Abstract:
Stack packages are provided. The stack package includes a first chip configured to include a first chip body having a top surface and a bottom surface, first through electrodes penetrating the first chip body, and an insulation layer disposed on the bottom surface of the first chip body, and first bumps disposed on the top surface of the first chip body, and a second chip configured to include a second chip body having a top surface and a bottom surface, and second bumps disposed on the top surface of the second chip body. The first and second chips are vertically stacked such that the top surface of the second chip body is directly attached to the first insulation layer and the second bumps of the second chip penetrate the first insulation layer of the first chip to pierce the first through electrodes of the first chip.
Abstract:
Provided is a semiconductor device having a high-reliability solder joint. The semiconductor device includes a high-temperature solder formed on a conductive pad. A low-temperature solder having a lower melting point than the high-temperature solder is formed on the high-temperature solder. A barrier layer is formed between the high-temperature solder and the low-temperature solder. An Sn content of the high-temperature solder is higher than that of the low-temperature solder.
Abstract:
Stack packages are provided. The stack package includes a first chip and a second chip. The first chip includes a first chip body, first through electrodes penetrating the first chip body, and an insulation layer disposed on a bottom surface of the first chip body. The second chip includes a second chip body and bumps disposed on a top surface of the second chip body. The first and second chips are vertically stacked such that the bumps penetrate the insulation layer to pierce the first through electrodes and the top surface of the second chip body directly contacts the insulation layer. Related fabrication methods, electronic systems and memory cards are also provided.
Abstract:
A semiconductor device has a semiconductor wafer with a plurality of semiconductor die. A first conductive layer is formed over a surface of the wafer. A first insulating layer is formed over the surface of the wafer and first conductive layer. A second conductive layer has first and second segments formed over the first insulating layer. A second insulating layer is formed over the first insulating layer and second conductive layer. A UBM layer is formed over the second insulating layer and the first segment of the second conductive layer. A first bump is formed over the UBM layer. The first bump is electrically connected to the second segment and electrically isolated from the first segment of the second conductive layer. A second bump is formed over the surface of the wafer and electrically connected to the first segment of the second conductive layer.
Abstract:
A bump structure includes a substrate, a pad, an electrode and a protruding electrode. The pad is disposed on the substrate. The electrode is formed by a first metal material and disposed on the pad. The protruding electrode is formed by a second metal material and disposed on the electrode, wherein a cross-sectional area of the protruding electrode is less than a cross-sectional area of the electrode.
Abstract:
A semiconductor device includes multilayer chips in which a first semiconductor chip and a second semiconductor chip are bonded together. A first electrode pad is formed on a principal surface of the first semiconductor chip, and a first bump is formed on the first electrode pad. A second bump is formed on the principal surface of the second semiconductor chip such that the second bump is bonded to the first bump. The first electrode pad has an opening, and the opening and an entire peripheral portion of the opening form a stepped shape form a stepped shape. The first bump has a recessed shape that is recessed at a center thereof and covers the stepped shape.
Abstract:
A method of forming a semiconductor device package includes removing a portion of a first connector and a molding compound surrounding the first connector to form an opening, wherein the first connector is part of a first package, and removing the portion of the first connector comprises forming a surface on the first connector which is at an angle with respect to a top surface of the molding compound. The method further includes placing a second connector in the opening, wherein the second connector is part of a second package having a semiconductor die. The method further includes bonding the second connector to a remaining portion of the first connector.
Abstract:
The described embodiments of mechanisms of forming a die package and package on package (PoP) structure involve forming a solder paste layer over metal balls of external connectors of a die package. The solder paste layer protects the metal balls from oxidation. In addition, the solder paste layer enables solder to solder bonding with another die package. Further, the solder paste layer moves an intermetallic compound (IMC) layer formed between the solder paste layer and the metal balls below a surface of a molding compound of the die package. Having the IMC layer below the surface strengthens the bonding structure between the two die packages.
Abstract:
The described embodiments of forming bonding structures for package on package involves removing a portion of connectors and molding compound of the lower package. The described bonding mechanisms enable easier placement and alignment of connectors of an upper package to with connector of a lower package. As a result, the process window of the bonding process is wider. In addition, the bonding structures have smoother join profile and planar joint plane. As a result, the bonding structures are less likely to crack and also are less likely to crack. Both the yield and the form factor of the package on package structure are improved.
Abstract:
A semiconductor apparatus having a through electrode, a semiconductor package, and a method of manufacturing the semiconductor package are provided. The method of includes preparing a substrate including a buried via, the buried via having a first surface at a first end, and the buried via extending from a first substrate surface of the substrate into the substrate; planarizing a second substrate surface of the substrate opposite the first substrate surface to form a through via by exposing a second via surface at a second end of the buried via opposite the first end; forming a conductive capping layer on the exposed second via surface of the through via; and recessing the second substrate surface so that at least a first portion of the through via extends beyond the second substrate surface.