公开(公告)号：US20180261422A1

公开(公告)日：2018-09-13

申请号：US15914498

申请日：2018-03-07

Applicant: JEOL Ltd.

Inventor： Tatsuru Kuramoto ,  Yuichiro Ohori ,  Yoshinori Matsuda ,  Makoto Aoshima

IPC: H01J37/09 ,  H01J37/28 ,  H01J37/244 ,  H01J37/14 ,  H01J37/30

CPC classification number: H01J37/09 ,  H01J37/023 ,  H01J37/14 ,  H01J37/244 ,  H01J37/28 ,  H01J37/3005 ,  H01J37/3056 ,  H01J2237/024 ,  H01J2237/0262 ,  H01J2237/14 ,  H01J2237/24475 ,  H01J2237/2448 ,  H01J2237/2804 ,  H01J2237/2806

Abstract: A scanning electron microscope having a charged particle device that processes a specimen using a charged particle beam, the scanning electron microscope includes: an electron source; a secondary-electron detector that detects secondary electrons generated from the specimen; a backscattered-electron detector that is disposed closer to the electron source than a detection surface of the secondary-electron detector to detect backscattered electrons generated from the specimen; a shielding plate for shielding a detection surface of the backscattered-electron detector; and a moving mechanism that moves the shielding plate. In a state where the shielding plate is moved by the moving mechanism so as to shield the detection surface of the backscattered-electron detector, the shielding plate is located between the detection surface of the backscattered-electron detector and the detection surface of the secondary-electron detector.

公开(公告)号：US20250109481A1

公开(公告)日：2025-04-03

申请号：US18898792

申请日：2024-09-27

Applicant: JEOL Ltd.

Inventor： Noriaki Mizuno ,  Wataru Shigeyama ,  Makoto Aoshima

IPC: C23C14/22 ,  C23C14/54 ,  H01J37/305

Abstract: A focused ion beam (FIB) system capable of preventing a film from being deposited thickly on the surface of a sample The FIB system operates to mill the sample by irradiating it with an ion beam. The FIB system includes an FIB column through which the ion beam is directed at the sample; a nozzle having a blowoff port for blowing a gas against the sample to deposit the film; a sample stage providing mechanical support of the sample; a shield member for impeding the flow of the gas; and a shield support member. The shield member is movable to a shield position located between the blowoff port and the sample. The shield member is also movable to a retractive position not located therebetween. The shield member support mechanism supports the shield member so that it can move between the shield position and the retractive position of the shield member.

公开(公告)号：US10361062B2

公开(公告)日：2019-07-23

申请号：US15902251

申请日：2018-02-22

Applicant: JEOL Ltd.

Inventor： Tatsuru Kuramoto ,  Yuichiro Ohori ,  Yoshinori Matsuda ,  Makoto Aoshima

IPC: H01J37/28 ,  H01J37/244 ,  H01J37/10 ,  H01J37/147

Abstract: A scanning electron microscope includes: a liner tube which transmits an electron beam; a scintillator having a through-hole into which the liner tube is inserted; a light guide which guides light generated by the scintillator; a conductive layer provided on a sensitive surface of the scintillator; and a conductive member provided in the scintillator, wherein the shortest distance between the liner tube and the conductive member is shorter than the shortest distance between the liner tube and the conductive layer, a voltage for accelerating electrons is applied to the conductive layer, and the conductive layer and the conductive member have a same potential.

公开(公告)号：US10269531B2

公开(公告)日：2019-04-23

申请号：US15914498

申请日：2018-03-07

Applicant: JEOL Ltd.

Inventor： Tatsuru Kuramoto ,  Yuichiro Ohori ,  Yoshinori Matsuda ,  Makoto Aoshima

IPC: H01J37/09 ,  H01J37/02 ,  H01J37/244 ,  H01J37/28 ,  H01J37/305 ,  H01J37/14 ,  H01J37/30

Abstract: A scanning electron microscope having a charged particle device that processes a specimen using a charged particle beam, the scanning electron microscope includes: an electron source; a secondary-electron detector that detects secondary electrons generated from the specimen; a backscattered-electron detector that is disposed closer to the electron source than a detection surface of the secondary-electron detector to detect backscattered electrons generated from the specimen; a shielding plate for shielding a detection surface of the backscattered-electron detector; and a moving mechanism that moves the shielding plate. In a state where the shielding plate is moved by the moving mechanism so as to shield the detection surface of the backscattered-electron detector, the shielding plate is located between the detection surface of the backscattered-electron detector and the detection surface of the secondary-electron detector.

公开(公告)号：US20180240644A1

公开(公告)日：2018-08-23

申请号：US15902251

申请日：2018-02-22

Applicant: JEOL Ltd.

Inventor： Tatsuru Kuramoto ,  Yuichiro Ohori ,  Yoshinori Matsuda ,  Makoto Aoshima

IPC: H01J37/244 ,  H01J37/147 ,  H01J37/10

CPC classification number: H01J37/244 ,  H01J37/10 ,  H01J37/147 ,  H01J37/28 ,  H01J2237/2443

Abstract: A scanning electron microscope includes: a liner tube which transmits an electron beam; a scintillator having a through-hole into which the liner tube is inserted; a light guide which guides light generated by the scintillator; a conductive layer provided on a sensitive surface of the scintillator; and a conductive member provided in the scintillator, wherein the shortest distance between the liner tube and the conductive member is shorter than the shortest distance between the liner tube and the conductive layer, a voltage for accelerating electrons is applied to the conductive layer, and the conductive layer and the conductive member have a same potential.