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1.发明授权
公开(公告)号：US5798838A
公开(公告)日：1998-08-25
申请号：US713719
申请日：1996-09-13
CPC分类号： G03F7/70591 , G03F7/70133 , G03F7/70241 , G03F7/70258 , G03F7/70358
摘要： The invention relates to a projection exposure apparatus for detecting a light-intensity distribution of a spatial image of a mask pattern formed through a projection optical system. The projection exposure apparatus has a knife-edge member which is disposed on the main surface of a wafer stage such that a plane including an exposure surface of a photosensitive substrate is leveled with a light incidence surface of the knife-edge member. The knife-edge member has a transmission area for transmitting the exposure light passing through the projection optical system, a light shielding area for preventing transmission of the exposure light, and a knife-edge defined as a boundary line between the transmission area and the light shielding area. The projection exposure apparatus detects the light-intensity distribution of light from the spatial image while moving the spatial image of the mask pattern and the knife-edge of the knife-edge member relatively to each other. The information related to the light-intensity distribution is used in optically adjusting a projection optical system, or the like.
摘要翻译： 本发明涉及一种用于检测通过投影光学系统形成的掩模图案的空间图像的光强度分布的投影曝光装置。 投影曝光装置具有刀片部件，其设置在晶片台的主表面上，使得包括感光基板的曝光表面的平面与刀刃部件的光入射面平齐。 刀刃部件具有用于透射通过投影光学系统的曝光光的透射区域，用于防止曝光光的透射的遮光区域和被定义为透射区域与光线之间的边界线的刀刃 屏蔽区域。 投影曝光装置在将掩模图案的空间图像和刀刃部件的刀刃相对于彼此移动的同时，检测来自空间图像的光的光强度分布。 与光强分布有关的信息用于光学调整投影光学系统等。
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公开(公告)号：US6151122A
公开(公告)日：2000-11-21
申请号：US332027
申请日：1999-06-14
申请人： Tetsuo Taniguchi , Toshihiko Tsuji
发明人： Tetsuo Taniguchi , Toshihiko Tsuji
CPC分类号： G03F7/706 , G03F7/70358 , G03F7/70691
摘要： The present invention relates to a method of detecting an image formation characteristic of a projection optical system for projecting a reference pattern on a reticle on a substrate. According to the detection method, a reticle stage is moved so that a reference mark on the reticle comes to a first reference position and a second reference position, and a wafer stage is moved so that a light transmission portion on the wafer stage crosses an image forming position of a projected image of the reference mark obtained through the projection optical system. The positions of the reticle stage and the wafer stage at the first and second reference positions are measured as moved distances of the stages, respectively. From the distances of movement of the reticle and wafer stages measured, the image formation characteristic of the projection optical system is calculated.
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公开(公告)号：US06169602A
公开(公告)日：2001-01-02
申请号：US09253711
申请日：1999-02-22
申请人： Tetsuo Taniguchi , Toshihiko Tsuji
发明人： Tetsuo Taniguchi , Toshihiko Tsuji
IPC分类号： G01B1100
CPC分类号： G03F7/70358 , G03F7/706 , G03F7/70691
摘要： The present invention relates to a method of detecting an image formation characteristic of a projection optical system for projecting a reference pattern on a reticle on a substrate. According to the detection method, a reticle stage is moved so that a reference mark on the reticle comes to a first reference position and a second reference position, and a wafer stage is moved so that a light transmission portion on the wafer stage crosses an image forming position of a projected image of the reference mark obtained through the projection optical system. The positions of the reticle stage and the wafer stage at the first and second reference positions are measured as moved distances of the stages, respectively. From the distances of movement of the reticle and wafer stages measured, the image formation characteristic of the projection optical system is calculated.
摘要翻译： 本发明涉及一种检测投影光学系统的图像形成特性的方法，用于将基准图案投影在基板上的掩模版上。 根据检测方法，移动标线片台，使得标线上的基准标记进入第一基准位置和第二基准位置，并移动晶片台，使得晶片台上的光透射部分跨越图像 形成通过投影光学系统获得的参考标记的投影图像的位置。 在第一和第二参考位置处的标线片台和晶片台的位置分别被测量为阶段的移动距离。 从测量的标线片和晶片台的移动距离来计算投影光学系统的图像形成特性。
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公开(公告)号：US5424552A
公开(公告)日：1995-06-13
申请号：US115517
申请日：1993-09-02
申请人： Toshihiko Tsuji , Tetsuo Taniguchi , Yuji Imai , Mizutani Hideo
发明人： Toshihiko Tsuji , Tetsuo Taniguchi , Yuji Imai , Mizutani Hideo
CPC分类号： G03F7/706 , G03F7/70241 , G03F7/70258 , G03F7/70883 , G03F7/70891 , G03F9/70 , G03F9/7034
摘要： A projection exposing apparatus for detecting a state of focus at two or more places in exposure region of a projection optical system by a focus state detection device. In accordance with the result of the detection of the focus state at the two or more places, the image forming characteristics of the projection optical system are measured by an image forming characteristics measuring device. A first pattern extending in the sagittal direction and a second pattern extending in the meridional direction are formed so that the focus state is measured by light beams transmitted these patterns and therefore the astigmatism, eccentricity or the spherical aberration is obtained so as to be corrected.
摘要翻译： 一种投影曝光装置，用于通过聚焦状态检测装置检测在投影光学系统的曝光区域中的两个或更多处的焦点状态。 根据两个以上的焦点状态的检测结果，通过图像形成特性测量装置测量投影光学系统的图像形成特性。 形成沿矢状方向延伸的第一图案和沿子午方向延伸的第二图案，使得通过透射这些图案的光束测量聚焦状态，因此获得像散，偏心或球面像差以进行校正。
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公开(公告)号：US5137349A
公开(公告)日：1992-08-11
申请号：US633314
申请日：1990-12-24
IPC分类号： G03F7/20 , G03F7/207 , G03F9/00 , H01L21/027 , H01L21/30
CPC分类号： G03F7/70883 , G03F7/70241 , G03F9/7023
摘要： In a projection-type optical apparatus in which a projection optical system projects an image of an object upon a substrate, a position detecting sensor mechanically connected to the projection optical system detects the position of the projection optical system relative to the substrate along the optical axis of the projection optical system. A displacement measuring device measures relative displacement between the position detecting sensor and the projection optical system along the optical axis. The substrate is brought into coincidence with an optimum image forming plane of the projection optical system on the basis of the position detected by the position detecting sensor and the displacement measured by the displacement measuring device.
摘要翻译： 在其中投影光学系统将物体的图像投射到基板的投影型光学装置中，机械地连接到投影光学系统的位置检测传感器沿着光轴检测投影光学系统相对于基板的位置 的投影光学系统。 位移测量装置测量沿着光轴的位置检测传感器和投影光学系统之间的相对位移。 基于由位置检测传感器检测到的位置和由位移测量装置测量的位移，使基板与投影光学系统的最佳图像形成平面一致。
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公开(公告)号：US06850327B2
公开(公告)日：2005-02-01
申请号：US10237130
申请日：2002-09-09
申请人： Tetsuo Taniguchi , Toshihiko Tsuji
发明人： Tetsuo Taniguchi , Toshihiko Tsuji
CPC分类号： G03F7/706 , G03F7/70358 , G03F7/70691
摘要： A reference mark is formed on an under-surface of a reference mark member that is disposed on a mask stage. The mask stage can be part of a projection exposure apparatus in which a substrate and a mask are moved in respective scanning directions during scanning exposure. The projection exposure apparatus also may include a projection system disposed under the mask stage, with the mask and substrate being provided on opposite sides of projection system. The mask stage may be moved into the image field of the projection system, and the reference mark is detected.
摘要翻译： 参考标记形成在设置在掩模台上的参考标记部件的下表面上。 掩模台可以是在扫描曝光期间基板和掩模在各个扫描方向上移动的投影曝光装置的一部分。 投影曝光装置还可以包括设置在掩模台下方的投影系统，其中掩模和基板设置在投影系统的相对侧上。 掩模台可以移动到投影系统的图像场中，并且检测到参考标记。
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公开(公告)号：US06525817B1
公开(公告)日：2003-02-25
申请号：US09667754
申请日：2000-09-21
申请人： Tetsuo Taniguchi , Toshihiko Tsuji
发明人： Tetsuo Taniguchi , Toshihiko Tsuji
IPC分类号： G01B1100
CPC分类号： G03F7/706 , G03F7/70358 , G03F7/70691
摘要： The present invention relates to a method of detecting an image formation characteristic of a projection optical system for projecting a reference pattern on a reticle on a substrate. According to the detection method, a reticle stage is moved so that a reference mark on the reticle comes to a first reference position and a second reference position, and a wafer stage is moved so that a light transmission portion on the wafer stage crosses an image forming position of a projected image of the reference mark obtained through the projection optical system. The positions of the reticle stage and the wafer stage at the first and second reference positions are measured as moved distances of the stages, respectively. From the distances of movement of the reticle and wafer stages measured, the image formation characteristic of the projection optical system is calculated.
摘要翻译： 本发明涉及一种检测投影光学系统的图像形成特性的方法，用于将基准图案投影在基板上的掩模版上。 根据检测方法，移动标线片台，使得标线上的基准标记进入第一基准位置和第二基准位置，并移动晶片台，使得晶片台上的光透射部分跨越图像 形成通过投影光学系统获得的参考标记的投影图像的位置。 在第一和第二参考位置处的标线片台和晶片台的位置分别被测量为阶段的移动距离。 从测量的标线片和晶片台的移动距离来计算投影光学系统的图像形成特性。
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公开(公告)号：US08754726B2
公开(公告)日：2014-06-17
申请号：US13193649
申请日：2011-07-29
CPC分类号： H01P1/20345 , H03H7/09 , H03H7/1708 , H03H7/1766 , H03H7/1775 , H03H7/42 , H03H2001/0085
摘要： In a multilayer band-pass filter, each of first-stage to third-stage LC parallel resonators includes capacitor electrodes, via electrodes, and a line electrode. Jump-coupling capacitor electrodes face the capacitor electrodes of the first-stage and third-stage LC parallel resonators. The direction in which the inductor electrode extends from the capacitor electrodes of each of the first-stage and third-stage LC parallel resonators is opposite to the direction in which the inductor electrode extends from the capacitor electrodes of the second-stage LC parallel resonator.
摘要翻译： 在多层带通滤波器中，第一级至第三级LC并联谐振器中的每一个包括电容器电极，通孔电极和线电极。 跳跃耦合电容电极面对第一级和第三级LC并联谐振器的电容电极。 电感器电极从第一级和第三级LC并联谐振器的电容器电极延伸的方向与电感器电极从第二级LC并联谐振器的电容器电极延伸的方向相反。
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公开(公告)号：US08169288B2
公开(公告)日：2012-05-01
申请号：US13180666
申请日：2011-07-12
IPC分类号： H01F5/00
CPC分类号： H01F17/0013 , H01F2017/0026 , H03H7/0115 , H03H7/1708 , H03H7/1775 , H03H2001/0085 , Y10T29/4902
摘要： An electronic component that reduces resistance and prevents occurrence of an edge effect, includes a laminated body formed by stacking insulator layers. Conductor layers are linear conductors, and define coils included in the laminated body. The conductor layers face each other, with the insulator layer interposed therebetween, and allow signals of substantially the same phase to pass therethrough. The conductor layers define regions, each having a shape which decreases in thickness in the z-axis direction with increasing distance from a center thereof in a line width direction.
摘要翻译： 降低电阻并防止发生边缘效应的电子部件包括通过堆叠绝缘体层形成的层叠体。 导体层是线性导体，并且限定层叠体中包含的线圈。 导体层彼此面对，其间插入绝缘体层，并且允许基本上相同相的信号通过。 导体层限定区域，每个区域具有沿着z轴方向的厚度减小的形状，其距离其在线宽度方向上的中心的距离增加。
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10.发明授权公开(公告)号：US07907034B2
公开(公告)日：2011-03-15
申请号：US12606334
申请日：2009-10-27
申请人： Tetsuo Taniguchi
发明人： Tetsuo Taniguchi
IPC分类号： H03H7/00
CPC分类号： H01P1/20345 , H03H7/09 , H03H7/1708 , H03H7/1775 , H03H2001/0085
摘要： In a laminated band-pass filter, a capacitance is formed between a ground electrode of a ground electrode formation layer and each of capacitor electrodes of capacitor electrode formation layers. An even number of LC parallel resonators is arranged such that via electrodes and line electrodes define a plurality of inductor electrodes and, when viewed in a direction in which the inductor electrodes are arranged, the surfaces of the loops of the inductor electrodes overlap each other at least partially. The loops defined by the inductor electrodes of neighboring LC parallel resonators have opposite directions. The capacitor electrodes have a shape and distribution or arrangement having point symmetry in plan view.
摘要翻译： 在层叠带通滤波器中，在接地电极形成层的接地电极和电容器电极形成层的电容电极的每一个之间形成电容。 偶数个LC并联谐振器被布置成使得通孔电极和线电极限定多个电感器电极，并且当沿着电感器电极布置的方向观察时，电感器电极的环的表面彼此重叠， 最少部分。 由相邻LC并联谐振器的电感器电极限定的环路具有相反的方向。 电容器电极具有在平面图中具有点对称性的形状和分布或布置。
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