MECHANICAL WAFER ALIGNMENT DETECTION FOR BONDING PROCESS

    公开(公告)号:US20230282612A1

    公开(公告)日:2023-09-07

    申请号:US18313492

    申请日:2023-05-08

    Abstract: Various embodiments of the present disclosure are directed towards a method for forming a semiconductor structure. The method includes performing a bonding process to bond a first semiconductor substrate to a second semiconductor substrate. A shift measurement process is performed on the first and second semiconductor substrates. The shift measurement process includes moving a plurality of substrate pins from a plurality of initial positions to a plurality of measurement positions. The plurality of substrate pins are disposed outside of perimeters of the first and second semiconductor substrates. A shift value is determined between the first semiconductor substrate and the second semiconductor substrate based at least in part on a difference between the plurality of initial positions and the plurality of measurement positions.

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