公开(公告)号：US20240361253A1

公开(公告)日：2024-10-31

申请号：US18595292

申请日：2024-03-04

申请人： NOVA LTD.

发明人： Gilad BARAK ,  DANNY GROSSMAN ,  Dror SHAFIR ,  YOAV BERLATZKY ,  Yanir HAINICK

IPC分类号： G01N21/956 ,  G01B9/02001 ,  G01B9/02015 ,  G01B9/02055 ,  G01B9/0209 ,  G01B11/06 ,  G01J3/453 ,  G01N21/88

CPC分类号： G01N21/956 ,  G01B9/02007 ,  G01B9/02032 ,  G01B9/02072 ,  G01B9/0209 ,  G01B11/0675 ,  G01J3/4535 ,  G01N21/8806 ,  G01B2210/56 ,  G01B2290/70 ,  G01N2021/8848

摘要： A measurement system for use in measuring parameters of a patterned sample, the system including a broadband light source, an optical system configured as an interferometric system, a detection unit, and a control unit, where the interferometric system defines illumination and detection channels having a sample arm and a reference arm having a reference reflector, and is configured for inducing an optical path difference between the sample and reference arms, the detection unit for detecting a combined light beam formed by a light beam reflected from the reflector and a light beam propagating from a sample's support, and generating measured data indicative of spectral interference pattern formed by spectral interference signatures, and the control unit for receiving the measured data and applying a model-based processing to the spectral interference pattern for determining one or more parameters of the pattern in the sample.

公开(公告)号：US12100129B2

公开(公告)日：2024-09-24

申请号：US17357396

申请日：2021-06-24

申请人： Inventec (Pudong) Technology Corporation ,  Inventec Corporation

发明人： Meng Sun

IPC分类号： G06T7/00 ,  B23K31/12 ,  G01N21/956

CPC分类号： G06T7/0004 ,  B23K31/12 ,  G01N21/95607 ,  G01N2021/95646 ,  G06T2207/30152

摘要： A printing solder point quality identification and maintenance suggestion system and a method thereof are disclosed. In the system, when solder paste inspection data, component inspection data or circuit inspection data indicates presence of defect, an analysis and calculation device intercepts the operating data, the equipment data, the raw material data, the process data and the environment data from a time data stream, to generate a data feature portrait. The analysis and calculation device then sets a reliability value based on location association between the solder paste inspection data, the component inspection data, the circuit inspection data and the maintenance data in the location data stream, and performs similarity calculation on the data feature portrait and the comparison data feature portrait to calculate a similarity value, and then calculates a relative reliability value, and compares the relative reliability value with a reliability threshold value to generate maintenance suggestion information.

公开(公告)号：US12072301B2

公开(公告)日：2024-08-27

申请号：US17800325

申请日：2021-02-15

申请人： SIGNIFY HOLDING B.V.

发明人： Marc Andre De Samber ,  Philip Steven Newton

IPC分类号： G01N21/956

CPC分类号： G01N21/956

摘要： An inspection system (100) for inspecting a lighting device (150) during an assembly process of the lighting device; wherein the lighting device comprises a base plate (153) and a plurality of components (155) mounted on the base plate; wherein the inspection system comprises: a light source (120) arranged for illuminating the lighting device according to a first light output spectrum for providing a luminance contrast between the base plate and the plurality of components; an imaging unit/camera (130) arranged for capturing a first image of the illuminated lighting device; a controller (110) comprising a processing unit for determining a luminance contrast measure of the captured first image; wherein the processing unit is further arranged for, when the luminance contrast measure of the captured first image exceeds a threshold value, adapting the first light output spectrum, and wherein the imaging unit is further arranged for capturing a second image of the lighting device illuminated according to the adapted first light output spectrum; and wherein the controller further comprises: a comparing unit arranged for comparing the second image with a reference image; a determination unit arranged for determining a defect in the base plate and/or in the plurality of components based on the comparison.

公开(公告)号：US12072299B2

公开(公告)日：2024-08-27

申请号：US18220150

申请日：2023-07-10

申请人： FRAUNHOFER USA, INC. ,  UNIVERSITY OF MARYLAND, COLLEGE PARK

发明人： Rohan Reddy Mekala ,  Matthias Muehle ,  Adam Porter ,  Mikael Lindvall ,  Michael Becker

IPC分类号： G01N21/88 ,  G01N21/956 ,  G06T5/50 ,  G06T7/00 ,  G06T7/564

CPC分类号： G01N21/8851 ,  G01N21/8803 ,  G01N21/95607 ,  G06T5/50 ,  G06T7/0004 ,  G06T7/564 ,  G01N2021/8854 ,  G01N2021/8887 ,  G01N2021/95615

摘要： Disclosed herein are systems and methods for synthesizing a diamond using a diamond synthesis machine. A processor receives a plurality of images of a diamond during synthesis within a diamond synthesis machine, each of the plurality of images captured within a time period. The processor executes a diamond state prediction machine learning model using the plurality of images to obtain a predicted data object, the predicted data object indicating a predicted state of the diamond within the diamond synthesis machine at a time subsequent to the time period. The processor detects a predicted defect, a number of defects, defect types, and/or sub-features of such defects and/or other characteristics (e.g., a predicted shape, size, and/or other properties of predicted contours for the diamond and/or pocket holder) of the predicted state of the diamond. The processor adjusts operation of the diamond synthesis machine.

公开(公告)号：US12066388B2

公开(公告)日：2024-08-20

申请号：US17282877

申请日：2020-10-21

申请人： WIT CO., LTD.

发明人： Masato Utsumi ,  Koji Kurano ,  Ken Ideyama

IPC分类号： G01N21/88 ,  G01N21/956

CPC分类号： G01N21/8851 ,  G01N21/956 ,  G01N2021/8893 ,  G01N2021/95646

摘要： In order to reduce inspection tact time in centralized management of a plurality of inspection lines, the system includes: a plurality of inspection lines 4 each having a visual appearance inspection device 3; a first database 5A for storing a captured image captured by each of the visual appearance inspection device 3; and a centralized control device 6 connected to each of the visual appearance inspection devices 3 and the first database 5A, having a display unit 32 that displays an inspection image of an inspection object 7, and enabling visual inspection of the inspection object 7 conveyed on each of the inspection lines 4 in a centralized manner; wherein, while one of the inspection lines 4 is inspected by using the centralized control device 6, the visual appearance inspection devices 3 of the other inspection lines 4 pre-captures the inspection object 7 conveyed on the inspection line 4 under predetermined capturing conditions and stores the pre-captured image in the first database 5A, and wherein the pre-captured image read from the first database 5A is displayed on the display unit 32 in the visual inspection.

公开(公告)号：US20240231244A1

公开(公告)日：2024-07-11

申请号：US18405339

申请日：2024-01-05

申请人： Kioxia Corporation

发明人： Hiroyuki TANIZAKI ,  Kiminori YOSHINO ,  Kaori FUMITA ,  Hiroaki SHIRAKAWA ,  Manabu TAKAKUWA ,  Kentaro KASA ,  Soichi INOUE ,  Satoshi TANAKA

IPC分类号： G03F7/00 ,  G01N21/95 ,  G01N21/956

CPC分类号： G03F7/70633 ,  G01N21/9501 ,  G01N21/956 ,  G03F7/706833 ,  G03F7/706849

摘要： A measuring device includes a light source that irradiates a measurement spot on a wafer formed with memory holes and slits with a multi-wavelength light, a first imaging unit that acquires a first pupil plane intensity distribution image of reflected light from the measurement spot, a second imaging unit that acquires a second pupil plane intensity distribution image of the reflected light, and a detection unit that analyzes the second pupil plane intensity distribution image to measure overlay. The measuring device includes an overlay analysis unit that acquires the first and second pupil plane intensity distribution images while moving a position of the measurement spot and selects a measurement spot not including the slit based on the first pupil plane intensity distribution image, and uses the overlay obtained by analyzing the second pupil plane intensity distribution image of the selected measurement spot as the overlay of the memory hole and a slit.

公开(公告)号：US20240201073A1

公开(公告)日：2024-06-20

申请号：US18231688

申请日：2023-08-08

申请人： KLA Corporation

发明人： Shankar Krishnan ,  Kaichun Yang ,  Xi Chen

IPC分类号： G01N21/21 ,  G01N21/956 ,  G01N21/958

CPC分类号： G01N21/211 ,  G01N21/956 ,  G01N21/958 ,  G01N2021/213

摘要： Methods and systems for performing spectroscopic ellipsometry (SE) measurements of surface structures of optical elements fabricated on transparent substrates are presented herein. The SE measurement system is configured to detect light from the measured structures without contamination from light reflected from the backside surface of the transparent substrate. Surface structures of optical elements include film structures and grating structures fabricated on thin transparent substrates. The SE based measurement system is configured with a relatively large illumination Numerical Aperture (NA) and relatively high demagnification from the illumination source to the measurement spot on the optically transparent substrate. This configuration results in a relatively small measurement spot size and small depth of focus that minimizes the amount of light reflected from the backside of the optically transparent substrate. In addition, a relatively small collection aperture size further minimizes backside reflected light from reaching the detector.

公开(公告)号：US12013348B2

公开(公告)日：2024-06-18

申请号：US17077997

申请日：2020-10-22

申请人： BLANCCO TECHNOLOGY GROUP IP OY

发明人： William Fitzgerald ,  Daniel Öberg ,  Patrick Conway ,  Donal O'Shaughnessy ,  Donie Kelly ,  Tero Mononen

IPC分类号： G01N21/956 ,  G06F1/16 ,  G06K7/015 ,  G06K7/14

CPC分类号： G01N21/956 ,  G06K7/015 ,  G06K7/1417 ,  G01N2201/0221 ,  G01N2201/105 ,  G06F1/1605

摘要： There is presented a system and method for detecting mobile device fault conditions, particularly detecting defects in a display or housing of a mobile device. One or more cameras included within the mobile device are used with a reflecting surface in a test fixture to obtain properly aligned and formatted images of the external housing and display of the mobile device, and interactive guidance assists with placement and execution of diagnostics. A remote server conducts further analysis of the captured images, and then defect status may be returned to and displayed upon the mobile device screen.

公开(公告)号：US11999645B2

公开(公告)日：2024-06-04

申请号：US17287015

申请日：2019-10-03

申请人： ASML NETHERLANDS B.V.

发明人： Robbert Edgar Van Leeuwen ,  Amir Abdolvand

IPC分类号： C03B37/00 ,  C03B37/012 ,  C03B37/027 ,  C03C25/68 ,  G01N21/956 ,  G02F1/35 ,  G02F1/365 ,  G03F7/00

CPC分类号： C03B37/0122 ,  C03B37/01228 ,  C03B37/02781 ,  C03C25/68 ,  G01N21/956 ,  G02F1/3528 ,  G02F1/365 ,  G03F7/70316 ,  C03B2203/16 ,  C03B2203/42

摘要： An optical fiber, manufacturing intermediate for forming an optical fiber and a method for forming an optical fiber. The method includes providing a manufacturing intermediate having an elongate body and having an aperture extending through the elongate body along an axial dimension of the elongate body, a boundary of the aperture defining an internal surface of the manufacturing intermediate. The method further includes etching the internal surface of the manufacturing intermediate using an etching substance, and drawing the manufacturing intermediate along the axial dimension so as to form the optical fiber.

公开(公告)号：US20240175823A1

公开(公告)日：2024-05-30

申请号：US18279828

申请日：2022-03-25

申请人： KEIWA Incorporated

发明人： Satoru Tani ,  Takahiro Tsuji ,  Yuki Matsuno ,  Kosuke Yasuno ,  Satoshi Shiba ,  Yu Kariya

IPC分类号： G01N21/88 ,  G01N21/956 ,  E01D22/00

CPC分类号： G01N21/8851 ,  G01N21/956 ,  E01D22/00 ,  G01N2021/8874 ,  G01N2201/0216

摘要： Provided is a method for inspecting surface deformation of a structure which enables easy measurement of the amount of deformation of the surface of a structure protection sheet attached to the surface of a structure such as concrete. The method for inspecting surface deformation of a structure includes: identifying a structure protection sheet attached to a surface of a structure using an individual identification means; digitally photographing a surface of a resin layer on an outermost surface of the structure protection sheet using a digital photography means; measuring a dimension of the surface of the resin layer based on image data obtained in the digital photography using a dimension measuring means; and calculating an amount of deformation of the surface of the resin layer based on data of the measured dimension using a calculation means.