公开(公告)号：US09360776B2

公开(公告)日：2016-06-07

申请号：US14168212

申请日：2014-01-30

Applicant: V TECHNOLOGY CO., LTD.

Inventor： Yoshiaki Nomura ,  Toshinari Arai

IPC: G01B11/00 ,  G03B27/32 ,  G03B27/74 ,  G03F9/00 ,  H01L21/68 ,  G03F7/20

CPC classification number: G03F9/7015 ,  G03F7/70791 ,  G03F9/00 ,  G03F9/7019 ,  H01L21/682

Abstract: An alignment correction method includes: the step of detecting coordinates of a first observation point 14 and a second observation point 15 set in advance on a substrate to be exposed 1 that is being scanned in a scanning direction A, in order to observe an alignment deviation of the substrate to be exposed 1; the step of computing a correction amount based on a deviation between the detected coordinates and a reference line set in advance according to the first observation point 14 and the second observation point 15; and the step of correcting alignment of a subsequent substrate to be exposed 1 based on the computed correction amount.

Abstract translation: 对准校正方法包括：检测在扫描方向A上被扫描的待曝光基板1上预先设定的第一观察点14和第二观察点15的坐标的步骤，以观察取向偏差 要暴露的基材1; 基于检测到的坐标与根据第一观察点14和第二观察点15预先设定的参考线之间的偏差来计算校正量的步骤; 以及基于所计算的校正量来校正待曝光的衬底1的对准的步骤。