公开(公告)号：US11545335B2

公开(公告)日：2023-01-03

申请号：US16287268

申请日：2019-02-27

申请人： EBARA CORPORATION

发明人： Takashi Ohara ,  Tsutomu Karimata

IPC分类号： H01J37/26 ,  F16L51/03 ,  G01N23/225 ,  F04D19/04

摘要： A vacuum connection mechanism includes: a main body part having a first opening and a first sub opening opened symmetrically in a first direction, and a second opening and a second sub opening opened symmetrically in a second direction; a first bellows connected to the first opening and to the end of which a first flange is provided; a first sub bellows connected to the first sub opening and to the end of which a first blind flange is provided; a first supporting member coupling the first flange and the first blind flange; a second bellows connected to the second opening and to the end of which a second flange is provided; a second sub bellows connected to the second sub opening and to the end of which a second blind flange is provided; and a second supporting member coupling the second flange and the second blind flange.

公开(公告)号：US10157722B2

公开(公告)日：2018-12-18

申请号：US15195665

申请日：2016-06-28

申请人： EBARA CORPORATION

发明人： Masahiro Hatakeyama ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Yoshihiko Naito ,  Yasushi Toma ,  Tsutomu Karimata ,  Takehide Hayashi ,  Kiwamu Tsukamoto ,  Tatsuya Kohama ,  Noboru Kobayashi

IPC分类号： H01J37/09 ,  H01J37/073 ,  G01N23/2251 ,  H01J37/20 ,  H01J37/26 ,  H01J37/28 ,  H01J37/29 ,  G01N23/22 ,  G01N23/223 ,  H01J37/10 ,  H01J37/22

摘要： An inspection device for inspecting a surface of an inspection object using a beam includes a beam generator capable of generating one of either charge particles or an electromagnetic wave as a beam, a primary optical system capable of guiding and irradiating the beam to the inspection object supported within a working chamber, a secondary optical system capable of including a first movable numerical aperture and a first detector which detects secondary charge particles generated from the inspection object, the secondary charge particles passing through the first movable numerical aperture, an image processing system capable of forming an image based on the secondary charge particles detected by the first detector; and a second detector arranged between the first movable numerical aperture and the first detector and which detects a location and shape at a cross over location of the secondary charge particles generated from the inspection object.

公开(公告)号：US08884225B2

公开(公告)日：2014-11-11

申请号：US13665623

申请日：2012-10-31

申请人： Ebara Corporation

发明人： Tsutomu Karimata ,  Tatsuya Kohama ,  Shoji Yoshikawa ,  Masahiro Hatakeyama

IPC分类号： H01J37/28 ,  H01J37/26 ,  H01J37/073 ,  H01J37/12

CPC分类号： H01J37/261 ,  H01J37/073 ,  H01J37/12 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/036 ,  H01J2237/062 ,  H01J2237/06333 ,  H01J2237/1205 ,  H01J2237/1518 ,  H01J2237/186 ,  H01J2237/2443 ,  H01J2237/2817

摘要： An electron beam inspection device observes a sample by irradiating the sample set on a stage with electron beams and detecting the electron beams from the sample. The electron beam inspection device has one electron column which irradiates the sample with the electron beams, and detects the electron beams from the sample. In this one electron column, a plurality of electron beam irradiation detecting systems are formed which each form electron beam paths in which the electron beams with which the sample is irradiated and the electron beams from the sample pass. The electron beam inspection device inspects the sample by simultaneously using a plurality of electron beam irradiation detecting systems and simultaneously irradiating the sample with the plurality of electron beams.

摘要翻译： 电子束检查装置通过用电子束照射载物台上的样品并检测来自样品的电子束来观察样品。 电子束检查装置具有一个电子管，用电子束照射样品，并检测来自样品的电子束。 在该一个电子柱中，形成多个电子束照射检测系统，每个电子束照射检测系统形成电子束路径，其中照射样品的电子束和来自样品的电子束通过。 电子束检查装置通过同时使用多个电子束照射检测系统来检查样品，同时用多个电子束照射样品。

公开(公告)号：US20140034831A1

公开(公告)日：2014-02-06

申请号：US13732897

申请日：2013-01-02

申请人： Ebara Corporation ,  Kabushiki Kaisha Toshiba

发明人： Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Masahiro Hatakeyama ,  Toshifumi Kimba ,  Hirosi Sobukawa ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Shin Oowada ,  Mutsumi Saito ,  Yuichiro Yamazaki ,  Takamitsu Nagai ,  Ichirota Nagahama

IPC分类号： G01N23/225 ,  G01N23/227

CPC分类号： H01J29/70 ,  G01N23/225 ,  G01N23/2251 ,  G01N23/227 ,  H01J37/06 ,  H01J37/073 ,  H01J37/141 ,  H01J37/185 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/266 ,  H01J37/28 ,  H01J2237/082 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/24564 ,  H01J2237/2806 ,  H01J2237/2816 ,  H01J2237/2817 ,  H01L21/6719 ,  H01L21/67213

摘要： An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical system; a stage system 50 for holding and moving the object relative to the electron-optical system; a mini-environment chamber 20 for supplying a clean gas to the object to prevent dust from contacting to the object; a working chamber 31 for accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambers 41, 42 disposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; and a loader 60 for transferring the object to the stage system through the loading chambers.

摘要翻译： 电子束检查装置包括：电子光学装置70，具有用于从电子束源向一个电子束照射物体的电子 - 光学系统;以及用于检测由电子束投射的二次电子图像的检测器， 光学系统; 用于相对于电子 - 光学系统保持和移动物体的平台系统50; 微型环境室20，用于向物体供应清洁气体，以防止灰尘与物体接触; 用于容纳平台装置的工作室31，工作室可控制为具有真空气氛; 设置在迷你环境室和工作室之间的至少两个装载室41,42适于独立控制以具有真空气氛; 以及用于通过装载室将物体传送到舞台系统的装载器60。

公开(公告)号：US09134261B2

公开(公告)日：2015-09-15

申请号：US14257071

申请日：2014-04-21

申请人： EBARA CORPORATION

发明人： Shoji Yoshikawa ,  Kiwamu Tsukamoto ,  Takeshi Murakami ,  Masahiro Hatakeyama ,  Tsutomu Karimata

IPC分类号： H01J37/26 ,  G01N23/22 ,  H01J37/09 ,  H01J37/16 ,  H01J37/20 ,  H01J37/285 ,  G01N21/95

CPC分类号： H01J37/023 ,  G01N21/9501 ,  G01N23/2204 ,  H01J37/09 ,  H01J37/16 ,  H01J37/20 ,  H01J37/285 ,  H01J2237/022 ,  H01J2237/0264 ,  H01J2237/1501 ,  H01J2237/166 ,  H01J2237/20 ,  H01J2237/2007 ,  H01J2237/20221 ,  H01J2237/20278 ,  H01J2237/26

摘要： An inspection apparatus capable of facilitating reduction in cost of the apparatus is provided. The inspection apparatus includes: beam generation means for generating any of charged particles and electromagnetic waves as a beam; a primary optical system that guides the beam into an inspection object held on a movable stage in a working chamber and irradiates the inspection object with the beam; a secondary optical system that detects secondary charged particles occurring from the inspection object; and an image processing system that forms an image on the basis of the detected secondary charged particles. The inspection apparatus further includes: a linear motor that drives the movable stage; and a Helmholtz coil that causes a magnetic field for canceling a magnetic field caused by the linear motor when the movable stage is driven.

摘要翻译： 提供了能够有助于降低设备成本的检查装置。 检查装置包括：用于产生任何带电粒子和电磁波作为光束的光束产生装置; 将光束引导到保持在工作室中的可移动台上的检查对象中并用该束照射检查对象的主光学系统; 第二光学系统，其检测从检查对象发生的次级带电粒子; 以及基于检测到的二次带电粒子形成图像的图像处理系统。 检查装置还包括：驱动可动台的直线电机; 以及亥姆霍兹线圈，其在驱动可动载物台时引起磁场消除由线性马达引起的磁场。

公开(公告)号：US20140319346A1

公开(公告)日：2014-10-30

申请号：US14319620

申请日：2014-06-30

申请人： EBARA CORPORATION

发明人： Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Masahiro Hatakeyama ,  Toshifumi Kimba ,  Hirosi Sobukawa ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Shin Oowada ,  Mutsumi Saito ,  Yuichiro Yamazaki ,  Takamitsu Nagai ,  Ichirota Nagahama

IPC分类号： G01N23/225 ,  G01N23/227

CPC分类号： H01J29/70 ,  G01N23/225 ,  G01N23/2251 ,  G01N23/227 ,  H01J37/06 ,  H01J37/073 ,  H01J37/141 ,  H01J37/185 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/266 ,  H01J37/28 ,  H01J2237/082 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/24564 ,  H01J2237/2806 ,  H01J2237/2816 ,  H01J2237/2817 ,  H01L21/6719 ,  H01L21/67213

摘要： An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical systems; a stage system 50 for holding and moving the object relative to the electron-optical system; a mini-environment chamber 20 for supplying a clean gas to the object to prevent dust from contacting the object; a working chamber 31 for accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambers 41, 42 disposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; and a loader 60 for transferring the object to the stage system through the loading chambers.

摘要翻译： 电子束检查装置包括：电子光学装置70，具有用于从电子束源向一个电子束照射物体的电子 - 光学系统;以及用于检测由电子束投射的二次电子图像的检测器， 光学系统; 用于相对于电子 - 光学系统保持和移动物体的平台系统50; 小型环境室20，用于向物体供给清洁气体，以防止灰尘与物体接触; 用于容纳平台装置的工作室31，工作室可控制为具有真空气氛; 设置在微环境室和工作室之间的至少两个装载室41,42适于独立控制以具有真空气氛; 以及用于通过装载室将物体传送到舞台系统的装载器60。

公开(公告)号：US11164697B2

公开(公告)日：2021-11-02

申请号：US16461109

申请日：2018-04-04

申请人： EBARA CORPORATION

发明人： Keisuke Matsushima ,  Tsutomu Karimata

IPC分类号： H01F7/06 ,  H01F41/04 ,  H01F7/20 ,  H01F27/28 ,  H01J37/147 ,  H01F41/06 ,  H01J37/28

摘要： A coil-integrated-type yoke for realizing a deflector that can accurately deflect an orbit of an electron beam and a manufacturing method thereof are provided. There is provided a manufacturing method of a coil-integrated-type yoke, the manufacturing method including: a step of sequentially inserting a molding agent, a coil, and a spacer into a groove heading from a first surface toward a second surface of the yoke; and a step of polishing the first surface of the yoke and the spacer together.

公开(公告)号：US20150122993A1

公开(公告)日：2015-05-07

申请号：US14596447

申请日：2015-01-14

申请人： EBARA CORPORATION

发明人： Nobuharu Noji ,  Tohru Satake ,  Hirosi Sobukawa ,  Toshifumi Kimba ,  Masahiro Hatakeyama ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Kenichi Suematsu ,  Yutaka Tabe ,  Ryo Tajima ,  Keiichi Tohyama

IPC分类号： H01J37/20 ,  G01N23/22

CPC分类号： H01J37/20 ,  G01N23/2204 ,  G01N23/225 ,  H01J37/05 ,  H01J37/28 ,  H01J2237/202 ,  H01J2237/2441 ,  H01J2237/2446 ,  H01J2237/2801 ,  H01J2237/2817 ,  H01L21/6833 ,  H01L2223/54466

摘要： A substrate is irradiated by primary electrons and secondary electrons generated from the substrate are detected by a detector. A reference die is placed on the stage to obtain a pattern matching template image including feature coordinates of the reference die. A pattern matching is performed with an arbitrary die in a row or column including the reference die using the template image to obtain feature coordinates of the arbitrary die. An angle of misalignment is calculated between the direction of the row or column including the reference die and one of the directions of movement of the substrate on the basis of the feature coordinates of the arbitrary die and those of the reference die. The stage is rotated to correct the angle of misalignment to conform the direction of the row or column including the reference die with the one of the directions of movement of the substrate.

摘要翻译： 用一次电子照射衬底，由检测器检测由衬底产生的二次电子。 将参考管芯放置在平台上以获得包括参考管芯的特征坐标的模式匹配模板图像。 使用模板图像，使用包含基准管芯的行或列中的任意管芯进行图案匹配，以获得任意管芯的特征坐标。 基于任意模具的特征坐标和参考模具的特征坐标，在包括基准模具的行或列的方向与基板的移动方向之间计算出未对准的角度。 旋转台阶以校正未对准的角度，以使包括基准模具的行或列的方向与衬底的移动方向之一相一致。

公开(公告)号：US20140367570A1

公开(公告)日：2014-12-18

申请号：US14326076

申请日：2014-07-08

申请人： EBARA CORPORATION

发明人： Toshifumi Kimba ,  Tohru Satake ,  Tsutomu Karimata ,  Kenji Watanabe ,  Nobuharu Noji ,  Takeshi Murakami ,  Masahiro Hatakeyama ,  Mamoru Nakasuji ,  Hirosi Sobukawa ,  Shoji Yoshikawa ,  Shin Oowada ,  Mutsumi Saito

IPC分类号： H01J37/22 ,  H01J37/18 ,  H01J37/06 ,  H01J37/28

CPC分类号： H01J37/222 ,  G01N23/225 ,  G01N23/2251 ,  H01J37/06 ,  H01J37/073 ,  H01J37/185 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/0216 ,  H01J2237/082 ,  H01J2237/2002 ,  H01J2237/2007 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/24564 ,  H01J2237/2806 ,  H01J2237/2813 ,  H01J2237/2816 ,  H01J2237/2817 ,  H01L2224/48227 ,  H01L2924/01019 ,  H01L2924/01025 ,  H01L2924/01057 ,  H01L2924/01067 ,  H01L2924/01078 ,  H01L2924/10253 ,  H01L2924/12032 ,  H01L2924/3025 ,  H01L2924/00

摘要： There is provided a substrate inspection method. The method includes: maintaining a vacuum in said inspection chamber; isolating said inspection chamber from a vibration; positioning the substrate on a stage in the inspection chamber; selecting an evaluation parameter according to a kind of said processing apparatus; and determining inspection regions of the substrate so that an inspection time required per a lot of the substrate is equal to a processing time spent for said processing step required per a lot of the substrate. The method also includes radiating a primary electron beam from an electron gun; deflecting the primary electron beam with an E*B unit; irradiating said inspection regions of the substrate with the deflected primary electron beam; and projecting secondary electrons emitted from said substrate through the E*B unit onto a detector with a secondary optical system.

摘要翻译： 提供了基板检查方法。 该方法包括：在所述检查室中保持真空; 将所述检查室与振动隔离; 将基板定位在检查室中的台上; 根据所述处理装置的种类选择评估参数; 并且确定基板的检查区域，使得每批次的基板所需的检查时间等于每批基板所需的所述处理步骤所花费的处理时间。 该方法还包括从电子枪辐射一次电子束; 用E * B单元偏转一次电子束; 用偏转的一次电子束照射基板的所述检查区域; 并且通过E * B单元将从所述衬底发射的二次电子投射到具有次级光学系统的检测器上。

公开(公告)号：US20130161511A1

公开(公告)日：2013-06-27

申请号：US13665623

申请日：2012-10-31

申请人： Ebara Corporation

发明人： Tsutomu Karimata ,  Tatsuya Kohama ,  Shoji Yoshikawa ,  Masahiro Hatakeyama

IPC分类号： H01J37/26

CPC分类号： H01J37/261 ,  H01J37/073 ,  H01J37/12 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/036 ,  H01J2237/062 ,  H01J2237/06333 ,  H01J2237/1205 ,  H01J2237/1518 ,  H01J2237/186 ,  H01J2237/2443 ,  H01J2237/2817

摘要： An electron beam inspection device observes a sample by irradiating the sample set on a stage with electron beams and detecting the electron beams from the sample. The electron beam inspection device has one electron column which irradiates the sample with the electron beams, and detects the electron beams from the sample. In this one electron column, a plurality of electron beam irradiation detecting systems are formed which each form electron beam paths in which the electron beams with which the sample is irradiated and the electron beams from the sample pass. The electron beam inspection device inspects the sample by simultaneously using a plurality of electron beam irradiation detecting systems and simultaneously irradiating the sample with the plurality of electron beams.

摘要翻译： 电子束检查装置通过用电子束照射载物台上的样品并检测来自样品的电子束来观察样品。 电子束检查装置具有一个电子管，用电子束照射样品，并检测来自样品的电子束。 在该一个电子柱中，形成多个电子束照射检测系统，每个电子束照射检测系统形成电子束路径，其中照射样品的电子束和来自样品的电子束通过。 电子束检查装置通过同时使用多个电子束照射检测系统来检查样品，同时用多个电子束照射样品。