公开(公告)号：US06542222B1

公开(公告)日：2003-04-01

申请号：US09626912

申请日：2000-07-27

申请人： Toshihiko Tsuji ,  Michiaki Saito

发明人： Toshihiko Tsuji ,  Michiaki Saito

IPC分类号： G03B2754

CPC分类号： G03F7/70041 ,  G03F7/70358 ,  G03F7/70558

摘要： The present invention relates to a beam output control method in which an output from a pulse energy source that emits pulses of exposure beam used in an exposure apparatus is controlled. This method controls an output from the pulse energy source by changing a control mode in accordance with an operation of the exposure apparatus. The control mode includes at least two of: a first mode in which the output from the pulse energy source is controlled based on a detection result of an energy sensor provided within the pulse energy source; a second mode in which the output from the pulse energy source is controlled based on a detection result of an energy sensor provided in the exposure apparatus; a third mode in which the output from the pulse energy source is controlled so that dispersions in the energy for each pulse of the exposure beam emitted from the pulse energy source are suppressed; and a fourth mode in which the output from the pulse energy source is controlled so that dispersions in the integrated energy of a predetermined number of pulses of the exposure beam emitted from the pulse energy source are suppressed.

摘要翻译： 本发明涉及一种光束输出控制方法，其中控制在曝光装置中使用的曝光束脉冲的脉冲能量源的输出。 该方法通过根据曝光装置的操作改变控制模式来控制来自脉冲能量源的输出。 控制模式包括以下中的至少两个：第一模式，其中基于设置在脉冲能量源内的能量传感器的检测结果来控制来自脉冲能量源的输出; 基于设置在曝光装置中的能量传感器的检测结果来控制来自脉冲能量源的输出的第二模式; 控制来自脉冲能量源的输出的第三模式，从而抑制从脉冲能量源发射的曝光光束的每个脉冲的能量的分散; 以及第四模式，其中控制来自脉冲能量源的输出，从而抑制从脉冲能量源发射的曝光光束的预定数量的脉冲的积分能量中的分散。

公开(公告)号：US07324187B2

公开(公告)日：2008-01-29

申请号：US10956614

申请日：2004-10-01

申请人： Toshihiko Tsuji ,  Akira Yabuki

发明人： Toshihiko Tsuji ,  Akira Yabuki

IPC分类号： G03B27/74 ,  G03B27/42 ,  G03B27/54

CPC分类号： G03F7/7085 ,  G03B27/54 ,  G03F7/70066 ,  G03F7/70091

摘要： Disclosed is an illumination optical system and an exposure apparatus having the same, and specifically, as an aspect of the invention, an illumination optical system for illuminating a surface to be illuminated, that includes an aperture stop for defining an effective light source distribution upon a predetermined plane which is substantially in a Fourier transform relation with the surface to be illuminated, and a detector disposed adjacent an opening of the aperture stop.

摘要翻译： 本发明公开了一种照明光学系统和曝光装置，具体而言，作为本发明的一个方面，照明光学系统用于照亮被照射的表面，该照明光学系统包括用于限定有效光源分布的孔径光阑 与被照射的表面基本上是傅里叶变换关系的预定平面以及邻近孔径光阑的开口设置的检测器。

公开(公告)号：US06919951B2

公开(公告)日：2005-07-19

申请号：US10205348

申请日：2002-07-25

申请人： Toshihiko Tsuji

发明人： Toshihiko Tsuji

IPC分类号： H01L21/027 ,  G03F7/20 ,  G03B27/54 ,  G03B27/42

CPC分类号： G03F7/70075

摘要： Disclosed is an illumination system for illuminating an illumination region with uniform illuminance, wherein the light intensity gravity center of light impinging on the illumination region is registered with the center of light rays. The illumination system includes a first reflection type integrator, a first condensing mirror system for superposing light beams from the first reflection type integrator one upon another on the surface to be illuminated, a second reflection type integrator disposed between the light source and said first reflection type integrator, and a second condensing mirror system for superposing light beams from the second reflection type integrator one upon another on the first reflection type integrator. Also disclosed is an exposure apparatus having such illumination system, and a device manufacturing method using the same.

摘要翻译： 公开了一种用于照明具有均匀照度的照明区域的照明系统，其中照射在照明区域上的光的重心重心与光线的中心对准。 照明系统包括第一反射型积分器，第一聚光镜系统，用于将第一反射型积分器的光束在被照射的表面上叠加起来;第二反射型积分器，设置在光源和所述第一反射型之间 积分器和第二聚光镜系统，用于在第一反射型积分器上叠加来自第二反射型积分器的光束。 还公开了具有这种照明系统的曝光装置和使用该照明系统的装置制造方法。

公开(公告)号：US20050057738A1

公开(公告)日：2005-03-17

申请号：US10769373

申请日：2004-01-30

申请人： Toshihiko Tsuji

发明人： Toshihiko Tsuji

IPC分类号： G03B27/54 ,  G03F7/20 ,  G21K1/00 ,  H01L21/027

CPC分类号： G03F7/702 ,  G21K2201/06

摘要： Attempting to provide an illumination optical system and an exposure apparatus using the same, which provide a more uniform angular distribution of light for illuminating a mask than the prior art, an illumination optical system for illuminating an object surface includes an optical unit that converts light from a light source section into approximately parallel light, and includes first and second mirrors, wherein the first mirror has an opening, through which light reflected by the second mirror passes.

摘要翻译： 为了提供照明光学系统和使用该照明光学系统的曝光装置，其提供了比现有技术更光亮的用于照射掩模的光的角度分布，用于照射物体表面的照明光学系统包括：光学单元，其将来自 光源部分成近似平行的光，并且包括第一和第二反射镜，其中第一反射镜具有开口，第二反射镜反射的光穿过该开口。

公开(公告)号：US20050030510A1

公开(公告)日：2005-02-10

申请号：US10937431

申请日：2004-09-10

申请人： Toshihiko Tsuji

发明人： Toshihiko Tsuji

IPC分类号： G03F7/20 ,  H01L21/027 ,  G03B27/72

CPC分类号： G03F7/70233 ,  G03F7/7025 ,  G03F7/70258 ,  G03F7/70283

摘要： Disclosed is an exposure apparatus for illuminating a reflection type mask with light from a light source and for exposing a substrate with a pattern of the illuminated reflection type mask, wherein the apparatus includes a projection optical system for projecting the pattern of the reflection type mask onto the substrate, the projection optical system having a stop, wherein the stop has a first opening for defining a numerical aperture of the projection optical system, and a second opening through which light from the reflection type mask passes. This structure effective avoids unwanted physical interference among optical components of an illumination system or the projection optical system even when the size of the whole exposure apparatus is made compact to some degree.

公开(公告)号：US06606195B2

公开(公告)日：2003-08-12

申请号：US09411633

申请日：1999-10-01

申请人： Toshihiko Tsuji

发明人： Toshihiko Tsuji

IPC分类号： G02B2744

CPC分类号： G03F7/70058 ,  G02B27/0018 ,  G02B27/0043 ,  G02B27/4211 ,  G02B27/4222 ,  G03F7/70241 ,  G03F7/70825

摘要： An optical unit includes an optical element for propagating incident light toward a predetermined direction, a barrel for supporting the optical element, and an attenuating device including a plurality of grooved portions, for attenuating, through multiple reflection, at least a portion of light emitted from the optical element toward a direction different from the predetermined direction. The attenuating device includes two recesses each having a horn-like section shape, the two recesses being bent in directions away from each other.

摘要翻译： 光学单元包括用于向预定方向传播入射光的光学元件，用于支撑光学元件的镜筒，以及包括多个凹槽部分的衰减装置，用于通过多次反射来衰减至少一部分从 所述光学元件朝向与所述规定方向不同的方向。 该衰减装置包括两个具有喇叭状截面形状的凹部，两个凹部沿彼此远离的方向弯曲。

公开(公告)号：US06392742B1

公开(公告)日：2002-05-21

申请号：US09323031

申请日：1999-06-01

申请人： Toshihiko Tsuji

发明人： Toshihiko Tsuji

IPC分类号： G03B2754

CPC分类号： G03F7/70183

摘要： An illumination system includes a light source, an emission angle preserving optical element for emitting light from the light source, at a certain emission angle, a collecting optical system for collecting the light from the emission angle preserving optical element, a pattern forming optical system having at least a diffractive optical element, for producing, on a predetermined plane, a light pattern of a desired shape having a uniform light intensity distribution, by use of light from the light collecting optical system, a multiple-beam producing system for producing a plurality of light beams, a zooming optical system for projecting the light intensity distribution on the predetermined plane, onto a light entrance surface of the multiple-beam producing system at a predetermined magnification, and an illuminating device for superposedly projecting lights from a light exit surface of the multiple-beam producing system, upon a surface to be illuminated.

摘要翻译： 照明系统包括：光源，用于以一定的发射角发射来自光源的光的发射角保持光学元件，用于收集来自发射角保持光学元件的光的收集光学系统;具有 至少一个衍射光学元件，用于在预定平面上通过使用来自聚光光学系统的光产生具有均匀光强分布的所需形状的光图案，用于产生多个光束的多光束产生系统 的光束，用于将预定平面上的光强度分布投射到预定放大倍数的多光束产生系统的光入射表面上的变焦光学系统，以及用于将来自光束的光出射表面的光重叠地投射的照明装置 多光束产生系统在被照射的表面上。

公开(公告)号：US06169602A

公开(公告)日：2001-01-02

申请号：US09253711

申请日：1999-02-22

申请人： Tetsuo Taniguchi ,  Toshihiko Tsuji

发明人： Tetsuo Taniguchi ,  Toshihiko Tsuji

IPC分类号： G01B1100

CPC分类号： G03F7/70358 ,  G03F7/706 ,  G03F7/70691

摘要： The present invention relates to a method of detecting an image formation characteristic of a projection optical system for projecting a reference pattern on a reticle on a substrate. According to the detection method, a reticle stage is moved so that a reference mark on the reticle comes to a first reference position and a second reference position, and a wafer stage is moved so that a light transmission portion on the wafer stage crosses an image forming position of a projected image of the reference mark obtained through the projection optical system. The positions of the reticle stage and the wafer stage at the first and second reference positions are measured as moved distances of the stages, respectively. From the distances of movement of the reticle and wafer stages measured, the image formation characteristic of the projection optical system is calculated.

摘要翻译： 本发明涉及一种检测投影光学系统的图像形成特性的方法，用于将基准图案投影在基板上的掩模版上。 根据检测方法，移动标线片台，使得标线上的基准标记进入第一基准位置和第二基准位置，并移动晶片台，使得晶片台上的光透射部分跨越图像 形成通过投影光学系统获得的参考标记的投影图像的位置。 在第一和第二参考位置处的标线片台和晶片台的位置分别被测量为阶段的移动距离。 从测量的标线片和晶片台的移动距离来计算投影光学系统的图像形成特性。

公开(公告)号：US5798838A

公开(公告)日：1998-08-25

申请号：US713719

申请日：1996-09-13

申请人： Tetsuo Taniguchi ,  Toshihiko Tsuji ,  Tadashi Nagayama

发明人： Tetsuo Taniguchi ,  Toshihiko Tsuji ,  Tadashi Nagayama

IPC分类号： G03F7/20 ,  H01L21/30 ,  G01B11/00

CPC分类号： G03F7/70591 ,  G03F7/70133 ,  G03F7/70241 ,  G03F7/70258 ,  G03F7/70358

摘要： The invention relates to a projection exposure apparatus for detecting a light-intensity distribution of a spatial image of a mask pattern formed through a projection optical system. The projection exposure apparatus has a knife-edge member which is disposed on the main surface of a wafer stage such that a plane including an exposure surface of a photosensitive substrate is leveled with a light incidence surface of the knife-edge member. The knife-edge member has a transmission area for transmitting the exposure light passing through the projection optical system, a light shielding area for preventing transmission of the exposure light, and a knife-edge defined as a boundary line between the transmission area and the light shielding area. The projection exposure apparatus detects the light-intensity distribution of light from the spatial image while moving the spatial image of the mask pattern and the knife-edge of the knife-edge member relatively to each other. The information related to the light-intensity distribution is used in optically adjusting a projection optical system, or the like.

摘要翻译： 本发明涉及一种用于检测通过投影光学系统形成的掩模图案的空间图像的光强度分布的投影曝光装置。 投影曝光装置具有刀片部件，其设置在晶片台的主表面上，使得包括感光基板的曝光表面的平面与刀刃部件的光入射面平齐。 刀刃部件具有用于透射通过投影光学系统的曝光光的透射区域，用于防止曝光光的透射的遮光区域和被定义为透射区域与光线之间的边界线的刀刃 屏蔽区域。 投影曝光装置在将掩模图案的空间图像和刀刃部件的刀刃相对于彼此移动的同时，检测来自空间图像的光的光强度分布。 与光强分布有关的信息用于光学调整投影光学系统等。

公开(公告)号：US5652657A

公开(公告)日：1997-07-29

申请号：US467922

申请日：1995-06-06

申请人： Minoru Yoshii ,  Michio Kohno ,  Seiya Miura ,  Kyoichi Miyazaki ,  Toshihiko Tsuji ,  Seiji Takeuchi

发明人： Minoru Yoshii ,  Michio Kohno ,  Seiya Miura ,  Kyoichi Miyazaki ,  Toshihiko Tsuji ,  Seiji Takeuchi

IPC分类号： G01N21/88 ,  G01N21/94 ,  G01N21/956 ,  G03F1/62 ,  G03F1/84 ,  H01L21/027 ,  G01B11/00

CPC分类号： G01N21/94

摘要： An inspection system inspecting an original with a pellicle, which system includes a light source for providing a light beam, a first detecting device for receiving light produced as a result of passage of the light beam through the pellicle, a second detecting device for receiving light produced as a result of non-passage of the light beam through the pellicle, and a processing system for determining information related to transmissivity of the pellicle, on the basis of outputs of the first and second detecting devices.

摘要翻译： 一种用防护薄膜组件检查原件的检查系统，该系统包括用于提供光束的光源，用于接收由于光束通过防护薄膜的结果而产生的光的第一检测装置，用于接收光的第二检测装置 由于不通过光束通过防护薄膜组件而产生的结果，以及用于根据第一和第二检测装置的输出确定与防护薄膜组件的透射率有关的信息的处理系统。