公开(公告)号：US09892884B2

公开(公告)日：2018-02-13

申请号：US15157407

申请日：2016-05-18

申请人： Samsung Electronics Co., Ltd.

发明人： Rae-Won Yi ,  Byoung-Sup Ahn ,  Dong-Gun Lee ,  Su-Young Lee

IPC分类号： H01J37/00 ,  H01J37/02 ,  H01J37/244 ,  H01J37/20

CPC分类号： H01J37/023 ,  H01J37/20 ,  H01J37/244 ,  H01J2237/20285 ,  H01J2237/20292 ,  H01J2237/24578

摘要： An exposure apparatus comprising, a stage configured to receive a substrate, a mark array disposed on the stage and comprising a first mark and a second mark separated from each other by a first distance, a first beam irradiator configured to irradiate a first beam to the first mark, a second beam irradiator being separated from the first beam by a pitch greater than the first distance and configured to irradiate a second beam to the second mark, a detector disposed over the mark array and configured to receive a third beam reflected by the first mark and a fourth beam reflected by the second mark, and a controller configured to control the position of the stage using an output of the detector.