公开(公告)号：US11999645B2

公开(公告)日：2024-06-04

申请号：US17287015

申请日：2019-10-03

Applicant: ASML NETHERLANDS B.V.

Inventor： Robbert Edgar Van Leeuwen ,  Amir Abdolvand

IPC: C03B37/00 ,  C03B37/012 ,  C03B37/027 ,  C03C25/68 ,  G01N21/956 ,  G02F1/35 ,  G02F1/365 ,  G03F7/00

CPC classification number: C03B37/0122 ,  C03B37/01228 ,  C03B37/02781 ,  C03C25/68 ,  G01N21/956 ,  G02F1/3528 ,  G02F1/365 ,  G03F7/70316 ,  C03B2203/16 ,  C03B2203/42

Abstract: An optical fiber, manufacturing intermediate for forming an optical fiber and a method for forming an optical fiber. The method includes providing a manufacturing intermediate having an elongate body and having an aperture extending through the elongate body along an axial dimension of the elongate body, a boundary of the aperture defining an internal surface of the manufacturing intermediate. The method further includes etching the internal surface of the manufacturing intermediate using an etching substance, and drawing the manufacturing intermediate along the axial dimension so as to form the optical fiber.

公开(公告)号：US09915880B2

公开(公告)日：2018-03-13

申请号：US15077439

申请日：2016-03-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Engelbertus Antonius Fransiscus Van Der Pasch ,  Andre Bernardus Jeunink ,  Robbert Edgar Van Leeuwen ,  Emiel Jozef Melanie Eussen

IPC: G03B27/58 ,  G03F7/20

CPC classification number: G03F7/70725 ,  G03F7/70775 ,  G03F7/7085

Abstract: A measurement system configured to measure a position dependent signal of an object table, the measurement system including at least one sensor mountable on the object table and a sensor target object mountable on a substantially stationary frame, and a mounting device configured to mount the sensor target object on the substantially stationary frame, wherein the measurement system further includes a compensator configured to compensate movements and/or deformations of the sensor target object with respect to the substantially stationary frame. The compensator may include a passive or an active damper and/or a feedback position controller. In an alternative embodiment, the compensator includes a gripping device which fixes the position of the sensor target object during a high accuracy movement of the movable object.

公开(公告)号：US10289011B2

公开(公告)日：2019-05-14

申请号：US15748644

申请日：2016-07-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Engelbertus Antonius Fransiscus Van Der Pasch ,  Robbert Edgar Van Leeuwen

IPC: G03F7/20 ,  G01B9/02 ,  G01B11/26 ,  G01B11/02

Abstract: A position measurement system includes an interferometer to determine a position of an object. The interferometer is arranged to generate a first, second and third signals representative of the position by irradiating respective first, second and third areas of a reflective surface of the object. Along a line, the first and second areas are at a first distance relative to each other, the second and third areas are at a second distance relative to each other, and the first and third areas are at a third distance relative to each other. The interferometer is arranged to provide a rotation signal representative of a rotation of the object along an axis based on the first, second and third signals. The axis is parallel to the reflective surface and perpendicular to the line.

公开(公告)号：US10338483B2

公开(公告)日：2019-07-02

申请号：US16070848

申请日：2017-01-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Robbert Edgar Van Leeuwen ,  Hans Butler

IPC: G03F7/20 ,  H01L41/00 ,  H01L41/02 ,  H01L41/04 ,  G01B9/02

Abstract: An actuator system configured to position an object, the actuator system includes a piezo actuator having an actuator contact surface. The piezo actuator is configured to exert a force via the actuator contact surface onto the object. The piezo actuator includes a transparent piezo material. The actuator system further has an optical position sensor configured to measure a position of the actuator contact surface. The optical position sensor is configured to transmit an optical beam through the transparent piezo material to the actuator contact surface. The optical position sensor may form an interferometer.

公开(公告)号：US20130201466A1

公开(公告)日：2013-08-08

申请号：US13791477

申请日：2013-03-08

Applicant: ASML Netherlands B.V.

Inventor： Richard Alexander GEORGE ,  Cheng-Qun Gui ,  Pieter Willem Herman De Jager ,  Robbert Edgar Van Leeuwen ,  Jacobus Burghoorn

IPC: G03B27/53

CPC classification number: G03B27/53 ,  G03F7/70291 ,  G03F7/70791 ,  G03F9/7003 ,  G03F9/7026

Abstract: A lithography apparatus includes a projection system configured to project a radiation beam onto a substrate, a detector configured to inspect the substrate, and a substrate table configured to support the substrate and move the substrate relative to the projection system and the detector. The detector is arranged to inspect a portion of the substrate while the substrate is moved and before the portion is exposed to the radiation beam.

公开(公告)号：US10331045B2

公开(公告)日：2019-06-25

申请号：US15739824

申请日：2016-05-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Engelbertus Antonius Fransiscus Van Der Pasch ,  Emiel Jozef Melanie Eussen ,  Robbert Edgar Van Leeuwen

IPC: G03F7/20 ,  G01B9/02 ,  G01B11/27

Abstract: A position measurement system to measure a position of an object relative to a reference, the position measurement system including two interferometers, wherein each interferometer is configured to form a reference beam and a measurement beam from input radiation and to combine the reference beam and the measurement beam to provide output radiation to be delivered to a detector, wherein each interferometer is configured such that the reference beam is formed by reflection of input radiation from a reflective element, and such that the measurement beam is formed by diffraction of input radiation from a grating on the object, and wherein the reference beam and the measurement beam are parallel to each other.

公开(公告)号：US08675175B2

公开(公告)日：2014-03-18

申请号：US13791477

申请日：2013-03-08

Applicant: ASML Netherlands B.V.

Inventor： Richard Alexander George ,  Cheng-Qun Gui ,  Pieter Willem Herman De Jager ,  Robbert Edgar Van Leeuwen ,  Jacobus Burghoorn

IPC: G01B11/00 ,  G03B27/32 ,  G03B27/42 ,  G03B27/54 ,  G03B27/74

CPC classification number: G03B27/53 ,  G03F7/70291 ,  G03F7/70791 ,  G03F9/7003 ,  G03F9/7026

Abstract: A lithography apparatus includes a projection system configured to project a radiation beam onto a substrate, a detector configured to inspect the substrate, and a substrate table configured to support the substrate and move the substrate relative to the projection system and the detector. The detector is arranged to inspect a portion of the substrate while the substrate is moved and before the portion is exposed to the radiation beam.

Abstract translation: 光刻设备包括投影系统，该投影系统配置成将辐射束投影到基板上，检测器被配置为检查基板;以及基板台，其构造成支撑基板并相对于投影系统和检测器移动基板。 检测器布置成在衬底移动时和在暴露于辐射束之前检查衬底的一部分。