发明授权
US06542222B1 Beam output control method, beam output apparatus and exposure system, and device manufacturing method using the exposure system
失效
光束输出控制方法，光束输出装置和曝光系统以及使用曝光系统的装置制造方法
- 专利标题： Beam output control method, beam output apparatus and exposure system, and device manufacturing method using the exposure system
- 专利标题（中）： 光束输出控制方法，光束输出装置和曝光系统以及使用曝光系统的装置制造方法
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申请号： US09626912申请日： 2000-07-27
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公开(公告)号： US06542222B1公开(公告)日： 2003-04-01
- 发明人: Toshihiko Tsuji , Michiaki Saito
- 申请人： Toshihiko Tsuji , Michiaki Saito
- 优先权： JP11-219354 19990802
- 主分类号： G03B2754
- IPC分类号： G03B2754
摘要：
The present invention relates to a beam output control method in which an output from a pulse energy source that emits pulses of exposure beam used in an exposure apparatus is controlled. This method controls an output from the pulse energy source by changing a control mode in accordance with an operation of the exposure apparatus. The control mode includes at least two of: a first mode in which the output from the pulse energy source is controlled based on a detection result of an energy sensor provided within the pulse energy source; a second mode in which the output from the pulse energy source is controlled based on a detection result of an energy sensor provided in the exposure apparatus; a third mode in which the output from the pulse energy source is controlled so that dispersions in the energy for each pulse of the exposure beam emitted from the pulse energy source are suppressed; and a fourth mode in which the output from the pulse energy source is controlled so that dispersions in the integrated energy of a predetermined number of pulses of the exposure beam emitted from the pulse energy source are suppressed.
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