Apparatus & method for treating substrate
    10.
    发明申请
    Apparatus & method for treating substrate 审中-公开
    基材处理装置及方法

    公开(公告)号:US20150034702A1

    公开(公告)日:2015-02-05

    申请号:US13987511

    申请日:2013-08-01

    Applicant: Semigear Inc

    Inventor: Jian Zhang

    Abstract: Provided are a semiconductor substrate manufacturing apparatus and a substrate treating method, and more particularly, an apparatus and method for performing a reflow treating process on a semiconductor wafer. The apparatus treating apparatus includes a load port on which a carrier accommodating a substrate is seated, a substrate treating module including one process chamber or a plurality of process chambers having a treating space in which a reflow process with respect to the substrate is performed, a cleaning unit cleaning the substrate, and a substrate transfer module disposed between the load port and the substrate treating module. The substrate transfer module includes a transfer robot transferring the substrate among the load port, the substrate treating module, and the cleaning unit.

    Abstract translation: 提供一种半导体衬底制造装置和衬底处理方法,更具体地,涉及一种在半导体晶片上进行回流处理工艺的装置和方法。 该装置处理装置包括载置容纳基板的载体的载荷端口,具有一个处理室的基板处理模块或具有相对于基板进行回流处理的处理空间的多个处理室, 清洁单元清洁基板,以及设置在负载端口和基板处理模块之间的基板转移模块。 基板转印模块包括在载体端口,基板处理模块和清洁单元之间传送基板的传送机器人。

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