公开(公告)号：US20240234620A9

公开(公告)日：2024-07-11

申请号：US18499141

申请日：2023-10-31

申请人： ASML Netherlands B.V.

发明人： Gianpaolo LORITO ,  Stoyan NIHTIANOV ,  Xinqing LIANG ,  Kenichi KANAI

IPC分类号： H01L31/115 ,  H01J37/244 ,  H01J37/28

CPC分类号： H01L31/115 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/2441

摘要： The present disclosure describes a detector used in critical dimension scanning electron microscopes (CD-SEM) and review SEM systems. In one embodiment, the detector includes a semiconductor structure having a p-n junction and a hole through which a scanning beam is passed to a target. The detector also includes a top electrode for the p-n junction (e.g., anode or cathode) that provides an active area for detecting electrons or electromagnetic radiation (e.g., backscattering from the target). The top electrode has a doped layer and can also have a buried portion beneath the doped layer to reduce a series resistance of the top electrode without changing the active area. In another embodiment, an isolation structure can be formed in the semiconductor structure near sidewalls of the hole to electrically isolate the active area from the sidewalls. A method for forming the buried portion of the top electrode is also described.

公开(公告)号：US20180217059A1

公开(公告)日：2018-08-02

申请号：US15749043

申请日：2016-07-22

申请人： FEI Company

发明人： Nicholas C. BARBI ,  Richard B. MOTT ,  Owen HEALY

IPC分类号： G01N21/64 ,  H01J37/244 ,  H01J37/28 ,  G01J1/42

CPC分类号： G01N21/64 ,  G01J1/42 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/2441 ,  H01J2237/2445 ,  H01J2237/24465 ,  H01J2237/24475

摘要： A detector for a charged particle beam device includes a substrate, a number of first sensor devices provided on the substrate, wherein the first sensor devices are structured to be sensitive to and generate a first signal in response to electrons ejected by a specimen, and a number of second sensor devices provided on the substrate, wherein the second sensor devices are structured to be sensitive to and generate a second signal in response to photons emitted by the specimen. Also, a photon detector wherein each of the photon sensor devices is structured to be sensitive to and generate a signal in response to photons emitted by the specimen, and wherein each of the photon sensor devices comprises a MultiPixel Photon Counter device. Further, a method of imaging a specimen using a charged particle beam device uses beam blanking and determination of estimated a decay time constants.

公开(公告)号：US09767986B2

公开(公告)日：2017-09-19

申请号：US14834991

申请日：2015-08-25

申请人： KLA-Tencor Corporation

发明人： David L. Brown ,  Yung-Ho Alex Chuang ,  John Fielden ,  Marcel Trimpl ,  Jingjing Zhang ,  Devis Contarato ,  Venkatraman Iyer

IPC分类号： H01J37/244 ,  H01J37/28 ,  H01L31/00 ,  G01T1/24

CPC分类号： G01N30/72 ,  G01T1/24 ,  G06F19/00 ,  H01J37/244 ,  H01J37/28 ,  H01J49/02 ,  H01J2237/2441 ,  H01J2237/2446 ,  H01J2237/24475 ,  H01J2237/24495 ,  H01J2237/24592 ,  H01L27/1464 ,  H01L27/14659 ,  H01L27/14661 ,  H01L31/00

摘要： A scanning electron microscope incorporates a multi-pixel solid-state electron detector. The multi-pixel solid-state detector may detect back-scattered and/or secondary electrons. The multi-pixel solid-state detector may incorporate analog-to-digital converters and other circuits. The multi-pixel solid state detector may be capable of approximately determining the energy of incident electrons and/or may contain circuits for processing or analyzing the electron signals. The multi-pixel solid state detector is suitable for high-speed operation such as at a speed of about 100 MHz or higher. The scanning electron microscope may be used for reviewing, inspecting or measuring a sample such as unpatterned semiconductor wafer, a patterned semiconductor wafer, a reticle or a photomask. A method of reviewing or inspecting a sample is also described.

公开(公告)号：US09406480B2

公开(公告)日：2016-08-02

申请号：US14596447

申请日：2015-01-14

申请人： EBARA CORPORATION

发明人： Nobuharu Noji ,  Tohru Satake ,  Hirosi Sobukawa ,  Toshifumi Kimba ,  Masahiro Hatakeyama ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Kenichi Suematsu ,  Yutaka Tabe ,  Ryo Tajima ,  Keiichi Tohyama

IPC分类号： H01J37/28 ,  G01N23/22 ,  G01N23/225 ,  H01J37/20 ,  H01J37/05 ,  H01L21/683

CPC分类号： H01J37/20 ,  G01N23/2204 ,  G01N23/225 ,  H01J37/05 ,  H01J37/28 ,  H01J2237/202 ,  H01J2237/2441 ,  H01J2237/2446 ,  H01J2237/2801 ,  H01J2237/2817 ,  H01L21/6833 ,  H01L2223/54466

摘要： A substrate is irradiated by primary electrons and secondary electrons generated from the substrate are detected by a detector. A reference die is placed on the stage to obtain a pattern matching template image including feature coordinates of the reference die. A pattern matching is performed with an arbitrary die in a row or column including the reference die using the template image to obtain feature coordinates of the arbitrary die. An angle of misalignment is calculated between the direction of the row or column including the reference die and one of the directions of movement of the substrate on the basis of the feature coordinates of the arbitrary die and those of the reference die. The stage is rotated to correct the angle of misalignment to conform the direction of the row or column including the reference die with the one of the directions of movement of the substrate.

公开(公告)号：US08946631B2

公开(公告)日：2015-02-03

申请号：US14156140

申请日：2014-01-15

申请人： Ebara Corporation

发明人： Nobuharu Noji ,  Tohru Satake ,  Hirosi Sobukawa ,  Toshifumi Kimba ,  Masahiro Hatakeyama ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Kenichi Suematsu ,  Yutaka Tabe ,  Ryo Tajima ,  Keiichi Tohyama

IPC分类号： G01N23/225 ,  H01J37/28 ,  H01L21/683

CPC分类号： H01J37/20 ,  G01N23/2204 ,  G01N23/225 ,  H01J37/05 ,  H01J37/28 ,  H01J2237/202 ,  H01J2237/2441 ,  H01J2237/2446 ,  H01J2237/2801 ,  H01J2237/2817 ,  H01L21/6833 ,  H01L2223/54466

摘要： A substrate is irradiated by primary electrons and secondary electrons generated from the substrate are detected by a detector. A reference die is placed on the stage to obtain a pattern matching template image including feature coordinates of the reference die. A pattern matching is performed with an arbitrary die in a row or column including the reference die using the template image to obtain feature coordinates of the arbitrary die. An angle of misalignment is calculated between the direction of the row or column including the reference die and one of the directions of movement of the substrate on the basis of the feature coordinates of the arbitrary die and those of the reference die. The stage is rotated to correct the angle of misalignment to conform the direction of the row or column including the reference die with the one of the directions of movement of the substrate.

摘要翻译： 用一次电子照射衬底，由检测器检测由衬底产生的二次电子。 将参考管芯放置在平台上以获得包括参考管芯的特征坐标的模式匹配模板图像。 使用模板图像，使用包含基准管芯的行或列中的任意管芯进行图案匹配，以获得任意管芯的特征坐标。 基于任意模具的特征坐标和参考模具的特征坐标，在包括基准模具的行或列的方向与基板的移动方向之间计算出未对准的角度。 旋转台阶以校正未对准的角度，以使包括基准模具的行或列的方向与衬底的运动方向之一相一致。

公开(公告)号：US08796621B2

公开(公告)日：2014-08-05

申请号：US13853418

申请日：2013-03-29

申请人： Ebara Corporation

发明人： Masahiro Hatakeyama ,  Shoji Yoshikawa ,  Kenichi Suematsu ,  Tsutomu Karimata ,  Nobuharu Noji

IPC分类号： G01N23/00 ,  G21K7/00

CPC分类号： H01J37/261 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/2441 ,  H01J2237/2446

摘要： An inspecting apparatus for reducing a time loss associated with a work for changing a detector is characterized by comprising a plurality of detectors 11, 12for receiving an electron beam emitted from a sample W to capture image data representative of the sample W, and a switching mechanism M for causing the electron beam to be incident on one of the plurality of detectors 11, 12, where the plurality of detectors 11, 12 are disposed in the same chamber MC. The plurality of detectors 11, 12 can be an arbitrary combination of a detector comprising an electron sensor for converting an electron beam into an electric signal with a detector comprising an optical sensor for converting an electron beam into light and converting the light into an electric signal. The switching mechanism M may be a mechanical moving mechanism or an electron beam deflector.

摘要翻译： 用于减少与用于改变检测器的工作相关联的时间损失的检查装置的特征在于包括多个检测器11,12，用于接收从样品W发射的电子束以捕获表示样品W的图像数据，以及切换机构 M，用于使电子束入射到多个检测器11,12中的一个上，其中多个检测器11,12设置在同一个室MC中。 多个检测器11,12可以是包括用于将电子束转换为电信号的电子传感器的检测器的任意组合，该检测器包括用于将电子束转换成光并将光转换成电信号的光学传感器 。 切换机构M可以是机械移动机构或电子束偏转器。

公开(公告)号：US08629395B2

公开(公告)日：2014-01-14

申请号：US13521273

申请日：2011-01-12

申请人： Hideo Morishita ,  Michio Hatano ,  Takashi Ohshima ,  Mitsugu Sato ,  Tetsuya Sawahata ,  Sukehiro Ito ,  Yasuko Aoki

发明人： Hideo Morishita ,  Michio Hatano ,  Takashi Ohshima ,  Mitsugu Sato ,  Tetsuya Sawahata ,  Sukehiro Ito ,  Yasuko Aoki

IPC分类号： H01J37/28 ,  H01J37/244 ,  G01N23/22

CPC分类号： H01J49/067 ,  H01J37/244 ,  H01J2237/2441 ,  H01J2237/24465 ,  H01J2237/2448 ,  H01J2237/28

摘要： In order to provide a charged particle beam apparatus that can detect charged particle beam signals in discrimination into a plurality of energy bands, and obtain high-resolution images for each of the energy bands using the signals, the charged particle beam apparatus has a charged particle source (12-1); an aperture (16) that limits the diameter of the charged particle beam (4); optics (14, 17, 19) for the charged particle beam; a specimen holder (21); a charged particle detector (40) that detects secondary charged particles and reflected charged particles from a specimen; and signal calculation unit that processes the output signal from the charged particle detector. The charged particle detector (40) is provided with a first small detector (51) having a first detection sensitivity and a second small detector (52) having a second detection sensitivity, and makes the detection solid angle viewed from a position on the specimen, to which the charged particle beam (4) is to be radiated, to be the same for the first small detector (51) and the second small detector (52).

摘要翻译： 为了提供一种带电粒子束装置，其能够将鉴别中的带电粒子束信号检测为多个能带，并且使用该信号获得每个能带的高分辨率图像，带电粒子束装置具有带电粒子 来源（12-1）; 限制带电粒子束（4）的直径的孔（16）; 用于带电粒子束的光学器件（14,17,19） 样品架（21）; 检测来自试样的二次带电粒子和反射带电粒子的带电粒子检测器（40） 以及处理来自带电粒子检测器的输出信号的信号计算单元。 带电粒子检测器（40）具有第一检测灵敏度的第一小检测器（51）和具有第二检测灵敏度的第二小检测器（52），并从检体上的位置观察检测立体角， 对于第一小型检测器（51）和第二小型检测器（52），带电粒子束（4）将被照射到其上。

公开(公告)号：US20130313429A1

公开(公告)日：2013-11-28

申请号：US13954425

申请日：2013-07-30

申请人： Nobuharu Noji ,  Yoshihiko Naito ,  Hirosi Sobukawa ,  Kenji Terao ,  Masahiro Hatakeyama ,  Katsuya Okumura

发明人： Nobuharu Noji ,  Yoshihiko Naito ,  Hirosi Sobukawa ,  Kenji Terao ,  Masahiro Hatakeyama ,  Katsuya Okumura

IPC分类号： H01J37/26

CPC分类号： H01J37/265 ,  G01R31/307 ,  H01J37/04 ,  H01J2237/2441 ,  H01J2237/2446 ,  H01J2237/2594 ,  H01J2237/2817

摘要： Provided is a method and an apparatus for inspecting a sample surface with high accuracy. Provided is a method for inspecting a sample surface by using an electron beam method sample surface inspection apparatus, in which an electron beam generated by an electron gun of the electron beam method sample surface inspection apparatus is irradiated onto the sample surface, and secondary electrons emanating from the sample surface are formed into an image toward an electron detection plane of a detector for inspecting the sample surface, the method characterized in that a condition for forming the secondary electrons into an image on a detection plane of the detector is controlled such that a potential in the sample surface varies in dependence on an amount of the electron beam irradiated onto the sample surface.

公开(公告)号：US08492715B2

公开(公告)日：2013-07-23

申请号：US13441344

申请日：2012-04-06

申请人： Maximus Theodorus Otten ,  Gerrit Cornelis Van Hoften ,  Joeri Lof

发明人： Maximus Theodorus Otten ,  Gerrit Cornelis Van Hoften ,  Joeri Lof

IPC分类号： G01N23/00 ,  G21K7/00

CPC分类号： H01J37/26 ,  H01J37/244 ,  H01J37/302 ,  H01J2237/0203 ,  H01J2237/043 ,  H01J2237/065 ,  H01J2237/22 ,  H01J2237/2441 ,  H01J2237/24455 ,  H01J2237/24507 ,  H01J2237/26 ,  H01J2237/262 ,  H01J2237/2802

摘要： The invention relates to a Method of protecting a direct electron detector (151) in a TEM. The invention involves predicting the current density on the detector before setting new beam parameters, such as changes to the excitation of condenser lenses (104), projector lenses (106) and/or beam energy. The prediction is made using an optical model or a Look-Up-Table. When the predicted exposure of the detector is less than a predetermined value, the desired changes are made, otherwise a warning message is generated and changes to the settings are postponed.

摘要翻译： 本发明涉及一种在TEM中保护直接电子检测器（151）的方法。 本发明涉及在设置新的光束参数之前预测检测器上的电流密度，例如对聚光透镜（104），投影透镜（106）和/或光束能量的激发的改变。 使用光学模型或查找表进行预测。 当检测器的预测曝光小于预定值时，进行所需的改变，否则产生警告消息并延迟对设置的改变。

公开(公告)号：US20120256085A1

公开(公告)日：2012-10-11

申请号：US13441344

申请日：2012-04-06

申请人： Maximus Theodorus Otten ,  Gerrit Cornelis van Hoften ,  Joeri Lof

发明人： Maximus Theodorus Otten ,  Gerrit Cornelis van Hoften ,  Joeri Lof

IPC分类号： H01J37/26

CPC分类号： H01J37/26 ,  H01J37/244 ,  H01J37/302 ,  H01J2237/0203 ,  H01J2237/043 ,  H01J2237/065 ,  H01J2237/22 ,  H01J2237/2441 ,  H01J2237/24455 ,  H01J2237/24507 ,  H01J2237/26 ,  H01J2237/262 ,  H01J2237/2802

摘要： The invention relates to a Method of protecting a direct electron detector (151) in a TEM. The invention involves predicting the current density on the detector before setting new beam parameters, such as changes to the excitation of condenser lenses (104), projector lenses (106) and/or beam energy. The prediction is made using an optical model or a Look-Up-Table. When the predicted exposure of the detector is less than a predetermined value, the desired changes are made, otherwise a warning message is generated and changes to the settings are postponed.

摘要翻译： 本发明涉及一种在TEM中保护直接电子检测器（151）的方法。 本发明涉及在设置新的光束参数之前预测检测器上的电流密度，例如对聚光透镜（104），投影透镜（106）和/或光束能量的激发的改变。 使用光学模型或查找表进行预测。 当检测器的预测曝光小于预定值时，进行所需的改变，否则产生警告消息并延迟对设置的改变。