Multiple Silicide Integration Structure and Method
    53.
    发明申请
    Multiple Silicide Integration Structure and Method 有权
    多重硅化物一体化结构与方法

    公开(公告)号:US20150206871A1

    公开(公告)日:2015-07-23

    申请号:US14673388

    申请日:2015-03-30

    IPC分类号: H01L27/06 H01L29/45

    摘要: A structure and method for providing a multiple silicide integration is provided. An embodiment comprises forming a first transistor and a second transistor on a substrate. The first transistor is masked and a first silicide region is formed on the second transistor. The second transistor is then masked and a second silicide region is formed on the first transistor, thereby allowing for device specific silicide regions to be formed on the separate devices.

    摘要翻译: 提供了一种提供多重硅化物整合的结构和方法。 一个实施例包括在衬底上形成第一晶体管和第二晶体管。 第一晶体管被掩蔽,并且在第二晶体管上形成第一硅化物区。 然后对第二晶体管进行掩模,并且在第一晶体管上形成第二硅化物区域,从而允许在独立器件上形成器件特定的硅化物区域。