公开(公告)号：US09696638B2

公开(公告)日：2017-07-04

申请号：US14965467

申请日：2015-12-10

Applicant: ASML NETHERLANDS B.V.

Inventor： Engelbertus Antonius Fransiscus Van Der Pasch ,  Joost Jeroen Ottens ,  Emiel Jozef Melanie Eussen ,  Johannes Henricus Wilhelmus Jacobs ,  William Peter Van Drent ,  Frank Staals ,  Lukasz Jerzy Macht ,  Erik Willem Bogaart

IPC: G03B27/58 ,  G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70725 ,  G03F7/70775 ,  G03F7/70833 ,  G03F7/709

Abstract: A lithographic apparatus including a substrate table position measurement system and a projection system position measurement system to measure a position of the substrate table and the projection system, respectively. The substrate table position measurement system includes a substrate table reference element mounted on the substrate table and a first sensor head. The substrate table reference element extends in a measurement plane substantially parallel to the holding plane of a substrate on substrate table. The holding plane is arranged at one side of the measurement plane and the first sensor head is arranged at an opposite side of the measurement plane. The projection system position measurement system includes one or more projection system reference elements and a sensor assembly. The sensor head and the sensor assembly or the associated projection system measurement elements are mounted on a sensor frame.

公开(公告)号：US09229340B2

公开(公告)日：2016-01-05

申请号：US14036991

申请日：2013-09-25

Applicant: ASML NETHERLANDS B.V.

Inventor： Engelbertus Antonius Fransiscus Van Der Pasch ,  Joost Jeroen Ottens ,  Emiel Jozef Melanie Eussen ,  Johannes Henricus Wilhelmus Jacobs ,  William Peter Van Drent ,  Frank Staals ,  Lukasz Jerzy Macht ,  Erik Willem Bogaart

IPC: G03B27/58 ,  G03B27/42 ,  G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70725 ,  G03F7/70775 ,  G03F7/70833 ,  G03F7/709

Abstract: A lithographic apparatus including a substrate table position measurement system and a projection system position measurement system to measure a position of the substrate table and the projection system, respectively. The substrate table position measurement system includes a substrate table reference element mounted on the substrate table and a first sensor head. The substrate table reference element extends in a measurement plane substantially parallel to the holding plane of a substrate on substrate table. The holding plane is arranged at one side of the measurement plane and the first sensor head is arranged at an opposite side of the measurement plane. The projection system position measurement system includes one or more projection system reference elements and a sensor assembly. The sensor head and the sensor assembly or the associated projection system measurement elements are mounted on a sensor frame.

公开(公告)号：US10331045B2

公开(公告)日：2019-06-25

申请号：US15739824

申请日：2016-05-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Engelbertus Antonius Fransiscus Van Der Pasch ,  Emiel Jozef Melanie Eussen ,  Robbert Edgar Van Leeuwen

IPC: G03F7/20 ,  G01B9/02 ,  G01B11/27

Abstract: A position measurement system to measure a position of an object relative to a reference, the position measurement system including two interferometers, wherein each interferometer is configured to form a reference beam and a measurement beam from input radiation and to combine the reference beam and the measurement beam to provide output radiation to be delivered to a detector, wherein each interferometer is configured such that the reference beam is formed by reflection of input radiation from a reflective element, and such that the measurement beam is formed by diffraction of input radiation from a grating on the object, and wherein the reference beam and the measurement beam are parallel to each other.

公开(公告)号：US09915880B2

公开(公告)日：2018-03-13

申请号：US15077439

申请日：2016-03-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Engelbertus Antonius Fransiscus Van Der Pasch ,  Andre Bernardus Jeunink ,  Robbert Edgar Van Leeuwen ,  Emiel Jozef Melanie Eussen

IPC: G03B27/58 ,  G03F7/20

CPC classification number: G03F7/70725 ,  G03F7/70775 ,  G03F7/7085

Abstract: A measurement system configured to measure a position dependent signal of an object table, the measurement system including at least one sensor mountable on the object table and a sensor target object mountable on a substantially stationary frame, and a mounting device configured to mount the sensor target object on the substantially stationary frame, wherein the measurement system further includes a compensator configured to compensate movements and/or deformations of the sensor target object with respect to the substantially stationary frame. The compensator may include a passive or an active damper and/or a feedback position controller. In an alternative embodiment, the compensator includes a gripping device which fixes the position of the sensor target object during a high accuracy movement of the movable object.