公开(公告)号：US09780063B2

公开(公告)日：2017-10-03

申请号：US14328922

申请日：2014-07-11

Applicant: STATS ChipPAC, Ltd.

Inventor： JoonYoung Choi ,  YoungJoon Kim ,  SungWon Cho

IPC: H01L23/00

CPC classification number: H01L24/81 ,  H01L24/03 ,  H01L24/05 ,  H01L24/11 ,  H01L24/13 ,  H01L24/16 ,  H01L24/97 ,  H01L2224/02126 ,  H01L2224/0345 ,  H01L2224/03452 ,  H01L2224/0346 ,  H01L2224/03903 ,  H01L2224/0401 ,  H01L2224/05011 ,  H01L2224/05018 ,  H01L2224/05027 ,  H01L2224/05073 ,  H01L2224/0508 ,  H01L2224/05111 ,  H01L2224/05124 ,  H01L2224/05139 ,  H01L2224/05144 ,  H01L2224/05147 ,  H01L2224/05155 ,  H01L2224/05552 ,  H01L2224/05558 ,  H01L2224/05566 ,  H01L2224/05572 ,  H01L2224/05573 ,  H01L2224/05611 ,  H01L2224/05624 ,  H01L2224/05639 ,  H01L2224/05644 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/10126 ,  H01L2224/1145 ,  H01L2224/1146 ,  H01L2224/1147 ,  H01L2224/11849 ,  H01L2224/13007 ,  H01L2224/13014 ,  H01L2224/13022 ,  H01L2224/13076 ,  H01L2224/136 ,  H01L2224/13611 ,  H01L2224/13613 ,  H01L2224/13616 ,  H01L2224/13624 ,  H01L2224/13639 ,  H01L2224/13644 ,  H01L2224/13647 ,  H01L2224/13655 ,  H01L2224/16238 ,  H01L2224/81191 ,  H01L2924/00011 ,  H01L2924/00013 ,  H01L2924/00014 ,  H01L2924/01029 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/181 ,  H01L2924/3511 ,  H01L2924/014 ,  H01L2924/01082 ,  H01L2924/00012 ,  H01L2224/13099 ,  H01L2224/13599 ,  H01L2224/05599 ,  H01L2224/05099 ,  H01L2224/29099 ,  H01L2224/29599 ,  H01L2924/00 ,  H01L2224/81805

Abstract: A semiconductor wafer has a plurality of semiconductor die with contact pads for electrical interconnect. An insulating layer is formed over the semiconductor wafer. A bump structure is formed over the contact pads. The bump structure has a buffer layer formed over the insulating layer and contact pad. A portion of the buffer layer is removed to expose the contact pad and an outer portion of the insulating layer. A UBM layer is formed over the buffer layer and contact pad. The UBM layer follows a contour of the buffer layer and contact pad. A ring-shaped conductive pillar is formed over the UBM layer using a patterned photoresist layer filled with electrically conductive material. A conductive barrier layer is formed over the ring-shaped conductive pillar. A bump is formed over the conductive barrier layer. The buffer layer reduces thermal and mechanical stress on the bump and contact pad.

公开(公告)号：US09318380B2

公开(公告)日：2016-04-19

申请号：US14330704

申请日：2014-07-14

Applicant: STATS ChipPAC, Ltd.

Inventor： YoungJoon Kim ,  SangMi Park ,  YongHyuk Jeong

IPC: H01L21/44 ,  H01L21/768 ,  H01L23/538 ,  H01L21/56 ,  H01L23/00 ,  H01L25/065 ,  H01L25/00 ,  H01L21/683 ,  H01L23/498 ,  H01L23/31 ,  H01L25/03 ,  H01L25/10

CPC classification number: H01L21/76877 ,  H01L21/561 ,  H01L21/565 ,  H01L21/6835 ,  H01L23/3128 ,  H01L23/3135 ,  H01L23/49816 ,  H01L23/49827 ,  H01L23/5389 ,  H01L24/19 ,  H01L24/80 ,  H01L24/96 ,  H01L24/97 ,  H01L25/03 ,  H01L25/0657 ,  H01L25/105 ,  H01L25/50 ,  H01L2221/68345 ,  H01L2221/68363 ,  H01L2221/68381 ,  H01L2224/0401 ,  H01L2224/04105 ,  H01L2224/16225 ,  H01L2224/19 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/48091 ,  H01L2224/48227 ,  H01L2224/73215 ,  H01L2224/73253 ,  H01L2224/73265 ,  H01L2224/73267 ,  H01L2224/81005 ,  H01L2224/83005 ,  H01L2224/94 ,  H01L2224/97 ,  H01L2225/06524 ,  H01L2225/06548 ,  H01L2225/06572 ,  H01L2924/01029 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/18161 ,  H01L2924/19107 ,  H01L2224/81 ,  H01L2224/85 ,  H01L2924/00 ,  H01L2924/00014 ,  H01L2924/00012 ,  H01L2224/11 ,  H01L2224/03

Abstract: A semiconductor device has a first conductive layer formed over a first substrate. A second conductive layer is formed over a second substrate. A first semiconductor die is mounted to the first substrate and electrically connected to the first conductive layer. A second semiconductor die is mounted to the second substrate and electrically connected to the second conductive layer. The first semiconductor die is mounted over the second semiconductor die. An encapsulant is deposited over the first and second semiconductor die and the first and second substrates. A conductive interconnect structure is formed through the encapsulant to electrically connect the first and second semiconductor die to the second surface of the semiconductor device. Forming the conductive interconnect structure includes forming a plurality of conductive vias through the encapsulant and the first substrate outside a footprint of the first and second semiconductor die.

Abstract translation: 半导体器件具有形成在第一衬底上的第一导电层。 在第二衬底上形成第二导电层。 第一半导体管芯安装到第一基板并电连接到第一导电层。 第二半导体管芯安装到第二衬底并电连接到第二导电层。 第一半导体管芯安装在第二半导体管芯上。 密封剂沉积在第一和第二半导体管芯以及第一和第二衬底上。 通过密封剂形成导电互连结构，以将第一和第二半导体管芯电连接到半导体器件的第二表面。 形成导电互连结构包括在第一和第二半导体管芯的覆盖区之外形成通过密封剂和第一衬底的多个导电通孔。

公开(公告)号：US20140322865A1

公开(公告)日：2014-10-30

申请号：US14330704

申请日：2014-07-14

Applicant: STATS ChipPAC, Ltd.

Inventor： YoungJoon Kim ,  SangMi Park ,  YongHyuk Jeong

IPC: H01L21/768 ,  H01L23/00

CPC classification number: H01L21/76877 ,  H01L21/561 ,  H01L21/565 ,  H01L21/6835 ,  H01L23/3128 ,  H01L23/3135 ,  H01L23/49816 ,  H01L23/49827 ,  H01L23/5389 ,  H01L24/19 ,  H01L24/80 ,  H01L24/96 ,  H01L24/97 ,  H01L25/03 ,  H01L25/0657 ,  H01L25/105 ,  H01L25/50 ,  H01L2221/68345 ,  H01L2221/68363 ,  H01L2221/68381 ,  H01L2224/0401 ,  H01L2224/04105 ,  H01L2224/16225 ,  H01L2224/19 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/48091 ,  H01L2224/48227 ,  H01L2224/73215 ,  H01L2224/73253 ,  H01L2224/73265 ,  H01L2224/73267 ,  H01L2224/81005 ,  H01L2224/83005 ,  H01L2224/94 ,  H01L2224/97 ,  H01L2225/06524 ,  H01L2225/06548 ,  H01L2225/06572 ,  H01L2924/01029 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/18161 ,  H01L2924/19107 ,  H01L2224/81 ,  H01L2224/85 ,  H01L2924/00 ,  H01L2924/00014 ,  H01L2924/00012 ,  H01L2224/11 ,  H01L2224/03

Abstract: A semiconductor device has a first conductive layer formed over a first substrate. A second conductive layer is formed over a second substrate. A first semiconductor die is mounted to the first substrate and electrically connected to the first conductive layer. A second semiconductor die is mounted to the second substrate and electrically connected to the second conductive layer. The first semiconductor die is mounted over the second semiconductor die. An encapsulant is deposited over the first and second semiconductor die and the first and second substrates. A conductive interconnect structure is formed through the encapsulant to electrically connect the first and second semiconductor die to the second surface of the semiconductor device. Forming the conductive interconnect structure includes forming a plurality of conductive vias through the encapsulant and the first substrate outside a footprint of the first and second semiconductor die.

Abstract translation: 半导体器件具有形成在第一衬底上的第一导电层。 在第二衬底上形成第二导电层。 第一半导体管芯安装到第一基板并电连接到第一导电层。 第二半导体管芯安装到第二衬底并电连接到第二导电层。 第一半导体管芯安装在第二半导体管芯上。 密封剂沉积在第一和第二半导体管芯以及第一和第二衬底上。 通过密封剂形成导电互连结构，以将第一和第二半导体管芯电连接到半导体器件的第二表面。 形成导电互连结构包括在第一和第二半导体管芯的覆盖区之外形成通过密封剂和第一衬底的多个导电通孔。

公开(公告)号：US20140319680A1

公开(公告)日：2014-10-30

申请号：US14328922

申请日：2014-07-11

Applicant: STATS ChipPAC, Ltd.

Inventor： JoonYoung Choi ,  YoungJoon Kim ,  SungWon Cho

IPC: H01L23/00

CPC classification number: H01L24/81 ,  H01L24/03 ,  H01L24/05 ,  H01L24/11 ,  H01L24/13 ,  H01L24/16 ,  H01L24/97 ,  H01L2224/02126 ,  H01L2224/0345 ,  H01L2224/03452 ,  H01L2224/0346 ,  H01L2224/03903 ,  H01L2224/0401 ,  H01L2224/05011 ,  H01L2224/05018 ,  H01L2224/05027 ,  H01L2224/05073 ,  H01L2224/0508 ,  H01L2224/05111 ,  H01L2224/05124 ,  H01L2224/05139 ,  H01L2224/05144 ,  H01L2224/05147 ,  H01L2224/05155 ,  H01L2224/05552 ,  H01L2224/05558 ,  H01L2224/05566 ,  H01L2224/05572 ,  H01L2224/05573 ,  H01L2224/05611 ,  H01L2224/05624 ,  H01L2224/05639 ,  H01L2224/05644 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/10126 ,  H01L2224/1145 ,  H01L2224/1146 ,  H01L2224/1147 ,  H01L2224/11849 ,  H01L2224/13007 ,  H01L2224/13014 ,  H01L2224/13022 ,  H01L2224/13076 ,  H01L2224/136 ,  H01L2224/13611 ,  H01L2224/13613 ,  H01L2224/13616 ,  H01L2224/13624 ,  H01L2224/13639 ,  H01L2224/13644 ,  H01L2224/13647 ,  H01L2224/13655 ,  H01L2224/16238 ,  H01L2224/81191 ,  H01L2924/00011 ,  H01L2924/00013 ,  H01L2924/00014 ,  H01L2924/01029 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/181 ,  H01L2924/3511 ,  H01L2924/014 ,  H01L2924/01082 ,  H01L2924/00012 ,  H01L2224/13099 ,  H01L2224/13599 ,  H01L2224/05599 ,  H01L2224/05099 ,  H01L2224/29099 ,  H01L2224/29599 ,  H01L2924/00 ,  H01L2224/81805

Abstract: A semiconductor wafer has a plurality of semiconductor die with contact pads for electrical interconnect. An insulating layer is formed over the semiconductor wafer. A bump structure is formed over the contact pads. The bump structure has a buffer layer formed over the insulating layer and contact pad. A portion of the buffer layer is removed to expose the contact pad and an outer portion of the insulating layer. A UBM layer is formed over the buffer layer and contact pad. The UBM layer follows a contour of the buffer layer and contact pad. A ring-shaped conductive pillar is formed over the UBM layer using a patterned photoresist layer filled with electrically conductive material. A conductive barrier layer is formed over the ring-shaped conductive pillar. A bump is formed over the conductive barrier layer. The buffer layer reduces thermal and mechanical stress on the bump and contact pad.

Abstract translation: 半导体晶片具有多个具有用于电互连的接触焊盘的半导体管芯。 在半导体晶片上形成绝缘层。 在接触焊盘上形成凸块结构。 凸块结构具有形成在绝缘层和接触垫上的缓冲层。 去除缓冲层的一部分以暴露接触焊盘和绝缘层的外部部分。 在缓冲层和接触垫上形成UBM层。 UBM层遵循缓冲层和接触垫的轮廓。 使用填充有导电材料的图案化光致抗蚀剂层在UBM层之上形成环形导电柱。 导电阻挡层形成在环形导电柱上。 在导电阻挡层上形成凸块。 缓冲层减少凸块和接触垫上的热应力和机械应力。