公开(公告)号：US20150170878A1

公开(公告)日：2015-06-18

申请号：US14563553

申请日：2014-12-08

Applicant: CANON KABUSHIKI KAISHA

Inventor： Yusuke Sugiyama

IPC: H01J37/317

CPC classification number: H01J37/3177 ,  H01J2237/15 ,  H01J2237/31774 ,  H01J2237/31793 ,  H01J2237/31798

Abstract: A drawing apparatus includes a detection unit which detects defective beam and a control unit which controls irradiation with normal beam and the irradiation position in the sub-scanning direction. The control unit controls the irradiation such that, in accordance with a detection result of the detection unit, a normal beam is irradiated instead of the defective beam at a position that has been planned to be irradiated with the defective beam by changing an amount of change in the irradiation positions of the plurality of beams from the predetermined amount and, in a case in which the detection unit stops detecting the defective beam, the amount of change in the irradiation position of the plurality of beams is restored to the predetermined amount.

Abstract translation: 绘图装置包括检测缺陷光束的检测单元和控制正常光束照射的控制单元和副扫描方向上的照射位置。 控制单元控制照射，使得根据检测单元的检测结果，通过改变变化量而在已经被计划照射有缺陷光束的位置处照射正常光束而不是有缺陷光束 在预定量的多个光束的照射位置处，并且在检测单元停止检测到有缺陷的光束的情况下，多个光束的照射位置的变化量恢复到预定量。

公开(公告)号：US08884253B2

公开(公告)日：2014-11-11

申请号：US13397703

申请日：2012-02-16

Applicant: Alon Rosenthal

Inventor： Alon Rosenthal

IPC: H01J37/08 ,  H01J37/09 ,  G03F7/20 ,  H01J37/317 ,  H01L21/67 ,  H01J37/147 ,  B82Y40/00 ,  B82Y10/00

CPC classification number: G03F7/70858 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/708 ,  H01J37/09 ,  H01J37/1475 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0264 ,  H01J2237/31754 ,  H01J2237/31774 ,  H01J2237/31793 ,  H01L21/6719 ,  H01L21/67213

Abstract: The invention relates to a system for magnetically shielding a charged particle lithography apparatus. The system comprises a first chamber, a second chamber and a set of two coils. The first chamber has walls comprising a magnetic shielding material, and, at least partially, encloses the charged particle lithography apparatus. The second chamber also has walls comprising a magnetic shielding material, and encloses the first chamber. The set of two coils is disposed in the second chamber on opposing sides of the first chamber. The two coils have a common axis.

Abstract translation: 本发明涉及一种用于磁屏蔽带电粒子光刻设备的系统。 该系统包括第一室，第二室和一组两个盘管。 第一室具有包括磁屏蔽材料的壁，并且至少部分地包围带电粒子光刻设备。 第二室还具有包括磁屏蔽材料的壁，并且包围第一室。 该组两个线圈被布置在第二腔室中的第一腔室的相对侧上。 两个线圈具有公共轴。

公开(公告)号：US20140168629A1

公开(公告)日：2014-06-19

申请号：US14132240

申请日：2013-12-18

Applicant: CANON KABUSHIKI KAISHA

Inventor： Toshihiko NISHIDA ,  Hideki INA

IPC: H01J37/30

CPC classification number: H01J37/3177 ,  H01J37/304 ,  H01J2237/30433 ,  H01J2237/30455 ,  H01J2237/31793

Abstract: Provided is a drawing apparatus including a plurality of drawing devices each of which is configured to draw a pattern on a substrate with a plurality of charged particle beams, the plurality of drawing devices performing respective drawings in parallel, the drawing apparatus comprising: a measuring device configured to measure a flatness of the substrate, wherein each of the plurality of drawing devices comprises: a charged particle optical system configured to irradiate the substrate with the plurality of charged particle beams; and a controller configured to control an operation of the charged particle optical system so as to compensate for distortion of the pattern which is determined by data of inclination of a charged particle beam of the charged particle beams with respect to an axis of the charged particle optical system and data of the flatness measured by the measuring device.

Abstract translation: 提供了一种绘图装置，其包括多个绘图装置，每个绘图装置被配置为在多个带电粒子束的基板上绘制图案，所述多个绘图装置并行地执行各个附图，所述绘制装置包括：测量装置 被配置为测量所述基板的平坦度，其中所述多个绘图装置中的每一个包括：带电粒子光学系统，被配置为用所述多个带电粒子束照射所述基板; 以及控制器，被配置为控制带电粒子光学系统的操作，以补偿由带电粒子束的带电粒子束相对于带电粒子光轴的倾斜度的数据确定的图案的变形 由测量装置测量的平面度的系统和数据。

公开(公告)号：US08427919B2

公开(公告)日：2013-04-23

申请号：US13084870

申请日：2011-04-12

Applicant: Yoshikuni Goshima ,  Akira Noma

Inventor： Yoshikuni Goshima ,  Akira Noma

IPC: G11B7/00

CPC classification number: H01J37/304 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/68 ,  G03F1/78 ,  H01J37/3174 ,  H01J2237/31776 ,  H01J2237/31793 ,  H01J2237/31796

Abstract: Reflected and scattered electrons generated by emitting an electron beam onto a substrate are detected by a detecting unit. The product of the area (SN) and the irradiation time (tN) of the Nth shot in a predetermined measurement unit obtained from writing data is computed by a computing unit. The value obtained by accumulating an instructed equivalent value in the predetermined measurement unit and the value obtained by integrating the signal (DN) from the detecting unit in the predetermined measurement unit are compared and determined by a comparing unit to determine whether or not abnormality occurs in the irradiation amount of the electron beam.

Abstract translation: 通过检测单元检测通过将电子束发射到衬底上而产生的反射和散射的电子。 通过计算单元计算从写入数据获得的预定测量单位中的第N个镜头的面积（SN）和照射时间（tN）的乘积。 通过累积预定测量单位中的指示等效值获得的值和通过对来自预定测量单位的来自检测单元的信号（DN）进行积分而获得的值由比较单元进行比较和确定，以确定是否发生异常 电子束的照射量。

公开(公告)号：US07625679B2

公开(公告)日：2009-12-01

申请号：US11233616

申请日：2005-09-23

Applicant: Jeffrey S. Sullivan ,  Tony Tiecheng Young

Inventor： Jeffrey S. Sullivan ,  Tony Tiecheng Young

IPC: G03F9/00 ,  G03C5/00

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  G03F9/7015 ,  G03F9/7088 ,  H01J2237/31793 ,  Y10S430/143

Abstract: A significant improvement in the alignment of a particle-beam-generated pattern relative to a pre-existing pattern present on a substrate has been accomplished using optical measurement to register the particle beam to the pre-existing pattern. Use of a position fiducial which can be accurately measured by both an optical microscope and a particle beam axis is used to align a pre-existing pattern with a particle-beam-generated pattern during writing of the particle-beam-generated pattern. Registration of the pre-existing pattern to the fiducial and registration of the particle beam axis to the fiducial periodically during production of the particle-beam-generated pattern continually provides an improvement in the overall alignment of the pattern being created to the pre-existing pattern on the substrate. The improved method of alignment can be used to correct for drift, or thermal expansion, or gravitational sag, by way of example.

Abstract translation: 已经使用光学测量来实现粒子束生成图案相对于存在于衬底上的预先存在的图案的对准的显着改进，以将粒子束注册到预先存在的图案。 使用可以通过光学显微镜和粒子束轴两者精确测量的位置基准来使用在粒子束产生的图案的写入期间将预先存在的图案与粒子束产生的图案对准。 在生成粒子束生成图案期间，将预先存在的图案注册到基准和粒子束轴的基准周期性地定期地连续地提供了所创建的图案与预先存在的图案的整体对准的改进 在基板上。 改进的对准方法可以用于校正漂移或热膨胀或重力下垂的例子。

公开(公告)号：US07397039B2

公开(公告)日：2008-07-08

申请号：US11241794

申请日：2005-09-30

Applicant: Bruce B. Baxter ,  Benyamin Buller ,  Wenwei Qiao ,  Huei-Mei Kao

Inventor： Bruce B. Baxter ,  Benyamin Buller ,  Wenwei Qiao ,  Huei-Mei Kao

IPC: G01B11/02

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/20 ,  H01J2237/20292 ,  H01J2237/2826 ,  H01J2237/30438 ,  H01J2237/31793

Abstract: Improved systems, apparatus, and methods for detecting positions of moving stages and accurately compensating position error during operation (in “real time”) are provided. For some embodiments, rather than rely on two dimensional position measurements, measurements in at least three dimensions may be taken allowing compensation for pitch and roll and, therefore, more accurate position measurements. Further, by including a measurement of a beam column, compensation for movement of the beam may be performed.

Abstract translation: 提供了用于检测移动台的位置和在操作期间（“实时”）中精确地补偿位置误差的改进的系统，装置和方法。 对于一些实施例，不是依赖于二维位置测量，可以采取至少三维的测量，允许对俯仰和滚动进行补偿，并因此进行更准确的位置测量。 此外，通过包括光束列的测量，可以执行对光束的移动的补偿。

公开(公告)号：US20070114409A1

公开(公告)日：2007-05-24

申请号：US11655946

申请日：2007-01-22

Applicant: Takeshi Kawasaki ,  Takaho Yoshida ,  Yoichi Ose ,  Hideo Todokoro

Inventor： Takeshi Kawasaki ,  Takaho Yoshida ,  Yoichi Ose ,  Hideo Todokoro

IPC: G21K7/00

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/1471 ,  H01J37/153 ,  H01J37/265 ,  H01J37/28 ,  H01J37/302 ,  H01J2237/1501 ,  H01J2237/1534 ,  H01J2237/21 ,  H01J2237/2487 ,  H01J2237/2817 ,  H01J2237/31793

Abstract: An electron beam apparatus with an aberration corrector using multipole lenses is provided. The electron beam apparatus has a scan mode for enabling the operation of the aberration corrector and a scan mode for disabling the operation of the aberration corrector and the operation of each of the aberration corrector, a condenser lens, and the like is controlled such that the object point of an objective lens does not change in either of the scan modes. If a comparison is made between the secondary electron images of a specimen in the two modes, the image scaling factor and the focus remain unchanged and evaluation and adjustment can be performed by distinctly recognizing only the effect of the aberration corrector. This reduces the time required to adjust an optical axis which has been long due to an axial alignment defect inherent in the aberration corrector and an axial alignment defect in a part other than the aberration corrector which are indistinguishably intermingled with each other.

Abstract translation: 提供具有使用多极透镜的像差校正器的电子束装置。 电子束装置具有能够进行像差校正器的操作的扫描模式和用于禁止像差校正器的操作的扫描模式，并且每个像差校正器，聚光透镜等的操作被控制，使得 物镜的物体在任一种扫描模式下都不会改变。 如果在两种模式中的样本的二次电子图像之间进行比较，则图像缩放因子和焦点保持不变，并且可以通过清楚地仅识别像差校正器的效果来进行评估和调整。 这减少了由于像差校正器固有的轴向对准缺陷而长时间调整光轴所需的时间以及像差校正器之外的不同于彼此混合的部分的轴向对准缺陷所需的时间。

公开(公告)号：US20070024864A1

公开(公告)日：2007-02-01

申请号：US11492843

申请日：2006-07-26

Applicant: Yuichi Tachikawa ,  Kazumichi Yasui ,  Kiyoshi Nakaso ,  Kiyoshi Hattori ,  Tsugiyuki Okuya ,  Makoto Mita

Inventor： Yuichi Tachikawa ,  Kazumichi Yasui ,  Kiyoshi Nakaso ,  Kiyoshi Hattori ,  Tsugiyuki Okuya ,  Makoto Mita

IPC: G01B11/02

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  G03F9/7092 ,  H01J2237/31793

Abstract: A position measurement apparatus includes a movable stage structure, a measurement unit using a laser to measure a moved position of the stage and to output a corresponding measured value, a first filter configured to attenuate a first component of a certain frequency region of the measured value outputted by said measurement unit, a second filter connected in parallel with said first filter configured to attenuate a second component other than the certain frequency region of the measured value outputted by said measurement unit, a third filter connected in series to said second filter with the series connection of said second and third filters connected in parallel with the first filter, configured to attenuate the first component of said certain frequency region of the measured value outputted by said measurement unit, and a synthetic unit configured to combine an output of said first filter and an output of the series connection of the second and third filters and to thereby output a first combined value.

Abstract translation: 位置测量装置包括可移动平台结构，使用激光测量台的移动位置并输出相应测量值的测量单元，被配置为衰减测量值的某个频率区域的第一分量的第一滤波器 由所述测量单元输出的与所述第一滤波器并联连接的第二滤波器被配置为衰减由所述测量单元输出的测量值的特定频率区域以外的第二分量;第三滤波器，其与所述第二滤波器串联连接， 与所述第一滤波器并联连接的所述第二和第三滤波器的串联连接，被配置为衰减由所述测量单元输出的测量值的所述特定频率区域的第一分量;以及合成单元，被配置为将所述第一滤波器的输出 以及第二和第三滤波器的串联连接的输出，从而输出 第一个合并价值。

公开(公告)号：US07164141B2

公开(公告)日：2007-01-16

申请号：US11090244

申请日：2005-03-25

Applicant: Masaki Kurokawa

Inventor： Masaki Kurokawa

IPC: H01L21/027 ,  G03F7/20

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/31793

Abstract: A charged particle beam photolithography machine includes an electron gun, a deflector, a wafer stage, a standard substrate formed with a chip-shaped first mark group having a plurality of first marks and a chip-shaped second mark group having a plurality of second marks, a correction map having misalignment factors of the first marks based on positions of the second marks, and a deflection control unit for controlling an amount of deflection in the deflector. The charged particle is irradiated on a wafer while the deflection control unit makes reference to the correction map and corrects the amount of deflection as equivalent to the misalignment factors.

Abstract translation: 带电粒子束光刻机包括电子枪，偏转器，晶片台，形成有具有多个第一标记的芯片形状的第一标记组的标准基板和具有多个第二标记的芯片形状的第二标记组 ，具有基于第二标记的位置的第一标记的偏移因子的校正图以及用于控制偏转器中的偏转量的偏转控制单元。 当偏转控制单元参考校正图并且校正与不对准因子相当的偏转量时，将带电粒子照射在晶片上。

公开(公告)号：US20040217299A1

公开(公告)日：2004-11-04

申请号：US10853519

申请日：2004-05-26

Applicant: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE.

Inventor： Sang Kuk Choi ,  Dae Yong Kim ,  Dong Yel Kang

IPC: G01N021/00

CPC classification number: H01J9/02 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/26 ,  H01J37/1477 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/1516 ,  H01J2237/31793

Abstract: The present invention relates to a deflector of a micro-column electron beam apparatus and method for fabricating the same, which forms a seed metal layer and a mask layer on both sides of a substrate, and exposes some of the seed metal layer on which deflecting plates, wirings and pads are to be formed by lithography process using a predetermined mask. The wirings and pads are formed by plating metal on the exposed portion, and some of the metal layer is also exposed on which the deflecting plates are to be formed using a predetermined mask, and then the metal is plated with desired thickness, thereby the deflecting plates are completed. Therefore, by forming plurality of deflecting plates on both sides of the substrate at the same time through plating process, alignment between the deflecting plates formed on both sides of the substrate can be exactly made, and by fabricating a deflector integrated with the substrate and deflecting plates in a batch process, productivity and reproducibility is improved. In addition, since the deflecting plates, wirings and pads are directly formed on the substrate, structural safety is improved and thereby durability is also improved.