公开(公告)号：US20250109481A1

公开(公告)日：2025-04-03

申请号：US18898792

申请日：2024-09-27

Applicant: JEOL Ltd.

Inventor： Noriaki Mizuno ,  Wataru Shigeyama ,  Makoto Aoshima

IPC: C23C14/22 ,  C23C14/54 ,  H01J37/305

Abstract: A focused ion beam (FIB) system capable of preventing a film from being deposited thickly on the surface of a sample The FIB system operates to mill the sample by irradiating it with an ion beam. The FIB system includes an FIB column through which the ion beam is directed at the sample; a nozzle having a blowoff port for blowing a gas against the sample to deposit the film; a sample stage providing mechanical support of the sample; a shield member for impeding the flow of the gas; and a shield support member. The shield member is movable to a shield position located between the blowoff port and the sample. The shield member is also movable to a retractive position not located therebetween. The shield member support mechanism supports the shield member so that it can move between the shield position and the retractive position of the shield member.