量源的输出。 控制模式包括以下中的至少两个：第一模式，其中基于设置在脉冲能量源内的能量传感器的检测结果来控制来自脉冲能量源的输出; 基于设置在曝光装置中的能量传感器的检测结果来控制来自脉冲能量源的输出的第二模式; 控制来自脉冲能量源的输出的第三模式，从而抑制从脉冲能量源发射的曝光光束的每个脉冲的能量的分散; 以及第四模式，其中控制来自脉冲能量源的输出，从而抑制从脉冲能量源发射的曝光光束的预定数量的脉冲的积分能量中的分散。

公开(公告)号：US06535274B2

公开(公告)日：2003-03-18

申请号：US09945363

申请日：2001-08-31

申请人： Martin Antoni

发明人： Martin Antoni

IPC分类号： G03B2754

CPC分类号： G03F7/70075 ,  G03F7/701 ,  G03F7/70191

摘要： A projection exposure device, in particular for micro-lithography, serves to produce an image of an object in an image plane positioned in an object plane. This happens with the aid of a light source emitting projection light and illumination optics positioned in the ray path between the light source and the object plane. In addition projection optics positioned in the ray path between the object plane and the image plane serve to guide the projection light. A filter (7) is positioned in a filter plane which lies in the vicinity of a pupil plane between the light source and the object plane. This has a moveable filter element (22′) which has at least in certain areas (24) for the projection light a transmission factor which is greater than zero and less than 100%. The moveable filter element (22′) is moveable in the filter plane and has a distribution of the transmission factor over the filter face, in such a way that the intensity distribution of the projection light perpendicular to the optical axis (14) in the ray path after the filter (7) changes with the movement of the filter element (22′). With such a filter (7) an illumination angle distribution can be adapted to a pre-set value (FIG. 5).

摘要翻译： 特别是用于微光刻的投影曝光装置用于在位于物平面中的图像平面中产生物体的图像。 借助于发射投影光的光源和位于光源和物平面之间的光线路径中的照明光学器件的发生。 此外，位于物平面和图像平面之间的光线路径中的投影光学器件用于引导投影光。 滤光器（7）位于位于光源和物平面之间的光瞳平面附近的滤光器平面中。 这具有可移动的过滤元件（22'），其至少在某些区域（24）中用于投影光，该透射因子大于零且小于100％。 可移动过滤器元件（22'）可在过滤器平面中移动并且具有透过因子在过滤器面上的分布，使得投影光在光线中垂直于光轴（14）的强度分布 过滤器（7）随着过滤元件（22'）的移动而变化的路径。 利用这种滤光器（7），照明角度分布可以适应于预定值（图5）。

公开(公告)号：US06535271B1

公开(公告)日：2003-03-18

申请号：US09534237

申请日：2000-03-23

申请人： Mamoru Ogasawara

发明人： Mamoru Ogasawara

IPC分类号： G03B2754

CPC分类号： H04N1/02865 ,  G03B27/10 ,  G03B27/527

摘要： An exposure apparatus comprises a light source section, which is constituted of a plurality of arrayed light source units, each of the light source units comprising multiple kinds of light emitting devices, which produce light beams having wavelengths falling within different wavelength ranges, and an optical system for combining the light beams, which have been radiated out from the multiple kinds of the light emitting devices, with one another to form a combined light beam, and converging the combined light beam onto one end of an optical fiber. An exposure head is located so as to stand facing a photosensitive surface of a photosensitive material capable of being conveyed. The other end of the optical fiber is connected to the exposure head. A driving mechanism moves the exposure head in a straight line along a direction, which is normal to the direction of conveyance of the photosensitive material.

摘要翻译： 曝光装置包括由多个排列的光源单元构成的光源部，每个光源单元包括产生波长落在不同波长范围内的光束的多种发光器件，以及光学部件 用于将已经从多种发光器件辐射出的光束彼此组合以形成组合光束的系统，并将组合的光束会聚到光纤的一端。 曝光头被定位成面对能够被传送的感光材料的感光表面。 光纤的另一端连接到曝光头。 驱动机构沿着与感光材料的输送方向正交的方向将曝光头沿直线移动。