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公开(公告)号:US09799590B2
公开(公告)日:2017-10-24
申请号:US13801675
申请日:2013-03-13
Applicant: STATS ChipPAC, Ltd.
Inventor: KyungHoon Lee , SangMi Park , KyoungIl Huh , DaeSik Choi
IPC: H01L21/00 , H01L21/44 , H01L23/498 , H01L21/56 , H01L23/36 , H01L25/065 , H01L25/00 , H01L23/00 , H01L23/31
CPC classification number: H01L23/49816 , H01L21/561 , H01L23/3128 , H01L23/36 , H01L23/49822 , H01L24/96 , H01L24/97 , H01L25/0657 , H01L25/50 , H01L2224/04105 , H01L2224/11 , H01L2224/12105 , H01L2224/16145 , H01L2224/16146 , H01L2224/32145 , H01L2224/32245 , H01L2224/48091 , H01L2224/73209 , H01L2224/73253 , H01L2224/73265 , H01L2224/73267 , H01L2224/81005 , H01L2224/94 , H01L2225/06513 , H01L2225/06517 , H01L2225/06541 , H01L2225/06548 , H01L2225/06582 , H01L2225/06589 , H01L2924/13091 , H01L2924/181 , H01L2924/18161 , H01L2924/18162 , H01L2924/00014 , H01L2924/00 , H01L2924/00012 , H01L2224/81
Abstract: A semiconductor device includes a semiconductor wafer including a plurality of first semiconductor die. An opening is formed partially through the semiconductor wafer. A plurality of second semiconductor die is disposed over a first surface of the semiconductor wafer. An encapsulant is disposed over the semiconductor wafer and into the opening leaving a second surface of the semiconductor wafer exposed. A portion of the second surface of the semiconductor wafer is removed to separate the first semiconductor die. An interconnect structure is formed over the second semiconductor die and encapsulant. A thermal interface material is deposited over the second surface of the first semiconductor die. A heat spreader is disposed over the thermal interface material. An insulating layer is formed over the first surface of the semiconductor wafer. A vertical interconnect structure is formed around the first semiconductor die. Conductive vias are formed through the first semiconductor die.
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公开(公告)号:US09780063B2
公开(公告)日:2017-10-03
申请号:US14328922
申请日:2014-07-11
Applicant: STATS ChipPAC, Ltd.
Inventor: JoonYoung Choi , YoungJoon Kim , SungWon Cho
IPC: H01L23/00
CPC classification number: H01L24/81 , H01L24/03 , H01L24/05 , H01L24/11 , H01L24/13 , H01L24/16 , H01L24/97 , H01L2224/02126 , H01L2224/0345 , H01L2224/03452 , H01L2224/0346 , H01L2224/03903 , H01L2224/0401 , H01L2224/05011 , H01L2224/05018 , H01L2224/05027 , H01L2224/05073 , H01L2224/0508 , H01L2224/05111 , H01L2224/05124 , H01L2224/05139 , H01L2224/05144 , H01L2224/05147 , H01L2224/05155 , H01L2224/05552 , H01L2224/05558 , H01L2224/05566 , H01L2224/05572 , H01L2224/05573 , H01L2224/05611 , H01L2224/05624 , H01L2224/05639 , H01L2224/05644 , H01L2224/05647 , H01L2224/05655 , H01L2224/10126 , H01L2224/1145 , H01L2224/1146 , H01L2224/1147 , H01L2224/11849 , H01L2224/13007 , H01L2224/13014 , H01L2224/13022 , H01L2224/13076 , H01L2224/136 , H01L2224/13611 , H01L2224/13613 , H01L2224/13616 , H01L2224/13624 , H01L2224/13639 , H01L2224/13644 , H01L2224/13647 , H01L2224/13655 , H01L2224/16238 , H01L2224/81191 , H01L2924/00011 , H01L2924/00013 , H01L2924/00014 , H01L2924/01029 , H01L2924/01322 , H01L2924/12041 , H01L2924/12042 , H01L2924/1306 , H01L2924/13091 , H01L2924/181 , H01L2924/3511 , H01L2924/014 , H01L2924/01082 , H01L2924/00012 , H01L2224/13099 , H01L2224/13599 , H01L2224/05599 , H01L2224/05099 , H01L2224/29099 , H01L2224/29599 , H01L2924/00 , H01L2224/81805
Abstract: A semiconductor wafer has a plurality of semiconductor die with contact pads for electrical interconnect. An insulating layer is formed over the semiconductor wafer. A bump structure is formed over the contact pads. The bump structure has a buffer layer formed over the insulating layer and contact pad. A portion of the buffer layer is removed to expose the contact pad and an outer portion of the insulating layer. A UBM layer is formed over the buffer layer and contact pad. The UBM layer follows a contour of the buffer layer and contact pad. A ring-shaped conductive pillar is formed over the UBM layer using a patterned photoresist layer filled with electrically conductive material. A conductive barrier layer is formed over the ring-shaped conductive pillar. A bump is formed over the conductive barrier layer. The buffer layer reduces thermal and mechanical stress on the bump and contact pad.
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83.
公开(公告)号:US09768155B2
公开(公告)日:2017-09-19
申请号:US14745203
申请日:2015-06-19
Applicant: STATS ChipPAC, Ltd.
Inventor: Yaojian Lin , Kang Chen , Seung Wook Yoon
IPC: H01L25/00 , H01L21/768 , H01L23/522 , H01L23/31 , H01L23/498 , H01L21/56 , H01L23/538 , H01L23/552 , H01L21/683 , H01L25/065 , H01L25/10 , H01L23/00
CPC classification number: H01L25/50 , H01L21/56 , H01L21/561 , H01L21/568 , H01L21/6835 , H01L21/6836 , H01L21/76802 , H01L21/76877 , H01L23/3157 , H01L23/49816 , H01L23/49827 , H01L23/5226 , H01L23/5389 , H01L23/552 , H01L24/11 , H01L24/13 , H01L24/16 , H01L24/81 , H01L24/82 , H01L24/96 , H01L24/97 , H01L25/0655 , H01L25/0657 , H01L25/105 , H01L2221/68327 , H01L2221/68345 , H01L2221/68381 , H01L2223/54426 , H01L2224/03 , H01L2224/03002 , H01L2224/03003 , H01L2224/0346 , H01L2224/0401 , H01L2224/04105 , H01L2224/05552 , H01L2224/0557 , H01L2224/05571 , H01L2224/05611 , H01L2224/05624 , H01L2224/05639 , H01L2224/05644 , H01L2224/05647 , H01L2224/05655 , H01L2224/0613 , H01L2224/11 , H01L2224/1132 , H01L2224/11334 , H01L2224/1146 , H01L2224/12105 , H01L2224/13014 , H01L2224/13021 , H01L2224/13025 , H01L2224/131 , H01L2224/13111 , H01L2224/13113 , H01L2224/13116 , H01L2224/13124 , H01L2224/13139 , H01L2224/13144 , H01L2224/13147 , H01L2224/13155 , H01L2224/14104 , H01L2224/16145 , H01L2224/16225 , H01L2224/16237 , H01L2224/16238 , H01L2224/24137 , H01L2224/48091 , H01L2224/73253 , H01L2224/73259 , H01L2224/73265 , H01L2224/73267 , H01L2224/76155 , H01L2224/81 , H01L2224/81191 , H01L2224/81193 , H01L2224/81447 , H01L2224/81805 , H01L2224/82005 , H01L2224/92 , H01L2224/94 , H01L2224/96 , H01L2224/97 , H01L2225/06513 , H01L2225/06517 , H01L2225/06541 , H01L2225/06548 , H01L2225/1035 , H01L2225/1058 , H01L2924/00011 , H01L2924/00014 , H01L2924/01004 , H01L2924/01006 , H01L2924/01013 , H01L2924/01023 , H01L2924/01024 , H01L2924/01029 , H01L2924/01033 , H01L2924/01046 , H01L2924/01047 , H01L2924/01049 , H01L2924/01072 , H01L2924/01073 , H01L2924/01074 , H01L2924/01078 , H01L2924/01079 , H01L2924/01082 , H01L2924/01322 , H01L2924/014 , H01L2924/09701 , H01L2924/12041 , H01L2924/12042 , H01L2924/12043 , H01L2924/1306 , H01L2924/13091 , H01L2924/14 , H01L2924/1433 , H01L2924/15311 , H01L2924/1532 , H01L2924/15331 , H01L2924/181 , H01L2924/1815 , H01L2924/18161 , H01L2924/18162 , H01L2924/19041 , H01L2924/19042 , H01L2924/19043 , H01L2924/30105 , H01L2924/3025 , H01L2924/3511 , H01L2224/82 , H01L2924/00 , H01L2924/00012
Abstract: A semiconductor device has an encapsulant deposited over a first surface of the semiconductor die and around the semiconductor die. A first insulating layer is formed over a second surface of the semiconductor die opposite the first surface. A conductive layer is formed over the first insulating layer. An interconnect structure is formed through the encapsulant outside a footprint of the semiconductor die and electrically connected to the conductive layer. The first insulating layer includes an optically transparent or translucent material. The semiconductor die includes a sensor configured to receive an external stimulus passing through the first insulating layer. A second insulating layer is formed over the first surface of the semiconductor die. A conductive via is formed through the first insulating layer outside a footprint of the semiconductor die. A plurality of stacked semiconductor devices is electrically connected through the interconnect structure.
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公开(公告)号:US09768038B2
公开(公告)日:2017-09-19
申请号:US14139312
申请日:2013-12-23
Applicant: STATS ChipPAC, Ltd.
Inventor: Yaojian Lin
CPC classification number: H01L21/568 , H01L21/561 , H01L23/3114 , H01L23/3135 , H01L24/19 , H01L24/96 , H01L24/97 , H01L2224/04105 , H01L2224/11 , H01L2224/12105 , H01L2924/12041 , H01L2924/12042 , H01L2924/13091 , H01L2924/181 , H01L2924/1815 , H01L2924/18162 , H01L2924/3511 , H01L2924/00
Abstract: A semiconductor device includes a carrier and a plurality of semiconductor die disposed over the carrier. An encapsulant is deposited over the semiconductor die. A composite layer is formed over the encapsulant to form a panel. The carrier is removed. A conductive layer is formed over the panel. An insulating layer is formed over the conductive layer. The carrier includes a glass layer, a second composite layer formed over the glass layer, and an interface layer formed over the glass layer. The composite layer and encapsulant are selected to tune a coefficient of thermal expansion of the panel. The panel includes panel blocks comprising an opening separating the panel blocks. The encapsulant or insulating material is deposited in the opening. A plurality of support members are disposed around the panel blocks. An interconnect structure is formed over the conductive layer.
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公开(公告)号:US09754867B2
公开(公告)日:2017-09-05
申请号:US15367423
申请日:2016-12-02
Applicant: STATS ChipPAC Pte. Ltd.
Inventor: Yaojian Lin , Kang Chen , Jianmin Fang , Xia Feng
IPC: H01L23/498 , H01L21/768 , H01L23/31 , H01L21/56 , H01L23/538 , H01L23/00
CPC classification number: H01L23/49816 , H01L21/56 , H01L21/563 , H01L21/568 , H01L21/76802 , H01L21/76879 , H01L23/3114 , H01L23/3192 , H01L23/49822 , H01L23/5389 , H01L24/06 , H01L24/11 , H01L24/14 , H01L24/19 , H01L24/82 , H01L24/96 , H01L2223/5448 , H01L2224/0401 , H01L2224/04105 , H01L2224/12105 , H01L2224/48091 , H01L2224/73265 , H01L2224/94 , H01L2924/01004 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01029 , H01L2924/01032 , H01L2924/01033 , H01L2924/01047 , H01L2924/01049 , H01L2924/01073 , H01L2924/01075 , H01L2924/01078 , H01L2924/01079 , H01L2924/01082 , H01L2924/01322 , H01L2924/014 , H01L2924/09701 , H01L2924/10329 , H01L2924/12041 , H01L2924/12042 , H01L2924/1306 , H01L2924/13091 , H01L2924/15311 , H01L2924/181 , H01L2924/1815 , H01L2924/18162 , H01L2924/3511 , H01L2924/37001 , H01L2924/00014 , H01L2924/00 , H01L2224/03
Abstract: A semiconductor device comprises a semiconductor die including a conductive layer. A first insulating layer is formed over the semiconductor die and conductive layer. An encapsulant is disposed over the semiconductor die. A compliant island is formed over the first insulating layer. An interconnect structure is formed over the compliant island. An under bump metallization (UBM) is formed over the compliant island. The compliant island includes a diameter greater than 5 μm larger than a diameter of the UBM. An opening is formed in the compliant island over the conductive layer. A second insulating layer is formed over the first insulating layer and compliant island. A third insulating layer is formed over an interface between the semiconductor die and the encapsulant. An opening is formed in the third insulating layer over the encapsulant for stress relief.
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86.
公开(公告)号:US09704857B2
公开(公告)日:2017-07-11
申请号:US13678134
申请日:2012-11-15
Applicant: STATS ChipPAC, Ltd.
Inventor: HyunTai Kim , YongTaek Lee , Gwang Kim , ByungHoon Ahn , Kai Liu
IPC: H01G9/00 , H01L21/00 , H01L27/06 , H01L21/56 , H01L23/31 , H01L23/64 , H01L23/66 , H01L27/01 , H01L49/02 , H01L27/08 , H01L23/00
CPC classification number: H01L27/0676 , H01L21/56 , H01L21/563 , H01L23/3121 , H01L23/3128 , H01L23/642 , H01L23/645 , H01L23/66 , H01L24/16 , H01L24/48 , H01L24/73 , H01L27/016 , H01L27/0805 , H01L28/10 , H01L28/40 , H01L2223/6677 , H01L2224/16145 , H01L2224/16225 , H01L2224/32145 , H01L2224/48145 , H01L2224/48227 , H01L2224/48228 , H01L2224/73204 , H01L2224/73257 , H01L2224/73265 , H01L2225/06506 , H01L2225/0651 , H01L2225/06513 , H01L2225/06517 , H01L2924/00014 , H01L2924/01078 , H01L2924/01079 , H01L2924/01322 , H01L2924/09701 , H01L2924/10252 , H01L2924/10253 , H01L2924/10329 , H01L2924/12041 , H01L2924/12042 , H01L2924/1306 , H01L2924/13091 , H01L2924/14 , H01L2924/1433 , H01L2924/15174 , H01L2924/15192 , H01L2924/15311 , H01L2924/181 , H01L2924/19011 , H01L2924/19041 , H01L2924/19042 , H01L2924/19043 , H01L2924/19105 , H01L2924/30105 , H01L2924/30107 , H01L2924/3011 , H01L2924/00012 , H01L2924/00 , H01L2224/45099 , H01L2224/45015 , H01L2924/207
Abstract: A semiconductor device has a substrate and RF FEM formed over the substrate. The RF FEM includes an LC low-pass filter having an input coupled for receiving a transmit signal. A Tx/Rx switch has a first terminal coupled to an output of the LC filter. A diplexer has a first terminal coupled to a second terminal of the Tx/Rx switch and a second terminal for providing an RF signal. An IPD band-pass filter has an input coupled to a third terminal of the Tx/Rx switch and an output providing a receive signal. The LC filter includes conductive traces wound to exhibit inductive and mutual inductive properties and capacitors coupled to the conductive traces. The IPD filter includes conductive traces wound to exhibit inductive and mutual inductive properties and capacitors coupled to the conductive traces. The RF FEM substrate can be stacked over a semiconductor package containing an RF transceiver.
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公开(公告)号:US09679846B2
公开(公告)日:2017-06-13
申请号:US14572298
申请日:2014-12-16
Applicant: STATS ChipPAC, Ltd.
Inventor: JaeHyun Lee , SunJae Kim , JoongGi Kim
IPC: H01L23/48 , H01L23/528 , H01L23/498 , H01L21/48 , H01L23/31 , H01L21/768 , H01L23/522 , H01L23/525 , H01L21/56 , H01L23/00
CPC classification number: H01L23/528 , H01L21/4867 , H01L21/563 , H01L21/565 , H01L21/768 , H01L23/3121 , H01L23/3128 , H01L23/49838 , H01L23/49894 , H01L23/5221 , H01L23/5252 , H01L23/5256 , H01L24/13 , H01L24/16 , H01L24/81 , H01L2224/10175 , H01L2224/16237 , H01L2224/81191 , H01L2224/81385 , H01L2224/81411 , H01L2224/81424 , H01L2224/81439 , H01L2224/81444 , H01L2224/81447 , H01L2224/81455 , H01L2224/81815 , H01L2224/94 , H01L2924/01322 , H01L2924/12041 , H01L2924/12042 , H01L2924/1306 , H01L2924/13091 , H01L2924/181 , H01L2224/11 , H01L2924/00014 , H01L2924/00
Abstract: A semiconductor device has a semiconductor die with a plurality of bumps formed over a surface of the semiconductor die. A first conductive layer having first and second segments is formed over a surface of the substrate with a first vent separating an end of the first segment and the second segment and a second vent separating an end of the second segment and the first segment. A second conductive layer is formed over the surface of the substrate to electrically connect the first segment and second segment. The thickness of the second conductive layer can be less than a thickness of the first conductive layer to form the first vent and second vent. The semiconductor die is mounted to the substrate with the bumps aligned to the first segment and second segment. Bump material from reflow of the bumps is channeled into the first vent and second vent.
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公开(公告)号:US09679769B1
公开(公告)日:2017-06-13
申请号:US15199751
申请日:2016-06-30
Applicant: STATS ChipPAC Pte. Ltd.
Inventor: Zigmund Ramirez Camacho , Bartholomew Liao Chung Foh , Sheila Marie L. Alvarez , Dao Nguyen Phu Cuong , HeeJo Chi
IPC: H01L21/48 , H01L21/56 , H01L23/00 , H01L23/12 , H01L23/485 , H01L21/033 , H01L23/522 , H01L21/768 , H01L23/528 , H01L23/532
CPC classification number: H01L21/0335 , H01L21/485 , H01L21/4857 , H01L21/486 , H01L21/56 , H01L21/568 , H01L21/76879 , H01L23/3128 , H01L23/49816 , H01L23/49822 , H01L23/49838 , H01L23/49894 , H01L23/5226 , H01L23/528 , H01L23/53233 , H01L23/53242 , H01L24/03 , H01L24/08 , H01L24/11 , H01L24/13 , H01L24/16 , H01L24/29 , H01L24/32 , H01L24/43 , H01L24/45 , H01L24/48 , H01L24/73 , H01L24/81 , H01L24/83 , H01L24/85 , H01L2224/0401 , H01L2224/04042 , H01L2224/05026 , H01L2224/131 , H01L2224/16237 , H01L2224/2919 , H01L2224/32225 , H01L2224/48091 , H01L2224/48227 , H01L2224/48228 , H01L2224/73204 , H01L2224/73265 , H01L2224/81447 , H01L2224/81815 , H01L2224/83005 , H01L2224/85005 , H01L2224/85447 , H01L2924/00014 , H01L2924/14 , H01L2924/1461 , H01L2924/15311 , H01L2924/181 , H01L2924/3511 , H01L2924/37001 , H01L2924/00012 , H01L2924/014 , H01L2224/45099 , H01L2224/45015 , H01L2924/207 , H01L2924/00
Abstract: A system and method of manufacture of an integrated circuit packaging system includes: a photoimagable dielectric layer having a trace opening for exposing the carrier; a trace within the trace opening; an inner solder resist layer directly on the photoimagable dielectric layer and the trace, the inner solder resist layer having a bond pad opening for exposing the trace; an integrated circuit over the inner solder resist layer, the integrated circuit electrically connected to the trace through the bond pad opening; an encapsulation directly on the integrated circuit and the inner solder resist layer; and an external interconnect electrically coupled to the trace and the integrated circuit.
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89.
公开(公告)号:US20170098612A1
公开(公告)日:2017-04-06
申请号:US15381281
申请日:2016-12-16
Applicant: STATS ChipPAC Pte. Ltd.
Inventor: Yaojian Lin , Kang Chen , Jianmin Fang , Xia Feng
IPC: H01L23/538 , H01L21/768 , H01L23/31 , H01L21/56
CPC classification number: H01L23/5389 , H01L21/31051 , H01L21/56 , H01L21/568 , H01L21/768 , H01L21/76802 , H01L21/78 , H01L23/3107 , H01L23/49816 , H01L24/19 , H01L2224/04105 , H01L2224/12105 , H01L2224/20 , H01L2224/94 , H01L2924/01004 , H01L2924/01006 , H01L2924/01013 , H01L2924/01019 , H01L2924/01029 , H01L2924/01047 , H01L2924/01049 , H01L2924/01073 , H01L2924/01078 , H01L2924/01079 , H01L2924/01082 , H01L2924/01322 , H01L2924/014 , H01L2924/12041 , H01L2924/12042 , H01L2924/1306 , H01L2924/13091 , H01L2924/14 , H01L2924/15311 , H01L2924/181 , H01L2924/18162 , H01L2924/00 , H01L2224/03
Abstract: A semiconductor wafer contains a plurality of semiconductor die separated by a saw street. An insulating layer is formed over the semiconductor wafer. A protective layer is formed over the insulating layer including an edge of the semiconductor die along the saw street. The protective layer covers an entire surface of the semiconductor wafer. Alternatively, an opening is formed in the protective layer over the saw street. The insulating layer has a non-planar surface and the protective layer has a planar surface. The semiconductor wafer is singulated through the protective layer and saw street to separate the semiconductor die while protecting the edge of the semiconductor die. Leading with the protective layer, the semiconductor die is mounted to a carrier. An encapsulant is deposited over the semiconductor die and carrier. The carrier and protective layer are removed. A build-up interconnect structure is formed over the semiconductor die and encapsulant.
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公开(公告)号:US20170098610A1
公开(公告)日:2017-04-06
申请号:US15380788
申请日:2016-12-15
Applicant: STATS ChipPAC Pte. Ltd.
Inventor: Il Kwon Shim , Jun Mo Koo , Pandi C. Marimuthu , Yaojian Lin , See Chian Lim
IPC: H01L23/538 , H01L23/00 , H01L23/31
CPC classification number: H01L23/5384 , H01L21/486 , H01L21/568 , H01L23/3128 , H01L23/3171 , H01L23/3192 , H01L23/481 , H01L23/49816 , H01L23/5386 , H01L23/5389 , H01L24/11 , H01L24/13 , H01L24/19 , H01L24/20 , H01L24/32 , H01L24/48 , H01L24/73 , H01L24/96 , H01L24/97 , H01L25/105 , H01L25/50 , H01L2224/0401 , H01L2224/04042 , H01L2224/04105 , H01L2224/1132 , H01L2224/11334 , H01L2224/1145 , H01L2224/11462 , H01L2224/11464 , H01L2224/11849 , H01L2224/11901 , H01L2224/12105 , H01L2224/13111 , H01L2224/13113 , H01L2224/13116 , H01L2224/13124 , H01L2224/13139 , H01L2224/13144 , H01L2224/13147 , H01L2224/13155 , H01L2224/32145 , H01L2224/32225 , H01L2224/48091 , H01L2224/48106 , H01L2224/48227 , H01L2224/73265 , H01L2224/73267 , H01L2224/9222 , H01L2224/94 , H01L2224/97 , H01L2225/0651 , H01L2225/0652 , H01L2225/06568 , H01L2225/06572 , H01L2225/1035 , H01L2225/1052 , H01L2225/1058 , H01L2924/00014 , H01L2924/01322 , H01L2924/12041 , H01L2924/12042 , H01L2924/1306 , H01L2924/13091 , H01L2924/15311 , H01L2924/181 , H01L2924/18162 , H01L2924/00012 , H01L2924/00 , H01L2924/01082 , H01L2224/03 , H01L2224/45099 , H01L2224/45015 , H01L2924/207
Abstract: A semiconductor device has a substrate including a base and a plurality of conductive posts extending from the base. The substrate can be a wafer-shape, panel, or singulated form. The conductive posts can have a circular, rectangular, tapered, or narrowing intermediate shape. A semiconductor die is disposed through an opening in the base between the conductive posts. The semiconductor die extends above the conductive posts or is disposed below the conductive posts. An encapsulant is deposited over the semiconductor die and around the conductive posts. The base and a portion of the encapsulant is removed to electrically isolate the conductive posts. An interconnect structure is formed over the semiconductor die, encapsulant, and conductive posts. An insulating layer is formed over the semiconductor die, encapsulant, and conductive posts. A semiconductor package is disposed over the semiconductor die and electrically connected to the conductive posts.
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