发明授权
- 专利标题: Integrated optical and charged particle inspection apparatus
- 专利标题(中): 集成光学和带电粒子检测仪器
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申请号: US14428163申请日: 2013-09-16
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公开(公告)号: US09378921B2公开(公告)日: 2016-06-28
- 发明人: Jacob Pieter Hoogenboom , Aernout Christiaan Zonnevylle , Pieter Kruit , Angela Carolina Narváez-González
- 申请人: DELMIC B.V.
- 申请人地址: NL Delft
- 专利权人: DELMIC B.V.
- 当前专利权人: DELMIC B.V.
- 当前专利权人地址: NL Delft
- 代理机构: Dann, Dorfman, Herrell & Skillman
- 代理商 Stephen H. Eland
- 优先权: NL1039803 20120914; NL1040108 20130319
- 国际申请: PCT/NL2013/050669 WO 20130916
- 国际公布: WO2014/042538 WO 20140320
- 主分类号: H01J37/28
- IPC分类号: H01J37/28 ; H01J37/21 ; H01J37/02 ; H01J37/22
摘要:
The present invention relates to a method for mutually aligning a scanning electron microscope SEM and a light microscope LM by creating a change (61) in the detected light signal of the light microscope LM by illuminating a substrate with an electron beam, correlating the position of the electron beam in the coordinate system of the scanning electron microscope SEM to the position of the observed change in the detected light signal in the coordinate system of the light microscope LM, and relatively shifting the scanning electron microscope SEM and the light microscope LM with respect to one another to a desired relative position of the coordinate systems (60, 62).
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