公开(公告)号：US20230130231A1

公开(公告)日：2023-04-27

申请号：US17935930

申请日：2022-09-27

Applicant: NOVA LTD.

Inventor： Gilad BARAK ,  Dror SHAFIR ,  Yanir HAINICK ,  Shahar Gov

IPC: G01N21/956 ,  G03F7/20 ,  G01N21/95

Abstract: A method for use in optical measurements on patterned structures, the method including performing a number of optical measurements on a structure with a measurement spot configured to provide detection of light reflected from an illuminating spot at least partially covering at least two different regions of the structure, the measurements including detecting light reflected from the at least part of the at least two different regions within the measurement spot, the detected light including interference of at least two complex electric fields reflected from the at least part of the at least two different regions, and being therefore indicative of a phase response of the structure, carrying information about properties of the structure.

公开(公告)号：US20240361253A1

公开(公告)日：2024-10-31

申请号：US18595292

申请日：2024-03-04

Applicant: NOVA LTD.

Inventor： Gilad BARAK ,  DANNY GROSSMAN ,  Dror SHAFIR ,  YOAV BERLATZKY ,  Yanir HAINICK

IPC: G01N21/956 ,  G01B9/02001 ,  G01B9/02015 ,  G01B9/02055 ,  G01B9/0209 ,  G01B11/06 ,  G01J3/453 ,  G01N21/88

CPC classification number: G01N21/956 ,  G01B9/02007 ,  G01B9/02032 ,  G01B9/02072 ,  G01B9/0209 ,  G01B11/0675 ,  G01J3/4535 ,  G01N21/8806 ,  G01B2210/56 ,  G01B2290/70 ,  G01N2021/8848

Abstract: A measurement system for use in measuring parameters of a patterned sample, the system including a broadband light source, an optical system configured as an interferometric system, a detection unit, and a control unit, where the interferometric system defines illumination and detection channels having a sample arm and a reference arm having a reference reflector, and is configured for inducing an optical path difference between the sample and reference arms, the detection unit for detecting a combined light beam formed by a light beam reflected from the reflector and a light beam propagating from a sample's support, and generating measured data indicative of spectral interference pattern formed by spectral interference signatures, and the control unit for receiving the measured data and applying a model-based processing to the spectral interference pattern for determining one or more parameters of the pattern in the sample.

公开(公告)号：US20240337590A1

公开(公告)日：2024-10-10

申请号：US18426319

申请日：2024-01-29

Applicant: NOVA LTD.

Inventor： Dror SHAFIR ,  Gilad BARAK ,  Shay WOLFLING ,  Michal Haim YACHINI ,  Matthew SENDELBACH ,  Cornel BOZDOG

IPC: G01N21/21 ,  G01N21/47

CPC classification number: G01N21/21 ,  G01N21/211 ,  G01N2021/4792 ,  G01N2201/061 ,  G01N2201/0683

Abstract: A method and system are presented for use in measuring on patterned samples, aimed at determining asymmetry in the pattern. A set of at least first and second measurements on a patterned region of a sample is performed, where each of the measurements comprises: directing illuminating light onto the patterned region along an illumination channel and collecting light reflected from the illuminated region propagating along a collection channel to be detected, such that detected light from the same patterned region has different polarization states which are different from polarization of the illuminating light, and generating a measured data piece indicative of the light detected in the measurement. Thus, at least first and second measured data pieces are generated for the at least first and second measurements on the same patterned region. The at least first and second measured data pieces are analyzed and output data is generated being indicative of a condition of asymmetry in the patterned region.

公开(公告)号：US20240271926A1

公开(公告)日：2024-08-15

申请号：US18566919

申请日：2022-06-03

Applicant: NOVA LTD.

Inventor： Dror SHAFIR ,  Zvi Gorohovsky ,  Jacob Ofek ,  Daphna Peimer ,  Tal Heilpern ,  Dana Szafranek ,  Gilad BARAK ,  Smadar Ferber

IPC: G01B11/06

CPC classification number: G01B11/06

Abstract: A method for semiconductor device metrology. The method may include creating a time-domain representation of wavelength-domain measurement data of light reflected by a three dimensional (3D) patterned structure of a semiconductor device; selecting one or more relevant peaks of the time-domain representation and at least one irrelevant portion of the time-domain representation. One or more relevant peaks occur during one or more relevant time periods; and are associated with corresponding relevant reference peaks that are associated with different versions of a reference 3D patterned structure.