- 专利标题: Vibration damping system for charged particle beam apparatus
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申请号: US17536223申请日: 2021-11-29
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公开(公告)号: US11664185B2公开(公告)日: 2023-05-30
- 发明人: Jun Etoh , Hironori Ogawa , Shuichi Nakagawa , Terunobu Funatsu
- 申请人: Hitachi High-Tech Corporation
- 申请人地址: JP Tokyo
- 专利权人: HITACHI HIGH-TECH CORPORATION
- 当前专利权人: HITACHI HIGH-TECH CORPORATION
- 当前专利权人地址: JP Tokyo
- 代理机构: Mattingly & Malur, PC
- 优先权: JP 2020217285 2020.12.25
- 主分类号: H01J37/02
- IPC分类号: H01J37/02 ; B06B1/02 ; H03G3/20
摘要:
A vibration damping system for a charged particle beam apparatus according to the present invention includes a column through which a charged particle beam passes, a vibration detection unit that detects vibration of the column, a damping mechanism that applies vibration to the column to suppress the vibration of the column, and a control device that controls the damping mechanism. The control device includes a damping gain control unit that amplifies a detection signal of the vibration detection unit with a set amplification factor and outputs an amplified detection signal as a control signal to the damping mechanism, and a saturation suppression unit that adjusts a feedback gain value of the damping gain control unit according to a detection signal of the vibration detection unit, a signal of the damping mechanism, and a maximum output value and a minimum output value of the damping mechanism.
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