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公开(公告)号：US11380515B2
公开(公告)日：2022-07-05
申请号：US16922552
申请日：2020-07-07
发明人： Keiichiro Hosobuchi , Masaki Mizuochi , Shuichi Nakagawa , Tomotaka Shibazaki , Takaaki Kikuchi
摘要： An object of the present disclosure is to provide a charged particle beam device that can suppress an influence to a device generated according to the preliminary exhaust. In order to achieve the object, suggested is a charged particle beam device including a vacuum sample chamber that maintains an atmosphere around a sample to be irradiated with a charged particle beam in a vacuum state; and a preliminary exhaust chamber to which a vacuum pump for vacuuming an atmosphere of the sample introduced into the vacuum sample chamber is connected, in which the vacuum sample chamber is a box-shaped body including a top plate, and a portion between the top plate and a side wall of the box-shaped body positioned below the top plate includes a portion in which the top plate and the side wall are not in contact with each other.
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2.发明授权公开(公告)号：US11342156B2
公开(公告)日：2022-05-24
申请号：US17152287
申请日：2021-01-19
摘要： A charged particle beam apparatus includes a sample stage on which a sample is mounted, a control device that controls to drive the sample stage, a linear scale that detects a position of the sample stage, laser position detection means for detecting the position of the sample stage, an optical microscope that observes the sample mounted on the sample stage, and a barrel that irradiates the sample mounted on the sample stage with an electron beam, and generates a secondary electron. Image data of a first correction sample mounted on the sample stage is acquired by the optical microscope, and position data of the sample stage is detected by the laser position detection means. The sample stage is positioned with respect to the barrel based on the image data acquired by the optical microscope and the position data of the sample stage detected by the laser position detection means.
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公开(公告)号：US12014897B2
公开(公告)日：2024-06-18
申请号：US17373921
申请日：2021-07-13
发明人： Akira Nishioka , Shuichi Nakagawa , Masaki Mizuochi , Takaaki Kikuchi , Masashi Fujita , Kenta Nomura , Naoya Ishigaki
IPC分类号： H01J37/26 , H01J37/34 , H01L21/677 , H05K7/20
CPC分类号： H01J37/261 , H01J37/3497 , H01L21/67739 , H05K7/20
摘要： A semiconductor processing apparatus according to the present invention includes a main body cover that covers a main body device and a control device. The main body cover has a transfer opening for transferring a semiconductor, and the main body cover further has an intake port that generates an air flow in a horizontal direction inside the main body cover.
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公开(公告)号：US11664185B2
公开(公告)日：2023-05-30
申请号：US17536223
申请日：2021-11-29
发明人： Jun Etoh , Hironori Ogawa , Shuichi Nakagawa , Terunobu Funatsu
CPC分类号： H01J37/023 , B06B1/0253 , B06B2201/30 , H01J2237/0216 , H03G3/20
摘要： A vibration damping system for a charged particle beam apparatus according to the present invention includes a column through which a charged particle beam passes, a vibration detection unit that detects vibration of the column, a damping mechanism that applies vibration to the column to suppress the vibration of the column, and a control device that controls the damping mechanism. The control device includes a damping gain control unit that amplifies a detection signal of the vibration detection unit with a set amplification factor and outputs an amplified detection signal as a control signal to the damping mechanism, and a saturation suppression unit that adjusts a feedback gain value of the damping gain control unit according to a detection signal of the vibration detection unit, a signal of the damping mechanism, and a maximum output value and a minimum output value of the damping mechanism.
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