公开(公告)号：US20150108350A1

公开(公告)日：2015-04-23

申请号：US14390095

申请日：2013-04-02

申请人： Jacob Pieter HOOGENBOOM ,  Pieter KRUIT ,  Nalan LIV ,  Aernout Christaan ZONNEVYLLE ,  DELMIC B.V.

发明人： Jacob Pieter Hoogenboom ,  Pieter Kruit ,  Nalan Liv ,  Aernout Christiaan Zonnevylle

IPC分类号： H01J37/22 ,  H01J37/28

CPC分类号： H01J37/222 ,  G01C21/32 ,  G01C21/3484 ,  H01J37/22 ,  H01J37/226 ,  H01J37/228 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/226 ,  H01J2237/24475 ,  H01J2237/2806

摘要： An apparatus for inspecting a sample, is equipped with a charged particle column for producing a focused beam of charged particles to observe or modify the sample, and an optical microscope to observe a region of interest on the sample as is observed by the charged particle beam or vice versa. The apparatus is accommodated with a processing unit adapted and equipped to represent an image as generated with the column and an image as generated with the microscope. The unit is further adapted to perform an alignment procedure mutually correlating a region of interest in one of the images, wherein the alignment procedure involves detecting a change in the optical image as caused by the charged particle beam.

摘要翻译： 用于检查样品的装置装备有带电粒子柱，用于产生聚焦的带电粒子束以观察或改变样品，以及光学显微镜以观察样品上的感兴趣区域，如通过带电粒子束 或相反亦然。 该装置容纳有适于和配备为表示用柱产生的图像和用显微镜产生的图像的处理单元。 该单元进一步适于执行在一个图像中相互关联感兴趣区域的对准过程，其中对准过程涉及检测由带电粒子束引起的光学图像的变化。

公开(公告)号：US10132753B2

公开(公告)日：2018-11-20

申请号：US15116788

申请日：2015-02-06

申请人： DELMIC B.V.

发明人： Jacob Pieter Hoogenboom ,  Pieter Kruit

IPC分类号： G01N25/02 ,  G01N21/64 ,  H01J37/22

摘要： The invention provides a method of determining a measure of a density of markers in a sample, and an apparatus arranged for performing said method. In particular said method comprising the steps of: irradiating an illumination region of the sample with light, wherein the markers present in the illumination region of the sample emit fluorescence light in response to the irradiation with light, detecting an intensity of the fluorescence light from a detection region of the sample, comprising at least a part of said the illumination region, irradiating an area within said detection region of the sample with a focused charged particle beam to deposit a dose of charged particles in said area, and determining a measure of the density of markers in said area using a change of the detected intensity of the fluorescence light as a function of the deposited dose of charged particles in said area.

公开(公告)号：US20170221675A1

公开(公告)日：2017-08-03

申请号：US15328439

申请日：2015-07-20

申请人： DELMIC B.V.

发明人： Jacob Pieter HOOGENBOOM ,  Nalan LIV HAMARAT ,  Pieter KRUIT

IPC分类号： H01J37/22 ,  G02B21/34 ,  G02B21/24 ,  G01N21/64 ,  H01J37/28 ,  H01J37/21 ,  G01N23/225 ,  G02B21/36 ,  H01J37/20

CPC分类号： H01J37/228 ,  G01N21/6458 ,  G01N23/2251 ,  G01N2223/408 ,  G02B21/244 ,  G02B21/34 ,  G02B21/365 ,  G02B21/368 ,  H01J37/20 ,  H01J37/21 ,  H01J37/28 ,  H01J2237/2003 ,  H01J2237/2826

摘要： The invention relates to a method for inspecting a sample with an assembly comprising a scanning electron microscope (SEM) and a light microscope (LM). The assembly comprises a sample holder for holding the sample. The sample holder is arranged for inspecting the sample with both the SEM and the LM, preferably at the same time. The method comprising the steps of: capturing a LM image of the sample in its position for imaging with the SEM; determining a position and dimensions of a region of interest in or on the sample using the LM image; determining values to which the SEM parameters need to be set to image the sample at a desired resolution; and capturing a SEM image of the region of interest, preferably using the first electron beam exposure of said region of interest.

公开(公告)号：US10651009B2

公开(公告)日：2020-05-12

申请号：US15328439

申请日：2015-07-20

申请人： DELMIC B.V.

发明人： Jacob Pieter Hoogenboom ,  Nalan Liv Hamarat ,  Pieter Kruit

IPC分类号： G01N23/225 ,  H01J37/22 ,  G01N21/64 ,  G02B21/24 ,  G02B21/34 ,  G02B21/36 ,  H01J37/20 ,  H01J37/21 ,  H01J37/28 ,  G01N23/2251

摘要： The invention relates to a method for inspecting a sample with an assembly comprising a scanning electron microscope (SEM) and a light microscope (LM). The assembly comprises a sample holder for holding the sample. The sample holder is arranged for inspecting the sample with both the SEM and the LM, preferably at the same time. The method comprising the steps of: capturing a LM image of the sample in its position for imaging with the SEM; determining a position and dimensions of a region of interest in or on the sample using the LM image; determining values to which the SEM parameters need to be set to image the sample at a desired resolution; and capturing a SEM image of the region of interest, preferably using the first electron beam exposure of said region of interest.

公开(公告)号：US09715992B2

公开(公告)日：2017-07-25

申请号：US14390095

申请日：2013-04-02

申请人： DELMIC B.V. ,  Jacob Pieter Hoogenboom ,  Pieter Kruit ,  Nalan M. SC Liv ,  Aernout Christiaan Zonnevylle

发明人： Jacob Pieter Hoogenboom ,  Pieter Kruit ,  Nalan Liv ,  Aernout Christiaan Zonnevylle

IPC分类号： H01J37/22 ,  G01C21/32 ,  H01J37/28 ,  G01C21/34

CPC分类号： H01J37/222 ,  G01C21/32 ,  G01C21/3484 ,  H01J37/22 ,  H01J37/226 ,  H01J37/228 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/226 ,  H01J2237/24475 ,  H01J2237/2806

摘要： An apparatus for inspecting a sample, is equipped with a charged particle column for producing a focused beam of charged particles to observe or modify the sample, and an optical microscope to observe a region of interest on the sample as is observed by the charged particle beam or vice versa. The apparatus is accommodated with a processing unit adapted and equipped to represent an image as generated with the column and an image as generated with the microscope. The unit is further adapted to perform an alignment procedure mutually correlating a region of interest in one of the images, wherein the alignment procedure involves detecting a change in the optical image as caused by the charged particle beam.

公开(公告)号：US20160377544A1

公开(公告)日：2016-12-29

申请号：US15116788

申请日：2015-02-06

申请人： DELMIC B.V.

发明人： Jacob Pieter HOOGENBOOM ,  Pieter KRUIT

IPC分类号： G01N21/64 ,  H01J37/22

CPC分类号： G01N21/6456 ,  G01N21/6428 ,  G01N2021/6441 ,  G01N2201/105 ,  H01J37/228

摘要： The invention provides a method of determining a measure of a density of markers in a sample, and an apparatus arranged for performing said method. In particular said method comprising the steps of:irradiating an illumination region of the sample with light, wherein the markers present in the illumination region of the sample emit fluorescence light in response to the irradiation with light,detecting an intensity of the fluorescence light from a detection region of the sample, comprising at least a part of said the illumination region,irradiating an area within said detection region of the sample with a focused charged particle beam to deposit a dose of charged particles in said area, anddetermining a measure of the density of markers in said area using a change of the detected intensity of the fluorescence light as a function of the deposited dose of charged particles in said area.

摘要翻译： 使用所检测的荧光强度作为所述区域中带电粒子的沉积剂量的函数的变化来确定所述区域中的标记物的密度的量度。

公开(公告)号：US09378921B2

公开(公告)日：2016-06-28

申请号：US14428163

申请日：2013-09-16

申请人： DELMIC B.V.

发明人： Jacob Pieter Hoogenboom ,  Aernout Christiaan Zonnevylle ,  Pieter Kruit ,  Angela Carolina Narváez-González

IPC分类号： H01J37/28 ,  H01J37/21 ,  H01J37/02 ,  H01J37/22

CPC分类号： H01J37/023 ,  H01J37/222 ,  H01J37/228 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/2482 ,  H01J2237/2801 ,  H01J2237/2808

摘要： The present invention relates to a method for mutually aligning a scanning electron microscope SEM and a light microscope LM by creating a change (61) in the detected light signal of the light microscope LM by illuminating a substrate with an electron beam, correlating the position of the electron beam in the coordinate system of the scanning electron microscope SEM to the position of the observed change in the detected light signal in the coordinate system of the light microscope LM, and relatively shifting the scanning electron microscope SEM and the light microscope LM with respect to one another to a desired relative position of the coordinate systems (60, 62).

摘要翻译： 本发明涉及通过用电子束照射基板来在光显微镜LM的检测光信号中产生变化（61）来相互对准扫描电子显微镜SEM和光学显微镜LM的方法， 扫描电子显微镜SEM的坐标系中的电子束到光显微镜LM的坐标系中检测到的光信号的观察位置的位置，并相对移动扫描电子显微镜SEM和光学显微镜LM，相对于 彼此相对于坐标系（60,62）的期望的相对位置。

公开(公告)号：US20150262784A1

公开(公告)日：2015-09-17

申请号：US14428163

申请日：2013-09-16

申请人： DELMIC B.V.

发明人： Jacob Pieter Hoogenboom ,  Aernout Christiaan Zonnevylle ,  Pieter Kruit ,  Angela Carolina Narváez-González

IPC分类号： H01J37/02 ,  H01J37/28 ,  H01J37/22

CPC分类号： H01J37/023 ,  H01J37/222 ,  H01J37/228 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/2482 ,  H01J2237/2801 ,  H01J2237/2808

摘要： The present invention relates to a method for mutually aligning a scanning electron microscope SEM and a light microscope LM by creating a change (61) in the detected light signal of the light microscope LM by illuminating a substrate with an electron beam, correlating the position of the electron beam in the coordinate system of the scanning electron microscope SEM to the position of the observed change in the detected light signal in the coordinate system of the light microscope LM, and relatively shifting the scanning electron microscope SEM and the light microscope LM with respect to one another to a desired relative position of the coordinate systems (60, 62).

摘要翻译： 本发明涉及通过用电子束照射基板来在光显微镜LM的检测光信号中产生变化（61）来相互对准扫描电子显微镜SEM和光学显微镜LM的方法， 扫描电子显微镜SEM的坐标系中的电子束到光显微镜LM的坐标系中检测到的光信号的观察位置的位置，并相对移动扫描电子显微镜SEM和光学显微镜LM，相对于 彼此相对于坐标系（60,62）的期望的相对位置。