公开(公告)号：US10001710B2

公开(公告)日：2018-06-19

申请号：US15214067

申请日：2016-07-19

Applicant: ASML Netherlands B.V.

Inventor： Frank Staals ,  Carlo Cornelis Maria Luijten ,  Paul Christiaan Hinnen ,  Anton Bernhard Van Oosten

IPC: G01B11/04 ,  G03B27/32 ,  G03B27/74 ,  G03C5/00 ,  G03F7/20 ,  G01B11/02 ,  G01B11/27

CPC classification number: G03F7/70633 ,  G01B11/02 ,  G01B11/272 ,  G01B2210/56 ,  G03F7/70625 ,  G03F7/70641

Abstract: Disclosed is a method of monitoring a lithographic process parameter, such as focus and/or dose, of a lithographic process. The method comprises acquiring a first and a second target measurement using respectively a first measurement configuration and a second measurement configuration, and determining the lithographic process parameter from a first metric derived from said first target measurement and said second target measurement. The first metric may be difference. Also disclosed are corresponding measurement and lithographic apparatuses, a computer program and a method of manufacturing devices.

公开(公告)号：US09599510B2

公开(公告)日：2017-03-21

申请号：US14488684

申请日：2014-09-17

Applicant: Cymer, LLC ,  ASML Netherlands B.V.

Inventor： Thomas P. Duffey ,  Herman Philip Godfried

IPC: G03B27/32 ,  G03B27/54 ,  G03B27/74 ,  H01S3/10 ,  H01S3/13 ,  G01J3/28 ,  G03F7/20 ,  G01J11/00 ,  G01J9/00 ,  G01J3/14 ,  G01J3/26 ,  G01J3/02

CPC classification number: G01J3/28 ,  G01J3/027 ,  G01J3/14 ,  G01J3/26 ,  G01J9/00 ,  G01J11/00 ,  G01J2003/2853 ,  G03F7/70041 ,  G03F7/70058 ,  G03F7/70575

Abstract: A method is described for estimating a spectral feature of a pulsed light beam produced by an optical source and directed toward a wafer of a lithography apparatus. The method includes receiving a set of N optical spectra of pulses of the light beam; saving the received N optical spectra to a saved set; transforming the optical spectra in the saved set to form a set of transformed optical spectra; averaging the transformed optical spectra to form an averaged spectrum; and estimating a spectral feature of the pulsed light beam based on the averaged spectrum.

公开(公告)号：US09360776B2

公开(公告)日：2016-06-07

申请号：US14168212

申请日：2014-01-30

Applicant: V TECHNOLOGY CO., LTD.

Inventor： Yoshiaki Nomura ,  Toshinari Arai

IPC: G01B11/00 ,  G03B27/32 ,  G03B27/74 ,  G03F9/00 ,  H01L21/68 ,  G03F7/20

CPC classification number: G03F9/7015 ,  G03F7/70791 ,  G03F9/00 ,  G03F9/7019 ,  H01L21/682

Abstract: An alignment correction method includes: the step of detecting coordinates of a first observation point 14 and a second observation point 15 set in advance on a substrate to be exposed 1 that is being scanned in a scanning direction A, in order to observe an alignment deviation of the substrate to be exposed 1; the step of computing a correction amount based on a deviation between the detected coordinates and a reference line set in advance according to the first observation point 14 and the second observation point 15; and the step of correcting alignment of a subsequent substrate to be exposed 1 based on the computed correction amount.

Abstract translation: 对准校正方法包括：检测在扫描方向A上被扫描的待曝光基板1上预先设定的第一观察点14和第二观察点15的坐标的步骤，以观察取向偏差 要暴露的基材1; 基于检测到的坐标与根据第一观察点14和第二观察点15预先设定的参考线之间的偏差来计算校正量的步骤; 以及基于所计算的校正量来校正待曝光的衬底1的对准的步骤。

公开(公告)号：US09360767B2

公开(公告)日：2016-06-07

申请号：US14682436

申请日：2015-04-09

Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.

Inventor： Chang-Tsun Hsieh ,  Chih-Ming Ke ,  Fu-Jye Liang ,  Li-Jui Chen ,  Tzung-Chi Fu

IPC: G03B27/32 ,  G03B27/52 ,  G03B27/54 ,  G03B27/74 ,  G03F7/20 ,  G02B7/28 ,  G03F9/00

CPC classification number: G03F7/70616 ,  G02B7/28 ,  G03F7/70575 ,  G03F7/70641 ,  G03F9/70 ,  G03F9/7026

Abstract: A method includes directing a beam of radiation along an optical axis toward a workpiece support, measuring a spectrum of the beam at a first time to obtain a first profile, measuring the spectrum of the beam at a second time to obtain a second profile, determining a spectral difference between the two profiles, and adjusting a position of the workpiece support along the optical axis based on the difference. A different aspect involves an apparatus having a workpiece support, beam directing structure that directs a beam of radiation along an optical axis toward the workpiece support, spectrum measuring structure that measures a spectrum of the beam at first and second times to obtain respective first and second profiles, processing structure that determines a difference between the two profiles, and support adjusting structure that adjusts a position of the workpiece support along the optical axis based on the difference.

公开(公告)号：US08605256B2

公开(公告)日：2013-12-10

申请号：US12919060

申请日：2009-02-17

Applicant: Robert J. DeVoe ,  Brian J. Gates ,  Dean Faklis ,  Robert T. Krasa ,  Przemyslaw P. Markowicz ,  Craig R. Sykora

Inventor： Robert J. DeVoe ,  Brian J. Gates ,  Dean Faklis ,  Robert T. Krasa ,  Przemyslaw P. Markowicz ,  Craig R. Sykora

IPC: G03B27/54 ,  G03B27/74

CPC classification number: G03F7/20 ,  B29C64/135 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y40/00 ,  G03F7/2053 ,  G03F7/70375 ,  G03F7/70525 ,  G03F7/7085

Abstract: An exposure system includes a light source emitting a beam along an optical axis that is capable of inducing a multi-photon reaction in a resin. The exposure system further includes a resin undergoing multiphoton reaction, as well as an automated system including a monitor that measures at least one property of the beam selected from power, pulse length, shape, divergence, or position in a plane normal to the optical axis. The monitor generates at least one signal indicative of the property of the beam, and a sub-system adjusts the beam in response to the signal from the monitor.

Abstract translation: 曝光系统包括沿着光轴发射能够在树脂中引起多光子反应的光束的光源。 曝光系统还包括进行多光子反应的树脂，以及包括监测器的自动化系统，该监视器测量从垂直于光轴的平面中的功率，脉冲长度，形状，发散度或位置中选择的光束的至少一个性质 。 监视器产生指示光束的属性的至少一个信号，并且子系统响应于来自监视器的信号来调整光束。

公开(公告)号：US08538187B2

公开(公告)日：2013-09-17

申请号：US12818112

申请日：2010-06-17

Applicant: Wei-Chung Wang ,  Hui-Hsuan Chen

Inventor： Wei-Chung Wang ,  Hui-Hsuan Chen

IPC: G06K9/40 ,  G03B27/74 ,  G01B11/14

CPC classification number: G03B3/00 ,  G03B13/00 ,  H04N17/002

Abstract: A defocus calibration module is applied in a light-sensing system for sensing a measured object to generate a sensed image. The light-sensing system contains a light-emitting component, a focusing component, and an image sensor. The light-emitting component emits a detecting light to the measured object so that the measured object generates a reflecting light. The focusing component focuses the reflecting light to the image sensor, and the image sensor generates the sensed image according to the reflecting light. The defocus calibration module has a calibrating object for blocking a part of the detecting light and the reflecting light for forming images at a first and a second calibration imaging locations in the sensed image. In this way, the defocus calibration module calculates a defocus parameter representing the defocus level of the light-sensing system according to the first and the second calibration imaging locations, and accordingly calibrates the sensed image.

Abstract translation: 散焦校准模块被应用于光感测系统中，用于感测被测物体以产生感测图像。 光感测系统包含发光部件，聚焦部件和图像传感器。 发光部件向测量对象发射检测光，使得被测物体产生反射光。 聚焦组件将反射光聚焦到图像传感器，并且图像传感器根据反射光产生感测图像。 散焦校准模块具有用于阻挡检测光的一部分的校准对象和用于在感测图像中的第一和第二校准成像位置处形成图像的反射光。 以这种方式，散焦校准模块根据第一和第二校准成像位置计算表示光感测系统的散焦水平的散焦参数，并因此校准感测图像。

公开(公告)号：US08520189B2

公开(公告)日：2013-08-27

申请号：US12772647

申请日：2010-05-03

Applicant: Chang-Tsun Hsieh ,  Fu-Jye Liang ,  Tzung-Chi Fu ,  Li-Jiu Chen ,  Chih-Ming Ke

Inventor： Chang-Tsun Hsieh ,  Fu-Jye Liang ,  Tzung-Chi Fu ,  Li-Jiu Chen ,  Chih-Ming Ke

IPC: G01J3/28 ,  G03B27/32 ,  G03B27/42 ,  G03B27/52 ,  G03B27/54 ,  G03B27/74

CPC classification number: G03F7/70616 ,  G02B7/28 ,  G03F7/70575 ,  G03F7/70641 ,  G03F9/70 ,  G03F9/7026

Abstract: A method includes directing a beam of radiation along an optical axis toward a workpiece support, measuring a spectrum of the beam at a first time to obtain a first profile, measuring the spectrum of the beam at a second time to obtain a second profile, determining a spectral difference between the two profiles, and adjusting a position of the workpiece support along the optical axis based on the difference. A different aspect involves an apparatus having a workpiece support, beam directing structure that directs a beam of radiation along an optical axis toward the workpiece support, spectrum measuring structure that measures a spectrum of the beam at first and second times to obtain respective first and second profiles, processing structure that determines a difference between the two profiles, and support adjusting structure that adjusts a position of the workpiece support along the optical axis based on the difference.

公开(公告)号：US08305552B2

公开(公告)日：2012-11-06

申请号：US11390178

申请日：2006-03-28

Applicant: Hisashi Nishinaga ,  Ikuo Hikima ,  Mitsunori Toyoda

Inventor： Hisashi Nishinaga ,  Ikuo Hikima ,  Mitsunori Toyoda

IPC: G03B27/42 ,  G03B27/58 ,  G03B27/74

CPC classification number: G03F7/7015 ,  G03F7/70058 ,  G03F7/70341 ,  G03F7/706 ,  G03F7/7085

Abstract: A part of exposure beam through a liquid(LQ) via a projection optical system(PL) enters a light-transmitting section(44), enters an optical member(41) without passing through gas, and is focused. The exposure apparatus receives the exposure light from the projection optical system to perform various measurements even if the numerical aperture of the projection optical system increases.

Abstract translation: 经由投影光学系统（PL）通过液体（LQ）的曝光光束的一部分进入透光部分（44），不经过气体而进入光学部件（41）并被聚焦。 即使投影光学系统的数值孔径增加，曝光装置接收来自投影光学系统的曝光光也进行各种测量。

公开(公告)号：US07990520B2

公开(公告)日：2011-08-02

申请号：US11957647

申请日：2007-12-17

Applicant: Berndt Warm ,  Guenther Dengel

Inventor： Berndt Warm ,  Guenther Dengel

IPC: G01J1/00 ,  G03B27/42 ,  G03B27/54 ,  G03B27/74

CPC classification number: G03F7/702 ,  G03F7/70083 ,  G03F7/701 ,  G03F7/70133

Abstract: The disclosure relates to microlithography systems, such as EUV microlithography illumination systems, as well as related components, systems and methods.

Abstract translation: 本公开涉及微光刻系统，例如EUV微光刻照明系统，以及相关部件，系统和方法。

公开(公告)号：US07936446B2

公开(公告)日：2011-05-03

申请号：US11935814

申请日：2007-11-06

Applicant: Shinichi Hirano

Inventor： Shinichi Hirano

IPC: G03B27/32 ,  G03B27/42 ,  G03B27/54 ,  G03B27/72 ,  G03B27/74

CPC classification number: G03B27/72 ,  G03F7/70558

Abstract: An exposure apparatus which illuminates a reticle with illumination light from a light source and projects light from the reticle onto a substrate to expose the substrate to light is disclosed. The apparatus comprises a shutter located on a path of the illumination light, a detector configured to detect a dose to the substrate, and a controller configured to control operation of the shutter. In a first exposure mode which uses illumination light with a first light intensity, the controller controls an open time of the shutter based on an output from the detector, and to store the open time. In a second exposure mode which uses illumination light with a second light intensity higher than the first light intensity, the controller controls a speed of the shutter based on the stored open time.

Abstract translation: 公开了一种曝光装置，其利用来自光源的照明光照亮标线板，并将来自光掩模的光投射到基板上以将基板曝光。 该装置包括位于照明光路径上的快门，被配置为检测对基板的剂量的检测器以及被配置为控制快门的操作的控制器。 在使用具有第一光强度的照明光的第一曝光模式中，控制器基于来自检测器的输出来控制快门的打开时间并存储打开时间。 在使用具有比第一光强度高的第二光强度的照明光的第二曝光模式下，控制器基于所存储的打开时间来控制快门的速度。