Invention Grant
- Patent Title: Stage apparatus, lithographic apparatus and method of positioning an object table
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Application No.: US15077439Application Date: 2016-03-22
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Publication No.: US09915880B2Publication Date: 2018-03-13
- Inventor: Engelbertus Antonius Fransiscus Van Der Pasch , Andre Bernardus Jeunink , Robbert Edgar Van Leeuwen , Emiel Jozef Melanie Eussen
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/58
- IPC: G03B27/58 ; G03F7/20

Abstract:
A measurement system configured to measure a position dependent signal of an object table, the measurement system including at least one sensor mountable on the object table and a sensor target object mountable on a substantially stationary frame, and a mounting device configured to mount the sensor target object on the substantially stationary frame, wherein the measurement system further includes a compensator configured to compensate movements and/or deformations of the sensor target object with respect to the substantially stationary frame. The compensator may include a passive or an active damper and/or a feedback position controller. In an alternative embodiment, the compensator includes a gripping device which fixes the position of the sensor target object during a high accuracy movement of the movable object.
Public/Granted literature
- US20160223917A1 STAGE APPARATUS, LITHOGRAPHIC APPARATUS AND METHOD OF POSITIONING AN OBJECT TABLE Public/Granted day:2016-08-04
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