公开(公告)号：US12091430B2

公开(公告)日：2024-09-17

申请号：US17636092

申请日：2020-09-01

Applicant: SHIKOKU CHEMICALS CORPORATION

Inventor： Noriaki Yamaji ,  Tatsuya Koga ,  Hirohiko Hirao

IPC: C09D183/08 ,  C07F7/18 ,  C23C22/52 ,  H05K3/38

CPC classification number: C07F7/1804 ,  C23C22/52 ,  H05K3/382 ,  C09D183/08

Abstract: The present invention provides a surface treatment liquid for metal having a sufficiently high film-forming property. The present invention relates to a surface treatment liquid for metal comprising an azole silane coupling agent, the surface treatment liquid further comprises (A) an organic acid ion having one to three acidic groups in one molecule; (B) an inorganic acid (or mineral acid) ion; (C) an alkali metal ion and/or an ammonium ion; and (D) a copper ion.

公开(公告)号：US20240287025A1

公开(公告)日：2024-08-29

申请号：US18563306

申请日：2022-05-24

Applicant: Centre National de la Recherche Scientifique ,  Commissariat à l'Energie Atomique et aux Energies Alternatives ,  Centre Hospitalier Universitaire de Grenoble Alpes ,  Institut National de la Santé et de la Recherche Médicale ,  UNIVERSITE GRENOBLE ALPES

Inventor： Zuzana MACEK JILKOVA ,  Jérôme GOVIN ,  Anouk EMADALI ,  Carlo PETOSA ,  Yung-Sing WONG

IPC: C07D401/12 ,  A61K31/4706 ,  A61K31/4709 ,  A61K31/506 ,  A61K31/695 ,  A61P29/00 ,  C07D215/42 ,  C07D215/48 ,  C07D401/04 ,  C07D401/14 ,  C07F7/18 ,  C07F11/00

CPC classification number: C07D401/12 ,  A61K31/4706 ,  A61K31/4709 ,  A61K31/506 ,  A61K31/695 ,  A61P29/00 ,  C07D215/42 ,  C07D215/48 ,  C07D401/04 ,  C07D401/14 ,  C07F7/1804 ,  C07F11/00

Abstract: The present invention relates to new tetrahydroquinoline (THQ) compounds and new methods for synthetizing such compounds.
The present invention relates to the applications thereof, in particular in therapeutic treatment.
The present invention relates in particular to compound having the following structure:




wherein R, R′, RA, Nu, R1, R2, R3, and R4 are each independently an atom or a chemical group of atoms.

公开(公告)号：US20240270763A1

公开(公告)日：2024-08-15

申请号：US18411521

申请日：2024-01-12

Applicant: MEC COMPANY LTD.

Inventor： Koki MORIKAWA ,  Yuki Ogino ,  Jun Nishimine

IPC: C07F7/18 ,  B32B5/02 ,  B32B7/12 ,  B32B15/14 ,  B32B15/20 ,  C07D251/54 ,  C08J5/12

CPC classification number: C07F7/1804 ,  B32B5/02 ,  B32B7/12 ,  B32B15/14 ,  B32B15/20 ,  C07D251/54 ,  C08J5/12 ,  B32B2260/021 ,  B32B2260/046 ,  B32B2262/101 ,  C08J2363/00

Abstract: Provided is a chemical compound represented by the general formula (A), in which each of substituents Q1 to Q6 is bonded to a nitrogen atom of melamine backbone. In the general formula (A), at least one of Q1 to Q6 is X, and at least one of Q1 to Q6 is Y. R1 is a hydrogen atom or an alkyl group having 1 to 12 carbon atoms. R2 is a hydrogen atom, or a monovalent hydrocarbon group selected from the group consisting of an alkyl group having 1 to 12 carbon atoms, an aryl group having 6 to 25 carbon atoms, and an aralkyl group having 7 to 30 carbon atoms. Each of R51 and R52 is a divalent organic group, and a is an integer of 1 to 3.

公开(公告)号：US20240255849A1

公开(公告)日：2024-08-01

申请号：US18463646

申请日：2023-09-08

Applicant: Inha University Research and Business Foundation

Inventor： Jinkyun LEE ,  Gayoung KIM ,  Yejin KU

IPC: G03F7/004 ,  C07C41/09 ,  C07F7/18 ,  H01L21/027

CPC classification number: G03F7/0045 ,  C07C41/09 ,  C07F7/1804 ,  C07F7/1888 ,  H01L21/0274

Abstract: Provided are a resist compound for photolithography, a method for forming the same, and a method for manufacturing a semiconductor device using the same. The resist compound is represented by Formula 1.

公开(公告)号：US20240199657A1

公开(公告)日：2024-06-20

申请号：US18437835

申请日：2024-02-09

Applicant: DAIKIN INDUSTRIES, LTD.

Inventor： Shinya HANDA ,  Takashi NOMURA ,  Motoshi MATSUI ,  Gregory TORTISSIER ,  Masakazu TAKATA ,  Nozomi NAKANO ,  Yoshikage OHMUKAI ,  Shinya TAKANO

IPC: C07F7/18 ,  C08G77/54 ,  C09D7/20 ,  C09D183/08

CPC classification number: C07F7/1804 ,  C08G77/54 ,  C09D7/20 ,  C09D183/08

Abstract: A siloxane group-containing silane compound represented by the following formula (1) or (2) wherein each of the symbols in the formulae is as described herein:


RS1α—XA—RHβ  (1)



RNγ—XA—RS2—XA—RHγ  (2).

Also disclosed is a composition containing the siloxane group-containing silane compound and an article including a substrate and a layer on the substrate, wherein the layer is formed of the siloxane group-containing silane compound.

公开(公告)号：US11992824B2

公开(公告)日：2024-05-28

申请号：US17353096

申请日：2021-06-21

Applicant: Waters Technologies Corporation

Inventor： Kevin D. Wyndham ,  Michael F. Morris ,  Darryl W. Brousmiche ,  Jason F. Hill ,  Jacob N. Fairchild

IPC: B01J20/28 ,  B01D15/26 ,  B01D15/30 ,  B01D15/32 ,  B01D15/40 ,  B01D53/02 ,  B01J20/22 ,  B01J20/283 ,  B01J20/288 ,  B01J20/289 ,  B01J20/30 ,  B01J20/32 ,  C07F7/18 ,  B01J20/282 ,  B01J20/284 ,  B01J20/285

CPC classification number: B01J20/283 ,  B01D15/26 ,  B01D15/30 ,  B01D15/305 ,  B01D15/322 ,  B01D15/40 ,  B01D53/025 ,  B01J20/22 ,  B01J20/28004 ,  B01J20/28016 ,  B01J20/28042 ,  B01J20/28057 ,  B01J20/28059 ,  B01J20/28061 ,  B01J20/28064 ,  B01J20/28066 ,  B01J20/28069 ,  B01J20/28071 ,  B01J20/28073 ,  B01J20/28076 ,  B01J20/28078 ,  B01J20/28083 ,  B01J20/28085 ,  B01J20/288 ,  B01J20/289 ,  B01J20/3085 ,  B01J20/3204 ,  B01J20/3206 ,  B01J20/3208 ,  B01J20/3246 ,  B01J20/3285 ,  B01J20/3293 ,  C07F7/1804 ,  B01J20/282 ,  B01J20/284 ,  B01J20/285 ,  B01J20/32 ,  B01J20/3234 ,  B01J2220/54 ,  B01J2220/80

Abstract: In one aspect, the present invention provides a chromatographic stationary phase material for various different modes of chromatography represented by Formula 1: [X](W)a(Q)b(T)c (Formula 1). X can be a high purity chromatographic core composition having a surface comprising a silica core material, metal oxide core material, an inorganic-organic hybrid material or a group of block copolymers thereof. W can be absent and/or can include hydrogen and/or can include a hydroxyl on the surface of X. Q can be a functional group that minimizes retention variation over time (drift) under chromatographic conditions utilizing low water concentrations. T can include one or more hydrophilic, polar, ionizable, and/or charged functional groups that chromatographically interact with the analyte. Additionally, b and c can be positive numbers, with the ratio 0.05≤(b/c)≤100, and a≥0.

公开(公告)号：US20240166849A1

公开(公告)日：2024-05-23

申请号：US18279167

申请日：2022-03-02

Applicant: XLYNX MATERIALS INC.

Inventor： Jeremy WULFF ,  Peter BERRANG ,  Stefania MUSOLINO ,  Rashid NAZIR ,  Liting BI

IPC: C08K5/3442 ,  C07D229/02 ,  C07F7/18 ,  C08J3/24 ,  C08J3/28 ,  C08K5/544

CPC classification number: C08K5/3442 ,  C07D229/02 ,  C07F7/1804 ,  C08J3/24 ,  C08J3/28 ,  C08K5/5477 ,  C08J2323/06

Abstract: A family of novel diazirine-based molecules is disclosed, as well as methods of manufacture and uses thereof. These compounds allow non-functionalized polymers, such as polyolefins, to crosslink via C—H insertion. Such a C—H insertion process is useful, for example, for the covalent adhesive bonding of low surface energy films or materials, or for creating rigid 3-dimenional polymeric structures by in-situ doping and activation of the crosslinker. The disclosed crosslinkers can be activated thermally, by UV radiation or by an electric potential.

公开(公告)号：US11953833B2

公开(公告)日：2024-04-09

申请号：US16843232

申请日：2020-04-08

Applicant: NIKON CORPORATION ,  KANAGAWA UNIVERSITY

Inventor： Yusuke Kawakami ,  Kazuo Yamaguchi ,  Michiko Itou

IPC: G03F7/075 ,  C07F7/18 ,  C23C18/20 ,  C23C18/44 ,  H10K10/46 ,  H10K71/00 ,  G03F7/20 ,  H10K10/84

CPC classification number: G03F7/0755 ,  C07F7/1804 ,  C23C18/204 ,  C23C18/44 ,  H10K10/466 ,  H10K71/621 ,  G03F7/20 ,  H10K10/481 ,  H10K10/84

Abstract: A compound represented by Formula (1). [In the formula, X represents a halogen atom or an alkoxy group, R1 represents any one group selected from an alkyl group having 1 to 5 carbon atoms, a group represented by Formula (R2-1), and a group represented by Formula (R2-2), R2 represents a group represented by Formula (R2-1) or (R2-2), n0 represents an integer of 0 or greater, n1 represents an integer of 0 to 5, and n2 represents a natural number of 1 to 5.]

公开(公告)号：US20240076299A1

公开(公告)日：2024-03-07

申请号：US18258224

申请日：2021-12-07

Applicant: Hong Kong Baptist University

Inventor： Hongjie ZHANG ,  Yu ZHU ,  Nga Yi TSANG ,  Yang ZHAO

IPC: C07D493/04 ,  A61K31/365 ,  A61K36/19 ,  A61P31/14 ,  A61P31/16 ,  A61P31/18 ,  C07D407/14 ,  C07F7/18

CPC classification number: C07D493/04 ,  A61K31/365 ,  A61K36/19 ,  A61P31/14 ,  A61P31/16 ,  A61P31/18 ,  C07D407/14 ,  C07F7/1804

Abstract: Provided herein are tuberculatin analogs that are useful as antivirals, such as anti-HIV, anti-coronaviral, anti-Ebola viral, and anti-influenza viral agents and methods of use thereof.

公开(公告)号：US11914295B2

公开(公告)日：2024-02-27

申请号：US16660992

申请日：2019-10-23

Applicant: SHIN-ETSU CHEMICAL CO., LTD.

Inventor： Tsutomu Ogihara ,  Tsukasa Watanabe ,  Yusuke Biyajima ,  Masahiro Kanayama ,  Ryo Mitsui

IPC: G03F7/07 ,  G03F7/11 ,  G03F7/36 ,  C08G77/14 ,  C08G77/18 ,  C08G77/24 ,  G03F7/075 ,  C07F7/18 ,  G03F7/09

CPC classification number: G03F7/0752 ,  C07F7/1804 ,  C08G77/14 ,  C08G77/18 ,  C08G77/24 ,  G03F7/0751 ,  G03F7/0757 ,  G03F7/091 ,  G03F7/11 ,  G03F7/36

Abstract: The present invention is a thermosetting silicon-containing material containing one or more of a repeating unit shown by the following general formula (Sx-1), a repeating unit shown by the following general formula (Sx-2), and a partial structure shown by the following general formula (Sx-3):




where R1 represents an iodine-containing organic group; and R2 and R3 are each independently identical to R1, a hydrogen atom, or a monovalent organic group having 1 to 30 carbon atoms. This provides: a thermosetting silicon-containing material used for forming a resist underlayer film which is capable of contributing to sensitivity enhancement of an upper layer resist while keeping LWR thereof from degrading; a composition for forming a silicon-containing resist underlayer film, the composition containing the thermosetting silicon-containing material; and a patterning process using the composition.